Abstract
An all solid-state femtosecond laser (λ0 ∼775 nm, pulse duration ∼170 fs, maximum pulse energy ∼0.5 mJ) with a Gaussian beam profile was used for depth profiling of Cu–Ag and TiN–TiAlN multi-layers on silicon and iron substrates.
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Institute for Spectrochemistry and Applied Spectroscopy (ISAS), Bunsen-Kirchhoff-Strasse 11, Dortmund, Germany
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An all solid-state femtosecond laser (λ0 ∼775 nm, pulse duration ∼170 fs, maximum pulse energy ∼0.5 mJ) with a Gaussian beam profile was used for depth profiling of Cu–Ag and TiN–TiAlN multi-layers on silicon and iron substrates.
Depth profiling of multi-layer samples using femtosecond
V. Margetic, M. Bolshov, A. Stockhaus, K. Niemax and R. Hergenröder, J. Anal. At. Spectrom., 2001, 16, 616 DOI: 10.1039/B100016K
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