Issue 10, 2000

Abstract

A new vapor-phase deposition method using FeCl3 and CH3CSNH2 as starting materials has been examined for the growth of FeS2 films on glass substrates under atmospheric pressure. The X-ray diffractogram of the as-deposited films at 773 K showed a typical cubic pyrite pattern. The growth rate was approximately 8.4 µm h−1 at 773 K. The resulting films have a carrier concentration of 6.5 × 1018 cm−3 and a Hall mobility of 20 cm2 V−1 s−1 at 298 K.

Article information

Article type
Paper
Submitted
14 Apr 2000
Accepted
19 Jul 2000
First published
07 Sep 2000

J. Mater. Chem., 2000,10, 2346-2348

Preparation of pyrite thin films by atmospheric pressure chemical vapor deposition using FeCl3 and CH3CSNH2

N. Takahashi, T. Sawada, T. Nakamura and T. Nakamura, J. Mater. Chem., 2000, 10, 2346 DOI: 10.1039/B003015P

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements