Open Access Article
Soffi Ester Sola Olesenab,
Magnus Kløve
a,
Anders Bæk Borup
a,
Andreas Dueholm Bertelsena,
Marcus Viktor Kragh-Schwarzbc,
Thorbjørn Erik Køppen Christensen
de,
Frederik Holm Gjørup
ad,
Mads Ry Vogel Jørgensen
ad,
Jacopo Catalano
*c,
Anders W. Jensen
b and
Bo B. Iversen
*a
aCenter for Integrated Materials Research, Department of Chemistry and INANO, Aarhus University, Langelandsgade 140, 8000 Aarhus, Denmark. E-mail: bo@chem.au.dk
bHydrogenPro ApS, Axel Gruhns Vej 3, 8270 Højbjerg, Denmark
cDepartment of Biological & Chemical Engineering, Aarhus University, Aabogade 40, 8200 Aarhus N, Denmark. E-mail: jcatalano@au.dk
dMAX IV Laboratory, Lund University, Fotongatan 2, 224 84 Lund, Sweden
eDepartment of Applied Mathematics and Computer Science, Technical University of Denmark, Richard Petersens Plads 324, 2800 Kongens Lyngby, Denmark
First published on 2nd February 2026
Nickel foam treated via chemical vapor deposition (CVD) with H2S has demonstrated potential in applications such as supercapacitors and catalysis for alkaline water electrolysis. However, the formation mechanism of the nickel sulfide surface layer remains poorly understood. In this study, in situ powder X-ray diffraction (PXRD) was employed to identify the crystalline phase transformations and the reaction mechanism and assess its kinetics. Ni3S2 formation was investigated under industrially relevant conditions by passing 3% H2S/Ar through Ni foam and tracking the growth of the sulfided layer in relation to thickness and time. The reduced sulfidation rate observed at low flow, extended time, and greater depths indicated strong mass transfer limitations, whereas the pronounced increase between 90 and 170 °C revealed the high activation energy of the sulfidation process. A diffusion–reaction model is proposed to describe the spatial and time evolution of the Ni3S2 layer growth, assuming that H2S diffuses through the newly formed Ni3S2 layer before reacting at the Ni interface. The modelling results indicate that both the reaction and diffusion occur at fast rates and compete in the temperature range of 130–170 °C. Post-synthesis SEM and tomography analysis confirmed improved uniformity in nickel-sulfide layer thickness and extrusion coverage when the process is reaction limited rather than diffusion limited: either at synthesis temperatures below 130 °C or a higher flow rate at 130 °C. On the other hand, higher temperatures promote the formation of large NiSx extrusions. These results provide insight into the effect of the synthesis parameters on the microstructure and the formation of Ni3S2 and NiSx, providing fundamental physico-chemical and transport properties for process optimization and upscaling.
The reaction of metals with H2S has been studied since the 1950s.12 H2S is known to be poisonous to Ni-catalysts used in e.g. hydrogenation,12 methanation,10 fuel cells,10 and steam reforming.12–14 Efforts to elucidate the mechanism of H2S poisoning have employed several techniques, including thermal desorption,15 gas chromatography,16 low-energy electron diffraction (LEED),17–19 X-ray photoelectron spectroscopy (XPS),20 scanning electron microscopy (STM),21 and X-ray diffraction.22 The studies suggest that the poisoning effect is primarily geometric rather than electronic, as the activation energy for methanation remains unchanged (100 kcal mol−1) for both S-poisoned and unpoisoned Ni catalysts.16 LEED and STM studies reveal that at higher temperatures and above specific coverage, islands of ordered structures emerge.18,21 Chemisorption studies at 323 K with 50 ppm H2S identified two states of H2S: rapidly forming polysulfides on the nickel sulfide surface and more slowly forming bulk sulfides through attack of the deeper layers.15
Herein, in situ powder X-ray diffraction (PXRD) is used to study the reaction between H2S and porous Ni foam using reaction temperatures between 70 and 170 °C and a flow of 3% H2S/Ar gas mixture at 0.1–5 mL min−1 (mean velocity referred to the capillary cross-sectional area of 5 × 10−3–0.22 m s−1). Compared to previous studies, these conditions involve lower temperatures and higher H2S concentrations, enabling the investigation of NiSx catalyst formation. The key distinction of this study is the real-time tracking of the crystalline phase appearance and transformations during the reaction, uncovering the effects of the flow rate, temperature, and reaction time. This direct observation reveals a sulfidation pathway involving distinct transient bulk phases and rate-limiting steps that are not accessible in prior LEED/XPS studies,17–20 which focus on ordered sulfur adlayers and adsorption changes on Ni single-crystal surfaces rather than in situ bulk phase evolution. The reaction is examined as a function of position on the sample, revealing significant spatial variations in the reaction dynamics. Post-synthesis, scanning electron microscopy (SEM) and tomography are used to characterize the thickness of the sulfided layer, providing complementary structural insights into the PXRD data. Finally, a diffusion–reaction model is proposed to better understand the reaction kinetics and mass transport behavior of the Ni–H2S system. By systematically varying the reaction temperature and H2S flow rate and by tracking the evolution of crystalline phases over time, key insights are gained into how synthesis parameters influence the NiSx products. The physico-chemical and transport parameters in the model are calibrated with in situ data, and its predictive capabilities are validated against independent ex situ measurements of the Ni3S2 layer thickness. The parameter set enables preliminary evaluation of process upscaling to industrially relevant scales and provides guidelines for addressing potential chemical challenges during the upscaling process.
The experimental setup is shown in Fig. 1, with the reaction system depicted in Fig. 1(a) and a schematic of the gas-handling and safety system in Fig. 1(b). To ensure safe operation when working with hazardous gases like H2S, the setup was specifically designed to mitigate risks. The safety features include two H2S detectors controlling a pneumatic three-way valve that switches to argon gas flow, if H2S levels exceed 30 ppm. After the 3% H2S/Ar gas passes over the sample, it is monitored using an H2S sensor (SulfiLogger S1-1290-40000 ppm) at the outlet and subsequently neutralized with 30 wt% industrial-grade KOH. Additional safety measures, described in detail in the SI, ensured compliance with MAX IV safety protocols, as the experiments were classified as high-risk due to the use of lethal 3% H2S/Ar gas.
PXRD patterns were continuously collected in transmission geometry during the reactions using a wavelength of 0.35424 Å and a PILATUS3 X CdTe 2M 2D single photon counting detector placed 550 mm from the capillary. An exposure time of 1 s was used for the measurements. PXRD patterns were collected approximately 1 mm from the inlet-edge of the sample, which is referred to as “position 1”. The naming of the positions is shown in Fig. 1(a). Additionally, every 15 minutes, six PXRD patterns were recorded across the length of the sample at 1 mm intervals, starting from the leading edge (position 0) and extending to 5 mm into the sample (position 5). The results from position 1 (near the inlet) are shown in brown, while those from position 5 (near the outlet) are shown in grey. The beam size was set to 0.8 × 1.0 mm2 (H × W), ensuring no overlap between the patterns collected along the length of the Ni foam. Slight inhomogeneities were observed among different Ni foam samples. To illustrate this variability, the refined scale of the Ni phase is provided in Fig. S2 throughout the Ni foam sample from positions 0 to 5.
Synchrotron tomography was also conducted at the DanMAX beamline. A monochromatic photon beam with an energy of 35 keV was used. The beam size was 1.3 by 1.2 mm2 (H × W). The sample, either pristine Ni foam or sulfided Ni foam placed in the 0.7 mm fused silica capillary, was mounted on a motorized air bearing rotary stage. An sCMOS camera (Hamamatsu Orca lightning) and a ∼10× objective with a high numerical aperture (Optique Peter) with a 20 µm GGG:Eu scintillator at distances of 13, 38 and 61 mm from the sample were used to collect 3002 projections of 2560 by 2092 pixels, with a pixel size of 554 nm, each with a rotation step of 0.12° between 0 and 360° using an exposure time of 100 ms per projection. 50 dark and flat field images were collected during the measurement to correct the measured projections.
m, ICSD 8689),27 Ni3S2 (R32, COD 9000564),28 NiS (R3m, COD 9004078),29 and Ni9S8 (I
2d, COD 9013880)30 were used. The instrumental resolution was determined for each dataset by refining Ni at the first PXRD pattern, i.e., before its reaction with H2S. The obtained peak-broadening parameters were used for analysis of the whole dataset by fixing them for subsequent refinements. Sequential Rietveld refinement was conducted in reverse order, beginning with the final frame before cooling, as it exhibited the highest Ni3S2 content and thus provided the best initial phase fitting. During sequential refinements, the scale factors, unit cell parameters, and the Ni3S2 peak broadening due to strain and crystallite size are refined. Isotropic atomic displacement parameters (ADPs) for Ni are refined as well, while they are kept constant for sulfur at a value determined at the last frame before cooling. Because sulfur constitutes only a small fraction of the total phase, its ADPs are difficult to determine reliably during the in situ experiments.
The reactor geometry was simplified as 1-D assuming a uniform velocity field through the porous media (Ni foam) and negligible gas-phase mass transfer resistance. The reaction interface was approximated as a dense, planar layer without resolving for the overlying textured layer. The model assumes that H2S diffuses through the Ni3S2 layer before reacting with the underlying nickel at the Ni–Ni3S2 interface. Thus, the reaction boundary moves during sulfidation towards deeper layers of the solid material. A brief explanation of the model is provided below, while a comprehensive description is available in Section 3 in the SI. In the model, the sulfidation reaction is represented as a lumped pseudo first order reaction as shown in eqn (1).
![]() | (1) |
is the H2S concentration at the Ni–Ni3S2 interface. The mass transfer in the thin layer is considered dominated by pure diffusion, as described by eqn (2):
![]() | (2) |
is the H2S flux through the layer, hm is the mass transfer coefficient, DH2S–NiSx(T) is the temperature dependent diffusion coefficient of H2S in the Ni3S2 layer, δ is the thickness of the sulfided layer and
is the concentration of H2S at the gas-Ni interface. All variables in eqn (1) and (2), except for the kinetic and transport properties k1, hm, and DH2S–Ni3Sx, depend on space and time. However, their explicit dependence has been omitted for clarity in the nomenclature. The parameters DH2S–NiSx(T), k1(T) and the kinetic activation energy Ea in the model are calibrated by fitting the in situ data.
By considering that the layer of formed Ni3S2 is thin, as in the thin-film approximation,36 eqn (1) and (2) can be equated once scaled by the specific surface area of the Ni foam, P, which is the effective area for unit length scaled by the H2S stoichiometric coefficient, thus yielding eqn (3):
![]() | (3) |
Eqn (3), along with the H2S mass balance (in its differential form), forms the basis for the formulation of the partial differential equation system reported in the SI (Section 3). This system can be integrated to obtain the space and time profiles of the Ni3S2 layer thickness. Eqn (3) shows the explicit temperature-dependence of the diffusion and the first order kinetic coefficients, which in the present work was considered to follow an Arrhenius behaviour.
To illustrate the relative influence of the resistance of the reaction on the total resistance, eqn (3) can be rearranged to eqn (4):
![]() | (4) |
, which expresses the ratio between the reaction rate and the diffusive mass transfer rate. When the reaction rate and the mass transfer rate are equal (DaI = 1) the resistance for the diffusion exactly balances the equivalent resistance of the pseudo-first order reaction and results in ϕ = 0.5. This value is therefore the boundary of the two regimes. At high values of ϕ the system is reaction-limited, whereas at low values of ϕ the system becomes diffusion-limited.
The sulfided layer grows by consuming some of the Ni foam, as the Ni foam is the only Ni source available. From the in situ experiments, it appears that Ni3S2 is forming directly; however, due to the limitation of PXRD and the very dominant Ni peaks, potential amorphous phases forming during the reaction cannot be identified in this setup.
The H2S diffusion coefficient is comparable to that of e.g. H2 gas through (structured) Ni and Ni–P coatings, ∼1−4 × 10−13 m2 s−1 and ∼3 × 10−13−2 × 10−12 m2 s−1.44 In contrast, Ni self-diffusion through Ni3S2 is unlikely, with reported values near 10−14 m2 s−1 at 450 °C,45 extrapolating to ∼10−20 m2 s−1 at 100 °C. Moreover, the diffusion of Ni in metallic Ni is even slower, measured below 10−22 m2 s−1 at 700 °C.46
It should be stressed that, although the experiments were conducted in a small capillary, the calibrated physico-chemical and transport properties have broader relevance. Since mass transfer occurs within the porous medium, whose characteristic length is in the hundreds of micrometers, the reported parameters can be applied to derive mass-transfer correlations and scaling relationships for process upscaling.
As the Ni3S2 layer thickens, the reaction becomes increasingly constrained by the diffusion of H2S through this layer, as illustrated in Fig. 3(b). To evaluate the impact of mass transfer resistance, the dimensionless parameter ϕ, eqn (4), which represents the relative contribution of the reaction to the overall resistance, is presented for reaction times of 15 and 60 minutes in Fig. 3(c). A high value of ϕ means that the system is reaction limited, while at low values, the system is diffusion limited. At 170 °C, ϕ drops to 0.5 within 15 minutes, indicating that the process becomes predominantly diffusion-limited rather than reaction-limited at long reaction times. The diffusion limitation arises because of the resistance for H2S to permeate the already-formed NiSx layer. As the layer thickness increases, so does the resistance for diffusion, resulting in an overall reaction mechanism which is increasingly diffusion-limited. Thus, lowering the reaction temperature delays the tip-over point for when the reaction becomes diffusion limited. For example, for the 130 °C sample, it only starts to reach the same diffusion limitation after 60 minutes, when ϕ is close to 0.6.43
To examine the reproducibility, three samples at 130 °C with a H2S flow of 0.5 mL min−1 were synthesized. The WF% of Ni3S2 as a function of position in Fig. S19(b) shows that they all exhibit a similar trend with lower Ni3S2 content at positions 4–5. To assess the effect of flow rate, samples were prepared at 130 °C with flow rates of 5, 1, 0.5, and 0.1 mL min−1. As shown in Section 4 of the SI, the 0.1 mL min−1 experiment exhibits significantly lower Ni3S2 formation after 60 minutes compared to higher flow rates, indicating that H2S availability becomes the limiting factor at low flow.
The SEM images in Fig. 4(e–h) confirm the homogeneity difference between 0.5 and 5 mL min−1 at 130 °C, with the 0.5 mL min−1 sample showing no extrusions on top of the sulfided layer at position 5. Additionally, the layer thickness measured with SEM at position 5 is generally thinner compared to that at position 1 for the 0.5 mL min−1 sample. In contrast, the 5 mL min−1 sample has a comparable thickness of the Ni3S2 layer at positions 1 and 5, and extrusions on top of the layer are visible at both positions. This suggests that for upscaling of H2S CVD on Ni foam, the regime should be reaction-limited, i.e. the flow rate and concentration should be sufficiently high to ensure that the samples are homogeneous.
The distribution of Ni3S2 across the Ni foam is influenced by temperature, mass transfer, and fluid flow. Higher temperatures predominantly increase the weight fraction of Ni3S2 near the H2S inlet (positions 0 and 1), while the fraction at position 5 shows minimal change, as illustrated in Fig. 5(a). Reaction time, however, does not significantly improve uniformity within the temperature range of 130–170 °C at a flow rate of 0.5 mL min−1. The increased reaction at the inlet aligns with prior studies on Ni catalyst beds, where sulfiding occurs primarily at the inlet.47 Additionally, studies on H2S sulfidation in packed bed reactors suggest that local heating of particles can result in severe hot spots and H2S starvation.48 Thus, the decreased reaction in the outlet could be related to H2S flow through the Ni foam. Furthermore, sulfur content measurements of the outlet gas at 0.5 mL min−1 show a decrease in H2S at higher temperatures as shown in SI Section 5, consistent with the lower Ni3S2 weight percentages observed in the outlet of high-temperature samples in Fig. 5(a). Higher flow rates may increase the local H2S concentration at the gas/solid interface, potentially due to more reactant supply and increased turbulence, affecting the sulfur uptake and layer formation.
SEM analysis of the segmented samples at 0.5 mL min−1, shown in Fig. 5(b), confirms a thicker sulfided layer at position 1 especially for higher temperature samples, as indicated in Fig. 5(a), with a significantly thinner layer observed at position 5. Fig. 5(b) also shows the model predictions, which agree well with the experimental data. However, the model slightly underestimates the layer thickness at 90 °C, as seen in Fig. 5(a). The thickness of the sulfided layer at position 1 is 0.80(8) µm at 130 °C and 1.8(2) µm at 170 °C, corresponding to a 2.2-fold increase in thickness. These values are comparable to those of a previous larger-scale study, which reported a thickness of ∼1 µm after 2 h at 110 °C.5 The Ni3S2 weight fraction at position 1 shows a similar increase of 2.4 times, with a 13.4(2) WF% at 130 °C and 31(2) WF% at 170 °C.
As shown in Fig. 4, increasing the flow rate enhances the uniformity of Ni3S2 distribution throughout the sample. However, enhanced uniformity can also be achieved at lower temperatures (90 °C and 110 °C) with a flow rate of 0.5 mL min−1, as illustrated in Fig. 5(b). Thus, for industrial-scale applications, higher flow rates or lower temperatures are recommended to achieve uniform Ni3S2 deposition. For more precise determination of temperature and flow limits in a larger-scale reactor, the extracted kinetic and diffusion parameters may be combined with reactor-scale fluid dynamics and porous-media mass transport to provide guideline predictions, which can subsequently be expressed through standard dimensionless correlations for different reactor geometries.
The tomographic reconstruction and corresponding 2D cross-sectional view in Fig. 5(d) clearly reveal that the NiSx coating forms as an outer layer on the Ni foam structure. The volume thickness distributions in Fig. 5(e) show that the pristine Ni foam has a smaller layer thickness compared to the sulfided sample, which includes both the Ni foam and the NiSx coating. The reduced thickness of the Ni foam after sulfidation, excluding the coating, is expected, as some of the Ni is consumed in forming the NiSx layer. The sulfided coating displays a well-defined thickness distribution ranging from 0–4 µm with an average thickness of 2.0(6) µm. The thickness exceeds the voxel size of 0.554 µm, confirming that the measurement is not resolution-limited. The average thickness of sulfided coating from tomography is higher than that obtained from SEM in a comparable 130 °C sample (Fig. 4g and h). However, unlike SEM, where only the dense coating layer is measured, tomography includes both the dense layer and the surface extrusions, contributing to a higher apparent thickness. For comparison the surface extrusions were estimated on the SEM images to be around 0.7–0.9 µm, which could make up for the difference of 0.9–1 µm in SEM and tomography. Accurate thickness estimation via tomography requires careful tuning of experimental parameters. For instance, increasing the sample-to-detector distance enlarges phase fringes, which can obscure signals from thin layers such as the sulfided coating. The data in Fig. 5(d) were acquired at a 13 mm distance; at larger distances (38 mm and 61 mm) fringe size became excessive, preventing reliable measurements (data not shown).
For more precise thickness quantification, holographic tomography49 or ptychographic imaging50 could be employed as they better account for coherent effects, although at the expense of a smaller field of view. However, these techniques are beyond the scope of this work.
The PXRD patterns in Fig. 6(b) reveal a peak at 2θ = 12.46° for sample 90 °C and 110 °C, which does not correspond to the known phases of Ni or Ni3S2. In the PXRD pattern in Section 6 in the SI, an additional peak at 2θ = 7.5° is observed. A study of the Ni reaction with H2S at 390–550 °C describes a mechanism of the inner layer of Ni3S2 with NiS of both the millerite and the nickel arsenide structure formed on top. Additionally, small amounts of α-Ni7S6 and β-Ni7S6 are observed.22 Section 6 in the SI explores whether these peaks could be attributed to any other NiSx phases with an overview provided in Table S4, but no matching phase was identified, neither NiS nor Ni7S6. Furthermore, in Section 6 in the SI, PXRD patterns of samples at higher flow rates of 1 and 5 mL min−1 show that a new unidentified phase is present after synthesis, which is seemingly having peaks at the same positions as the unknown phase in 90 °C and 110 °C samples.
The surface coverage of extrusions at 90 °C and 110 °C may be linked to this additional phase. Since the unidentified phase could not be associated with any known phases (Section 6 in the SI), the unknown peak at 2θ = 12.48° was analyzed using single-peak fitting alongside the Ni3S2 peaks at lower 2θ values, as shown in Fig. 6(b). The ratio of the unknown peak area to the adjacent Ni3S2 peaks, presented in Fig. 6(c), indicates that the weight fraction of the unidentified phase remains constant across the 90 °C sample. However, it decreases towards position 5 for the 110 °C sample, correlating with the morphology changes in Fig. 6(a) and the color change in Fig. S29.
The appearance of the NiS millerite phase in 150 °C and 170 °C samples with the WF% at around 1.5% NiS millerite at position 0 is indicated in Section 6 in the SI. Previous ex situ synthesis in a tube furnace demonstrated an increase in NiS millerite WF% with longer synthesis times.5 A literature study reports that with sulfiding below the eutectic temperature of Ni3S2–Ni at 670 °C the layer will consist of a thick inner layer of Ni3S2 and a thin outer layer of NiS,20,22 which indicates that the extrusions on top of sample 170 °C positions 0 and 1, identified with SEM, can be attributed to the NiS phase, as discussed in Section 6.3 in the SI. Furthermore, the proportion of NiS is suggested to depend on the concentration of H2S.20 The literature suggests that Ni3S2 is not the most thermodynamically stable phase, with NiS and Ni7S6 being more stable.54,55 Combined with the literature indicating that the Ni3S2 to NiS transformation requires substantial energy,56 this suggests that extended synthesis durations are needed to observe and study this phase transition.
Analysis of sulfided layer thickness via SEM at multiple positions and temperatures enabled the formulation of a diffusion–reaction model, estimating the Ni3S2 formation activation energy at about 65 kJ mol−1. The model shows that diffusion control dominates at higher temperatures and longer reaction times. Layer uniformity and extrusion coverage were improved when working in the reaction-limited region, e.g. by either lowering the synthesis temperature or increasing the H2S flow rate at 130 °C.
The formation of NiSx on Ni foam has among other things been shown to improve the overall efficiency for alkaline water electrolysis compared with Ni foam. Due to its simple synthesis method, upgrading Ni foam to NiSx may be of industrial relevance, and this work establishes a fundamental understanding of key process parameters for industrial CVD-production of nickel sulfide electrodes using H2S, paving the way for its upscaling.
| This journal is © The Royal Society of Chemistry 2026 |