Issue 8, 1985

CO Adsorption suppression due to charge transfer in the Ni–SiOx–n-Si(111) system at low Ni coverage

Abstract

No CO adsorption was observed in the He I u.v. photoelectron spectra at low Ni coverage on SiOx–n-Si(111) where charge transfer has been concluded to occur, whereas normal CO adsorption was observed at low Ni coverage on SiOx–p-Si(111) or at high Ni coverage on SiOx–n-Si(111); these results show that charge transfer occurring in a narrow region at low Ni coverage is responsible for the suppression of CO adsorption.

Article information

Article type
Paper

J. Chem. Soc., Chem. Commun., 1985, 481-482

CO Adsorption suppression due to charge transfer in the Ni–SiOx–n-Si(111) system at low Ni coverage

K. Tanaka, B. Viswanathan and I. Toyoshima, J. Chem. Soc., Chem. Commun., 1985, 481 DOI: 10.1039/C39850000481

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