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Correction: Synthesis of heteroleptic [Sr(ddemap)(tmhd)]2 and its use in atomic layer deposition of low carbon SrO thin films
Yeji Leea,
Chanwoo Parkb,
Sangyeon Jeongc,
Daeun Limac,
Jonghyun Kima,
Hyeongjun Kimc,
Eun A Kimd,
Seong-Yong Chod,
Hyobin Yooe,
Bo Keun Parkb,
Taek-Mo Chung*b and
Woongkyu Lee*ac
aDepartment of Electrical Engineering, Myongji University, Yongin 17558, Republic of Korea
bThin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon 67447, Republic of Korea. E-mail: tmchung@krict.re.kr
cDepartment of Materials Science and Engineering, Soongsil University, Seoul 07040, Republic of Korea. E-mail: woong@ssu.ac.kr
dDepartment of Photonics and Nanoelectronics, HYU-KITECH Joint Department, Hanyang University, Ansan 15588, Korea
eDepartment of Materials Science and Engineering, Research Institute of Advanced Materials, Seoul National University, Seoul 08826, Republic of Korea
First published on 27th May 2026
Abstract
Correction for ‘Synthesis of heteroleptic [Sr(ddemap)(tmhd)]2 and its use in atomic layer deposition of low carbon SrO thin films’ by Yeji Lee et al., RSC Adv., 2026, 16, 4740–4749, DOI: https://doi.org/10.1039/d5ra08373g
The authors regret that the name of one of the authors (Taek-Mo Chung) was shown incorrectly in the original article. The corrected author list is as shown above.
The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.
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