The Ge–Ge bond in hexamesityldigermane dissociates reversibly between –12 and +53°C (ΔHMdiss. 87 ± 8 kJ/mol), and the Si–Si bond in hexamesityldisilane behaves analogously between –60 and –20 °C; above these temperatures, irreversible reactions of the radicals occur.
W. P. Neumann and K. Schultz, J. Chem. Soc., Chem. Commun., 1982, 43 DOI: 10.1039/C39820000043
To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.
If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.
If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.
Read more about how to correctly acknowledge RSC content.
Please wait while we load your content...