IR laser-induced decomposition of 1,3–dimethyldisiloxane for chemical vapour deposition of nano-structured methyl(hydrido)silicone phases

Josef Pola; Markéta Urbanová; Zdeněk Bastl; Jan Šubrt; Panos Papagiannakopoulos

doi:10.1039/B000421I

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Josef Pola,†*^a Markéta Urbanová,^a Zdeněk Bastl,^b Jan Šubrt^c and Panos Papagiannakopoulos^d

Author affiliations

* Corresponding authors

^a Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, Prague 6, Czech Republic
E-mail: pola@icpf.cas.cz
Fax: 420 2 20920661
Tel: 420 2 20390308

^b J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Prague 8, Czech Republic

^c Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, Řež near Prague, Czech Republic

^d University of Crete, Heraklion, Crete, Greece

Abstract

The infrared multiphoton decomposition of 1,3-dimethyldisiloxane induced by a TEA CO₂ laser yields gaseous C₁–C₂ hydrocarbons, methylsilane, dimethylsilane, methyldisiloxane and trimethyldisiloxane. These products provide evidence for a range of decomposition steps; amongst these, cleavage of the Si–O bond is important. The process affords chemical vapour deposition of a white solid nano-structured methyl(hydrido)silicone phase that has been characterized by infrared and photoelectron spectroscopy and electron microscopy.

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Article information

DOI: https://doi.org/10.1039/B000421I
Article type: Paper
Submitted: 14 Jan 2000
Accepted: 24 Mar 2000
First published: 11 May 2000

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J. Mater. Chem., 2000,10, 1415-1418

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