Aluminium silicate, (Al2O3)x(SiO2)y, thin films have been grown by atmospheric pressure metal-organic vapour deposition using the volatile metal organic precusor [Al(OSiEt3)3]2. As determined by X-ray photoelectron spectroscopy, the deposited films consisted of a mixture of Al2O3, SiO2, and an aluminosilicate.
A. W. Apblett, L. K. Cheatham and A. R. Barron, J. Mater. Chem., 1991, 1, 143 DOI: 10.1039/JM9910100143
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