Inter-laboratory note. Chemical generation of silicon tetrafluoride with direct current plasma atomic emission spectrometry for the determination of fluorine
A method is described for the determination of fluorine in aqueous samples via the chemical generation of silicon tetrafluoride. The generated vapour was swept to a direct current plasma and silicon measured by atomic emission spectrometry. The detection limit obtained for fluorine was 0.9 µg ml–1 for a 100-µl sample.