Chemical vapour deposition of polycarbosilanes via ArF laser-induced photolysis of sila-, 1-methyl-1-sila- and 1,3-disila-cyclobutanes
Abstract
Laser-induced photolysis of the title silacycles in the gas phase is dominated by cleavage of the four-membered ring and results in deposition of polycarbosilanes formed by polymerization of assumed transient silenes and silylenes. The polycarbosilane films are reactive towards oxygen.