Issue 8, 1982

Electrical and electrochemical properties of TiO2 films grown by organometallic chemical vapour deposition

Abstract

The electrical and photoelectrochemical properties of TiO2 films, which were obtained by the vapour decomposition of ethyl titanate, are described. The electrical properties depend mainly on the deposition temperature. Films deposited at high temperatures have much lower electrical conductivity but remarkably higher photosensitivity than those deposited at low temperatures. The deposition temperatures are found to affect the electrochemical properties, such as anodic photocurrent–potential characteristics and spectra dependence of anodic photocurrents. Some doping effects of Al, Cr and Fe on the both properties are also examined.

Article information

Article type
Paper

J. Chem. Soc., Faraday Trans. 1, 1982,78, 2563-2571

Electrical and electrochemical properties of TiO2 films grown by organometallic chemical vapour deposition

Y. Takahashi, A. Ogiso, R. Tomoda, K. Sugiyama, H. Minoura and M. Tsuiki, J. Chem. Soc., Faraday Trans. 1, 1982, 78, 2563 DOI: 10.1039/F19827802563

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