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Issue 8, 1989
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Inter-laboratory note. Chemical generation of silicon tetrafluoride with direct current plasma atomic emission spectrometry for the determination of fluorine

Abstract

A method is described for the determination of fluorine in aqueous samples via the chemical generation of silicon tetrafluoride. The generated vapour was swept to a direct current plasma and silicon measured by atomic emission spectrometry. The detection limit obtained for fluorine was 0.9 µg ml–1 for a 100-µl sample.

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Article information


J. Anal. At. Spectrom., 1989,4, 805-806
Article type
Paper

Inter-laboratory note. Chemical generation of silicon tetrafluoride with direct current plasma atomic emission spectrometry for the determination of fluorine

N. Barnett, H. Beere, L. Ebdon and B. Fairman, J. Anal. At. Spectrom., 1989, 4, 805
DOI: 10.1039/JA9890400805

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