Pyrolysis-tuned carbon nitride with synergistic K-bridged channels and vacancies for boosting H2O2 production and tetracycline degradation

Abstract

Carbon nitride (CN), a promising polymeric semiconductor and photocatalyst, exhibits photocatalytic activity that is notably influenced by the synthesis temperature. In this work, a series of I, K co-doped carbon nitrides (KICNT) were fabricated under various pyrolysis temperature (450, 500, 550, 600 and 650 °C) conditions and an N2 atmosphere, which were then subsequently applied to catalytic hydrogen peroxide (H2O2) production and tetracycline (TC) degradation. Both oxygen adsorption capacity and photocatalytic activity exhibited an initial increase followed by a decline with rising pyrolysis temperature. The KICN600 sample simultaneously exhibits the highest photocatalytic activity for both H2O2 production and photodegradation capability for TC. KICN600 achieved a H2O2 yield of 4382.1 μmol L−1 via a two-step oxygen reduction process in air after 2 h and 11 013.8 μmol L−1 under an oxygen atmosphere and visible light irradiation. Furthermore, the TC degradation over this state-of-the-art KICN600 photocatalyst can reach 83.9% within only 2 h under ambient air conditions. The characterizations results showed that the exceptional photocatalytic activity of KICN600 can be attributed to the high concentration of K-bridged channels and abundant carbon vacancies. These structural features collectively enhance the oxygen reduction capability and charge carrier separation efficiency.

Graphical abstract: Pyrolysis-tuned carbon nitride with synergistic K-bridged channels and vacancies for boosting H2O2 production and tetracycline degradation

Supplementary files

Article information

Article type
Paper
Submitted
03 Feb 2026
Accepted
12 May 2026
First published
19 May 2026

Nanoscale, 2026, Advance Article

Pyrolysis-tuned carbon nitride with synergistic K-bridged channels and vacancies for boosting H2O2 production and tetracycline degradation

D. Zhang, L. Zhang, X. Ma, Z. Chen, T. Ma, Y. Wang and W. Tang, Nanoscale, 2026, Advance Article , DOI: 10.1039/D6NR00474A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements