Alternative approach for the direct determination of silicon and other trace elements in tungsten metal with inductively coupled plasma atomic emission spectrometry
Abstract
In the determination of trace elements in tungsten metal by ICP AES, the tungsten is dissolved in HNO3–HF to ensure complete dissolution of the analytes. Corrosion problems with HF-containing solutions have been overcome by neutralizing the solution prior to sample introduction. For Si, LOD of 10–20 µg g–1 were obtained.