Abstract
A new vapor-phase deposition method using FeCl3 and CH3CSNH2 as starting materials has been examined for the growth of FeS2 films on glass substrates under atmospheric pressure. The X-ray diffractogram of the as-deposited films at 773 K showed a typical cubic pyrite pattern. The growth rate was approximately 8.4 µm h−1 at 773 K. The resulting films have a carrier concentration of 6.5 × 1018 cm−3 and a Hall mobility of 20 cm2 V−1 s−1 at 298 K.