Silicon–nitrogen compounds. Part VII. N-silyl derivatives of aniline

Abstract

N-Phenyldisilazane, (SiH₃)₂NPh, has been prepared from aniline and iodosilane; it is a very weak Lewis base. With less than 1 mol. of hydrogen chloride below –20°, it gives N-phenylsilylamine, SiH₃NHPh. In the range 325–380° and at 90° respectively, the new compounds decompose to yield silane and hydrogen. A mechanism involving initial disproportionation about silicon is proposed, and the probable nature of the involatile products is inferred. I.r. and mass spectra are reported and discussed.