Open Access Article
Katarina
Cicvarić
a,
Lars
Mannich
a,
Susana
Suttor
ab,
Wang
Hu
a,
Vitaly
Alexandrov
c and
Aliaksandr S.
Bandarenka
*a
aPhysics of Energy Conversion and Storage, Department of Physics, Technical University of Munich, James-Franck-Str. 1, Garching, 85748, Germany. E-mail: bandarenka@ph.tum.de
bBMW AG, Petuelring 130, 80809 Munich, Germany
cDepartment of Chemical and Biomolecular Engineering, University of Nebraska-Lincoln, 207E Othmer Hall, 68588 Lincoln, NE, USA
First published on 12th March 2026
The high energy density of anode-free Li-metal batteries (AFLMBs) stems from eliminating the graphite anode, allowing lithium (Li) to be directly electrodeposited onto the current collector during charging. Although copper (Cu) foil is widely employed as a current collector, it often experiences Li dendritic growth, which can cause system failures. Nickel (Ni) foil is a promising alternative as a current collector, meeting the general requirements; however, the in-depth behaviour of Li deposition on Ni remains unclear. Here, we compare the initial stages of Li deposition on model Cu(111) and Ni(111) single crystals by calculating the apparent rate coefficients of Li deposition (kapp(t,E)). In addition, we apply density functional theory (DFT) calculations to clarify the experimentally observed trends in kinetic parameters. Our results reveal that the overall kapp(t,E) on Ni(111) are lower than on Cu(111) with a decreasing trend with increasing overpotential and deposition time. Furthermore, we show that Ni(111) exhibits higher lithiophilicity than Cu(111) as the adsorption energy on the former is lower (more negative values), while exhibiting a similar surface diffusion barrier. A subsequent second layer Li deposition is theoretically examined to have higher adsorption energy on Ni(111) than on Cu(111) for dense configurations, which can facilitate lateral diffusion of Li adatoms, leading to smoother Li growth as shown experimentally. What is more, we show that Ni(111) exhibits higher corrosion resistance, rendering it a preferred material choice as a current collector.
Current collectors in AFLMBs collect electrons released during electrochemical reactions, transport electrons between the electrode materials and the external circuit, extract the thermal energy generated during electrochemical reactions, and serve as substrates for the deposition of metallic Li. General requirements for current collectors are high electronic and thermal conductivity, excellent electrochemical stability, strong corrosion resistance, robust mechanical strength, and cost-efficiency.7–9 Among the materials that are electrochemically inactive in the operational potential range of the anode (0–3 V vs. Li/Li+) are copper (Cu), nickel (Ni), titanium (Ti), and stainless steel (SS). Electronic conductivity of the proposed materials decreases in the following order: Cu (approx. 59 × 106 S m−1) > Ni (14.4 × 106 S m−1) > Ti (2.5 × 106 S m−1) > SS (1.4 × 106 S m−1), while thermal conductivity in the following order: Cu (approx. 400 W m−1 K−1) > Ni (approx. 90 W m−1 K−1) > SS (15–25 W m−1 K−1) > Ti (approx. 22 W m−1 K−1).10,11 Hence, Cu is the most commonly used current collector owing to its highest electronic and thermal conductivity, while Ni would be the second choice.12 Ni possesses the highest tensile strength among the suggested materials and the lowest cost (in 2025). Moreover, Ni is more corrosion-resistant than Cu in commercially used carbonate-based organic electrolytes containing LiPF6.13,14 Despite these advantages, Li electrochemical deposition on Ni remains largely unexplored. However, Cu has been thoroughly investigated at both atomic and macroscopic levels. In this regard, studies at the atomic level have reported surface mobilities and rearrangements on different single crystal Cu facets, showing that Cu(111) favours horizontal and homogeneous growth compared to Cu(110) and Cu(100).15–17 Diffusion was also studied, with results reporting higher surface diffusion barriers on Cu(001) than on Li(001),18 hypothesising that surface diffusion at grain boundaries could suppress dendrite formation,19 and identifying interlayer diffusion as a governing mechanism promoting smooth, dendrite-free films.20 Pei et al. studied the relationship between Li nuclei radius and applied overpotential, finding that lower overpotentials yield larger nuclei, leading to uniform deposition of metallic Li.21 Regarding the comparison between Cu and Ni, Pande et al. performed a thermodynamic analysis of various metal and alloy current collectors, reporting that both Ni(111) and Cu(111) facets have high Li nucleation energy, but the adsorption energy of Li on Ni(111) is lower than that on Cu(111) enabling a lower diffusion energy barrier on Cu(111) than on Ni(111).22
Nucleation largely dictates the film growth morphology, where defect sites such as grain boundaries, tips and microcracks provide energetically favourable sites, thereby inducing nonuniform ion flux. This often results in uneven film growth and can lead to the formation of dendrites.23,24
In this work, we compare the local deposition kinetics in terms of apparent rate coefficients (kapp(t,E)) of initial Li electrodeposition on Cu(111) and Ni(111) single crystals, estimated using electrochemical impedance spectroscopy. Here, single crystal Cu and Ni surfaces were chosen to exclude the effect of grain boundaries and defects present in polycrystalline surfaces. In both Cu(111) and Ni(111) cases, a decrease of kapp(t,E) with increasing overpotential and deposition time was observed, while the overall kapp(t,E) was lower on Ni(111) than on Cu(111). Furthermore, underpotential deposition (UPD) of Li corresponding to ⅓ of a Li monolayer on Cu(111) and a full monolayer on Ni(111) prior to Li deposition was observed. Density functional theory (DFT) calculations elucidated higher lithiophilicity on Ni(111) than on Cu(111) as the adsorption energy of Li on the former is lower. The simulation of subsequent second layer Li deposition on 1ML Li covered Cu(111) and Ni(111) revealed higher adsorption energy on the latter. This suggests, combined with lower surface diffusion barriers, easier lateral diffusion of Li adatoms on Ni(111) than on Cu(111) when a full monolayer is formed, consequently promoting horizontal Li growth and thereby reducing kapp(t,E) as adatoms migrate more easily toward already formed clusters. These insights are in agreement with experiments, where it was observed that Li grains on Ni(111) have a larger area and are smoother than those on Cu(111). Additionally, our experimental findings reveal that the SEI layer on Ni(111) is thinner than that on Cu(111), indicating that Ni is more stable against corrosion. This, coupled with a more uniform initial Li deposition, confirms Ni as a better material for AFLMBs.
:
ethyl methyl carbonate (EC
:
EMC 3
:
7, by wt) with Cu(111) or Ni(111) single crystal as the working electrode, lithium iron phosphate (LFP) as the counter electrode and metallic Li as the reference electrode, starting at OCV, scanning towards 0 V, then back to 3.55 V vs. Li/Li+.
The peaks observed in the first cycle of SEI formation on Cu(111) have been previously identified by Menkin et al.: 2.5–3.1 V as CuF2 reduction resulting in LiF and Cu formation, 2.5–1.5 V as Cu oxide reduction, CuxO lithiation and LiF formation, and 0.5 V as reduction of Li2CO3 to Li2C2 and Li2O.26 After the 2nd cycle, a stable SEI is formed, as no significant changes in the CV shape can be observed. The reduction peak at around 0.5 V represents underpotential deposition (UPD) of Li on Cu,27 while the oxidation peak at around 0.9 V in the reverse scan corresponds to subsequent stripping of the deposited Li. The charge passed for the reduction peak is approximately 100 µC, corresponding to approximately ⅓ of the Li monolayer. Unlike Cu, the peaks for SEI formation on Ni(111) have not been identified in the literature; however, given the overall shape of the CV, we assume that SEI components are forming, with an additional UPD-related peak at ca. 1.0 V. In this case, a stable SEI is formed after the first cycle, as can be seen in Fig. 1b. Here as well, UPD of Li takes place, starting with weak peaks at 2.3, 2.0, 1.1, and 0.8 V, as well as a clearly defined peak at 0.25 V, where the presence of multiple UPD stages represents different modes of adsorption, as already reported.28 Upon reversing the scan, the oxidation peaks at around 0.5 and 1.6 V represent stripping of the deposited Li. The charge passed for both reduction and oxidation peaks is approximately 300 µC. This corresponds to the formation of a full Li monolayer in the forward scan and a complete stripping in the reverse scan. The detailed derivation and calculation of monolayer coverage on both Cu(111) and Ni(111) can be found in the SI.
The apparent rate coefficient of deposition (kapp(t,E)) of Li on Cu(111) and Ni(111) is calculated from the following equation, with a typical Randles-type circuit providing appropriate fitting results:23
![]() | (1) |
The detailed explanation and derivation of the kinetic parameters can be found in our prior publication.23 To extract parameters for the calculation of kapp(t,E), electrochemical impedance spectroscopy at −5, −10, −15, −20 and −25 mV for 3600 s was carried out. At each potential, 26 impedance spectra were recorded over the course of deposition. The impedance spectra were fitted to the Randles-type equivalent electrical circuit (with parallel RC combination added in series to it to account for the behaviour of the formed SEI) to extract AW(t,E) and RCT(t,E) for estimating kapp(t,E) for Cu(111) and Ni(111) shown as points in Fig. 2a and c, respectively. The figure of 1 × 10−10 m2 s−1 for the diffusion coefficient for Li+ in EC
:
EMC is obtained from the literature.29 Since the depositions were conducted at a constant room temperature (25 °C) at low deposition overpotentials for studying nucleation stages, we assume a constant D for all calculations. Regarding Cu(111), at −5 mV kapp increases up to about 300 s, subsequently showing a slight decrease. A distinct behaviour emerges at higher potentials, where kapp declines for up to 500 seconds before remaining nearly constant. Fig. 2b shows the average kapp calculated after stabilisation (after 2000 s) with error bars representing the standard deviation. The most significant drop in kapp is noticeable between −5 and −10 mV, whereas between −10 and −25 mV, only a slight change can be observed. In comparison, Ni(111) displays a different behaviour. Here, at potentials between −5 and −15 mV, kapp decreases initially up to about 300 s, followed by only a slight decrease at −5 and −10 mV, whereas at −15 mV it remains almost constant. As for −20 and −25 mV, no noticeable change is observed throughout the course of deposition.
It should be noted that the equation for the apparent rate coefficient can be written as follows:23
![]() | (2) |
The contribution to the reduction in kapp from the gradual formation of an ion-depletion region near the electrode surface cannot be neglected. The latter facilitates the movement of ions to more favourable active sites, thereby leading to a decrease in kapp.31Fig. 2d shows the average kapp calculated after 2000 s, showing a decreasing trend with increasing potential. Compared to Cu(111), values of kapp are 2 to 4 times lower and show a more linear decrease with increasing potential, unlike Cu, where a significant drop between −5 and −10 mV, followed by a slight decrease at higher potentials can be seen. Fig. 3 and 4 show topographies of Cu(111) and Ni(111) surfaces, respectively. Analysis of surface roughness and grain area was carried out with Gwyddion software,32 and is shown in Fig. 5. Overall, it can be seen that Li deposits on Cu(111) have a smaller grain size and are rougher than those on Ni(111) (Fig. 5a and b, respectively).
Fig. 6a and b show the SEI capacitance over the course of deposition at different overpotentials on Cu(111) and Ni(111), respectively. Values for SEI capacitance (CSEI) were extracted by fitting 26 impedance spectra recorded during deposition to the proposed electrical equivalent circuit (EEC) detailed in our previous work.23 The fitting to the suggested EEC (see SI Fig. S1) is good for all measured overpotentials, with RMS deviations typically in the range of a few percent, and is shown in SI (Fig. S2). Regarding Li deposition on Cu(111) (Fig. 6a), SEI capacitance is mainly stable over the course of deposition at all potentials. On comparing different potentials, the largest drop can be seen between −5 and −10 mV, with further decrease from −10 to −15 mV, after which it mostly stabilises at higher overpotentials. Conversely, a different behaviour can be observed on Ni(111) (Fig. 6b), where for −5, −10 and −15 mV a drop can be seen at the beginning of deposition after which it mostly stabilises, whereas at −20 and −25 mV it remains mostly stable over the course of deposition. Overall, SEI capacitance on Cu(111) is lower by two orders of magnitude than that on Ni(111), signifying the formation of a thicker SEI film. Additionally, AFM measurements performed after SEI formation on Cu(111) and Ni(111) (Fig. 3b and 4b, respectively) show average roughness values of approximately 26 nm and 19 nm, respectively. This further supports the conclusion that the SEI film formed on Cu(111) is thicker than that formed on Ni(111). Namely, an increase in the SEI thickness results in a greater distance between the electrode surface and ions, which decreases capacitance.33 Therefore, it is clear that Ni(111) is more stable in the examined electrolyte system, as it is less prone to decomposition, which can degrade the performance of AFLMBs.34
| Surface | Adsorption energy/eV | |||
|---|---|---|---|---|
| Top | Bridge | Hollow (hcp) | Hollow (fcc) | |
| Pristine Cu(111) | −2.51 | −2.62 | −2.63 | −2.63 |
| Pristine Ni(111) | −2.79 | −2.88 | −2.89 | −2.89 |
To investigate the origin of the observed difference in adsorption energies, we further analysed the local electronic structure of Li and the adjacent substrate surface atoms. Fig. 7a and b present the projected density of states (PDOS) for the Cu and Ni systems, respectively. In the case of Ni, the d-band is shifted toward the Fermi level relative to Cu. According to the d-band model proposed by Hammer and Nørskov,35 this leads to a reduced filling of antibonding states by electrons upon adsorption, thereby increasing the adsorption strength. This may explain the enhanced interaction observed on Ni(111) compared to Cu(111).
To describe further Li deposition on the surfaces of the current collectors, we follow the methodology described in our previous work. Specifically, we evaluated the adsorption strength of Li on the pristine Cu(111) and Ni(111) facets as a function of surface coverage θ. Fig. 8 shows the average adsorption energy calculated for selected coverages, ranging from a single deposited Li atom (θ = 0.04) to a surface completely covered with Li atoms (θ = 1). We find that the adsorption energy is minimal (more negative values) on both substrates with the deposition of an isolated Li atom and gradually increases (less negative values) with subsequent single-layer growth. The most significant change occurs between θ = 0.33 and θ = 0.5, with comparable magnitudes for Cu(111) (+0.29 eV) and Ni(111) (+0.30 eV). This could indicate a transition toward an energetically less favourable close-packed state, the cause of which may lie in the non-negligible lattice mismatch between Li and Cu/Ni. Notably, subsequent deposition after a coverage of θ = 0.5 only results in a minor further change in the adsorption energy (Cu(111): +0.12 eV; Ni(111): +0.20 eV) relative to the preceding deposition (Cu(111): +0.46 eV; Ni(111): +0.50 eV). In general, despite the more pronounced changes on Ni(111) compared to Cu(111), adsorption on Ni(111) remains energetically more favourable regardless of the coverage. This is consistent with the UPD of Li from cyclic voltammetry experiments taking place slightly earlier for the Ni(111) surface (first UPD peak at ca. 1.0 V in Fig. 1b) and forming a full monolayer in contrast to an incomplete Li-layer on Cu(111). Furthermore, as lithiophilicity is considered a critical factor in promoting homogeneous nucleation and mitigate dendritic growth,36,37 it could explain the smoother deposition morphology observed experimentally on Ni(111) (Fig. 5).
![]() | ||
| Fig. 8 Average adsorption energy of Li adsorbed on pristine Cu(111) and Ni(111) as a function of surface coverage θ. Substrate atoms are grey, and deposited Li atoms are green. | ||
Given the experimental observation of Li UPD during SEI formation, we further assume a Li coverage of θ = 1 on the Cu(111) and Ni(111) surfaces to investigate deposition beyond the first layer on both substrates. While this serves only as a rather rough approximation for Cu, since the experimentally determined coverage was found to be approximately ⅓ML, it is in good agreement with the experimental results for Ni. As the hollow sites were identified as the energetically most favourable adsorption sites on both pristine surfaces, UPD monolayer Li atoms were accordingly positioned. The hollow (fcc) sites were selected for simplicity.
To simulate subsequent second-layer deposition, we applied the same methodology as for the first layer. Table 2 shows the calculated adsorption energy of Li placed at the four previously introduced symmetrically distinct positions of the fcc(111) facet. Notably, the adsorption energy has shifted to be nearly equivalent for all sites and almost independent of the underlying substrate. Furthermore, comparison of the adsorption energy between the second-layer Li atom and that of Li atoms in the completed first layer (θ = 1 coverage) reveals no difference on Cu(111), while on Ni(111), the latter is 0.16 eV lower. The lower adsorption strength of the second Li layer could facilitate lateral diffusion of Li adatoms, allowing a horizontal growth pattern during early-stage Li deposition on Ni(111) compared to that on Cu(111). This is supported by experimental data (Fig. 3 and 4), which show smoother, wider grains on Ni(111) than on Cu(111) (Fig. 5).
| Surface | Adsorption energy/eV | |||
|---|---|---|---|---|
| Top | Bridge | Hollow (hcp) | Hollow (fcc) | |
| 1ML Li@Cu(111) | −2.06 | −2.04 | −2.03 | −2.04 |
| 1ML Li@Ni(111) | −2.03 | −2.01 | −2.01 | −2.01 |
As the top site was found to be slightly more energetically preferred, the second-layer Li deposition was modelled with Li atoms positioned accordingly. As shown in Fig. 9, the average adsorption energy of second-layer Li remains approximately constant up to a coverage of θ = 0.33, unaltered by the underlying substrate. This behaviour is contrary to the initial changes observed at the onset of deposition for the first layer. However, the transition from θ = 0.33 to θ = 0.5 still results in a significant change in the adsorption energy, further suggesting an energetically less favourable close-packed arrangement. Additionally, the transition is accompanied by a shift toward a more favourable adsorption process on the 1ML Li-covered Cu(111) surface. As this effect is not apparent at low coverages, it may arise from the comparatively smaller lattice mismatch between Cu and Li, leading to reduced compressive strain at higher coverages. As can be seen from Fig. 9, the largest difference in adsorption energies is observed for the full Li coverage on the first lithium monolayer, and adsorption of Li is stronger in the case of the Cu(111) substrate. This can explain the kinetic data that the local deposition apparent rate coefficients are higher in the case of the copper single crystal.
While the adsorption energy serves as a useful indicator of the lithiophilicity of a current collector material, surface diffusion processes are also considered to play a significant role in the ability of a substrate material to promote a horizontal growth mode.38 As the associated energy barrier decreases, the mobility of the adsorbed species increases and thereby its ability to rearrange and evenly cover the surface, thus favouring horizontal growth over vertical growth. Fig. 10a and b show the surface diffusion barriers of Li on the pristine and the 1ML Li covered Cu(111) and Ni(111) surfaces, respectively. The determined barrier heights for the pristine Cu(111) and Ni(111) surfaces are nearly identical, which disagrees with a lower height on Cu(111) determined by Pande et al. using a Brønsted–Evans–Polanyi (BEP) relation between the adsorption enthalpy of 1ML Li covered surfaces and the diffusion energy barrier.22 However, Kim et al. reported a barrier height for Cu(111) that is in very good agreement with our calculations.16 Furthermore, the results align with our experimental findings: while Ni(111) shows a higher lithiophilicity than Cu(111), surface diffusion processes exhibit similarly low energy barriers, which collectively enhance smoother film growth. At full Li monolayer coverage, the surface diffusion barrier of Li on Cu(111) increases to nearly double that of Ni(111), whereas the latter remains unchanged. This further reinforces the experimentally observed trend of an overall lower apparent coefficient (kapp) on Ni(111) than on Cu(111) (Fig. 2), as diffusion of Li adatoms toward already formed clusters is facilitated, leading to more uniform initial growth. However, it should be emphasized that the heights of all calculated energy barriers are relatively small, especially considering that all are found to be lower than the thermal energy at room temperature kBT ≈ 0.026 eV. Hence, slow surface diffusion processes may not be the predominant source of dendritic growth on both current collector materials. In addition, we assume a 1ML Li coverage resulting from UPD on both Cu(111) and Ni(111) in our calculations, whereas the experimentally determined coverage is ⅓ML and 1ML on Cu(111) and Ni(111), respectively. Our calculations reveal a higher adsorption strength on pristine Cu(111) than on 1ML Li-covered Cu(111); hence, an incomplete coverage on Cu(111) further increases the kapp.
:
ethyl methyl carbonate 3
:
7, by wt (E-Lyte, Germany). As the working electrode, commercially purchased 15 mm diameter × 3 mm thickness Cu(111) or Ni (111) single crystals (MaTeck GmbH, Germany) were used, fixed in an electrochemical cell using a high-density polyethylene holder with a 13 mm diameter opening. For the counter electrode, 14 mm circular discs were punched from commercial 83 µm-thick lithium iron phosphate (LiFePO4)-coated aluminium foil (PI-KEM, UK) and held in place using an HDPE holder with a 12 mm diameter opening. The potentials reported in this study were measured relative to a lithium reference electrode. Following the deposition experiments, the Cu(111) single crystal was carefully rinsed with ethyl methyl carbonate (E-Lyte, Germany) to eliminate any remaining salts. Electrochemical measurements were conducted using a PalmSens4 potentiostat (PalmSens, Netherlands).
| Eads = EnLi@surf − Esurf − n × ELi |
Supplementary information (SI): monolayer coverage derivation and calculation on Cu(111) and Ni(111); suggested equivalent electric circuit (EEC) modelling the interface during electrodeposition of Li on Cu(111) and Ni(111) surfaces; electrochemical impedance spectra of electrodeposition of Li at different potentials with the corresponding fittings to the suggested EEC. See DOI: https://doi.org/10.1039/d6ta00180g.
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