Issue 12, 2003
From the journal:

Journal of Materials Chemistry

Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass

Shane A. O'Neill,a   Ivan P. Parkin,*a   Robin J. H. Clark,a   Andrew Millsb  and  Nickolas Elliottb  

* Corresponding authors

a Christopher Ingold Laboratories, University College London, 20 Gordon Street, London, UK

b Department of Pure & Applied Chemistry, University of Strathclyde, 295 Cathedral Street, Glasgow, UK

Abstract

A novel route involving atmospheric pressure chemical vapour deposition (APCVD) is reported for coating Nb2O5 onto glass substrates via the reaction of NbCl5 and ethyl acetate at 400–660 °C. Raman spectroscopy is shown to be a simple diagnostic tool for the analysis of these thin films. The contact angle of water on Nb2O5-coated glass drops on UV irradiation from 60° to 5–20°. XPS Analysis showed that the Nb∶O ratio of the film was 1∶2.5. Glancing angle X-ray diffraction showed that all films were crystalline, with only a single phase being observed; this has some preferred orientation in the (201) plane of Nb2O5. The niobium(V) oxide materials show minimal photocatalytic ability to degrade organic material.

Graphical abstract: Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass

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Article information

DOI
https://doi.org/10.1039/B307768N
Article type
Paper
Submitted
08 Jul 2003
Accepted
17 Sep 2003
First published
15 Oct 2003

J. Mater. Chem., 2003,13, 2952-2956

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Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass

S. A. O'Neill, I. P. Parkin, R. J. H. Clark, A. Mills and N. Elliott, J. Mater. Chem., 2003, 13, 2952 DOI: 10.1039/B307768N

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