n-Type and p-type co-doping for optimizing turn-on and threshold fields of SiC towards enhanced field emission properties

Abstract

Turn-on field (Eto) and threshold electric field (Ethr) are regarded as typical indexes for fabricating better field emission (FE) devices. Although doping is an efficient strategy to enhance the FE properties, the reasons for the effect of various types of dopants on Eto and Ethr values are unknown. In this paper, lanthanum (p-type) and nitrogen (n-type) co-doped SiC nanowires (LN-SiC NWs) were prepared using a two-step method, and exhibited enhanced FE properties with reduced Eto and Ethr values of 0.938 V µm−1 and 3.077 V µm−1, respectively. A series of characterization studies and DFT calculation results revealed the internal reasons for the enhanced FE properties via n-type and p-type dopant co-doping. The Eto value is influenced by the total amount of emitted electrons, and n-type N doping involving more valence electrons could provide more charge carriers for the CB to increase it. Therefore, n-type N doping could reduce the Eto value. The Ethr value is influenced by the band gap, and n-type N doping and p-type La doping could alter the hybridization states of the CB and VB for narrowing the band gap. Therefore, n-type and p-type co-doping could enhance the FE properties of LN-SiC NWs. This work provides theoretical guidance for understanding the enhanced FE properties as well as the effect of the dopant type on reduced Eto and Ethr values.

Graphical abstract: n-Type and p-type co-doping for optimizing turn-on and threshold fields of SiC towards enhanced field emission properties

Article information

Article type
Paper
Submitted
11 Jun 2025
Accepted
03 Feb 2026
First published
20 Mar 2026

J. Mater. Chem. C, 2026, Advance Article

n-Type and p-type co-doping for optimizing turn-on and threshold fields of SiC towards enhanced field emission properties

Y. Sun, L. Chen, Z. Li, H. Lv, W. Sun, W. Li, S. Ding and Z. Li, J. Mater. Chem. C, 2026, Advance Article , DOI: 10.1039/D5TC02253C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements