Photo-oxidation of nitroso-compounds: dissociative mechanism for the photo-oxidation of 2-methyl-2-nitrosobutane
Abstract
The photo-oxidation of 2-methyl-2-nitrosopropane in the gas phase is shown to proceed by a dissociative mechanism via peroxyl and alkoxyl radicals and to provide a model system for the study of the oxidation of low levels of NO to NO2, which is of interest in studies of reactions occurring in photochemical smog.
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