Bonding studies of organometallic compounds of boron and the group IV elements. Part I. Heats of hydrolysis and bond energies for some trimethylsilyl derivatives
Abstract
The heats of hydrolysis, in aqueous 1M-hydrochloric acid, of nine trimethylsilyl compounds of type (Me3Si)nX to give hexamethyldisiloxane and XHn, have been measured. By use of separately measured or known heats of formation of (Me3Si)2O and XHn in 1M-HCl, standard heats of formation were calculated as follows: ΔHf°(Me3SiCl, liq.)=–91·8 ± 0·8; ΔHf°(Me3SiBr,liq.)=–77·9 ± 0·8; ΔHf°(Me3SiOH, liq.)=–130·3 ± 0·8; ΔHf°(Me3Si·SBun, liq.)=–91·0 ± 0·8; ΔHf°(Me3Si·NHMe, liq.)=–62·5 ± 0·8; ΔHf°[(Me3Si)·NMe2, liq.]=–66·6 ± 0·8; ΔHf°[(Me3Si)2NH, liq.]=–123·9 ± 1·6; ΔHf°[(Me3Si)2NMe, liq.]=–116·1 ± 1·6; and ΔHf°[(Me3Si)3N, solid]=–173·2 ± 2·2 kcal./mole. Si–X relative bond energies [with respect to E(Si–Cl)= 96·6 kcal./mole] are derived; and it is noteworthy that E(Si–N) does not vary greatly with environment. A Zahn-type interaction scheme was applied to series of CN and SiN compounds.