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Characterization of ionic–electronic transport and recombination in perovskite solar cells under multi-biasing conditions

Juan Pablo Medina Flechas*ab, Dounya Barritab, Raj Dashrath Patelb, Tianfang Liab, Estelle Carioub, Marion Provostb, Leonardo Koppriobc, Sylvain Le Gallbcd, Jean-Paul Kleiderbcd, Osbel Almorae, Camille Bainierab, Pilar López-Varo*b and Philip Schulz*bf
aTotalEnergies OneTech, 91120 Palaiseau, France. E-mail: medina.juanpablo@outlook.es
bInstitut Photovoltaïque d'Ile-de-France (IPVF), 18 Boulevard Thomas Gobert, 91120 Palaiseau, France. E-mail: pilar.lopez-varo@ipvf.fr
cUniversité Paris-Saclay, CentraleSupélec, CNRS, Laboratoire de Génie Electrique et Electronique de Paris, 91192 Gif-sur-Yvette, France
dSorbonne Université, CNRS, Laboratoire de Génie Electrique et Electronique de Paris, 75252, Paris, France
eDepartment of Electronic, Electrical and Automatic Engineering, Universitat Rovira i Virgili, 43007 Tarragona, Spain
fInstitut Photovoltaïque d'Île-de-France (IPVF), CNRS, Ecole Polytechnique - IP Paris, Chimie Paristech - PSL, UMR 9006, 18 Boulevard Thomas Gobert, Palaiseau 91120, France. E-mail: philip.schulz@cnrs.fr

Received 20th February 2026 , Accepted 5th May 2026

First published on 18th May 2026


Abstract

Perovskite solar cells (PSCs) are among the most promising photovoltaic technologies, offering high efficiencies and low fabrication costs. However, their commercialization remains limited by stability issues and incomplete understanding of the intrinsic mechanisms governing device performance. In particular, slow mobile-ion dynamics can modulate charge recombination and extraction, strongly affecting device operation. Here, we use impedance spectroscopy (IS) to investigate the underlying processes that govern the current–voltage (JV) response of PSCs under operational conditions. To this end, we combine JV, Suns-Voc and IS measurements using a multi-bias approach to analyze p–i–n PSCs under short-circuit (SC) and open-circuit (OC) conditions over a wide range of illumination intensities. Complementarily, drift-diffusion (DD) simulations and equivalent circuit model (ECM) analysis of IS under SC conditions enable extraction of key transport properties, including carrier mobilities, mobile ion concentration, and shunt resistance. The role of mobile ion concentration is analyzed for both regimes. Across the simulated parameter space, the low-frequency dark resistance is determined by the shunt resistance and nearly independent of recombination rates or mobile ion concentration. Therefore, the associated dark low-frequency RC time constant cannot be directly interpreted as a recombination lifetime. Under OC conditions, we further evaluate the coupled effects of ionic motion and energy band offsets on recombination, comparing the ideality factor derived across techniques. This integrated experimental–theoretical framework provides deeper insight into the electronic and ionic processes governing PSC performance.



Broader context

Perovskite solar cells (PSCs) hold immense promise for next-generation photovoltaic technologies, offering high efficiency and cost-effective manufacturing. However, their widespread deployment is hindered by fundamental challenges related to charge transport, interfacial recombination, and ion migration—factors that significantly affect device stability and performance. Our study presents an advanced characterization approach combining JV, Suns-Voc, and impedance spectroscopy (IS) with multi-biasing analysis to disentangle the effects of mobile ions and energetic band offsets at perovskite/contact interfaces in inverted (p–i–n) architectures. By integrating experimental IS data with drift-diffusion (DD) simulations, we provide deeper physical insights into charge carrier dynamics, recombination mechanisms, and interfacial selectivity. Our findings reveal that high energetic band offsets at charge transport layers (CTLs) can limit the fill factor (FF) and open-circuit voltage (VOC), while ionic accumulation modulates capacitive and recombination behavior. Understanding these complex interdependencies is crucial for overcoming efficiency bottlenecks and enhancing long-term PSC stability, paving the way for the optimization of next-generation tandem and scalable perovskite-based solar technologies.

Introduction

Perovskite solar cells (PSCs) are arguably the emerging photovoltaic (PV) technology of the decade, recently achieving certified power conversion efficiencies (PCEs) of 27.3% and 34.8% for single junction and silicon/perovskite tandem devices, respectively.1 Their exceptional optoelectronic properties, including high absorption coefficients, long carrier diffusion lengths, defect tolerance, and tunable bandgap (Eg);2 combined with low-temperature processability, make them strong candidates for large scale industrialization.2–4 However, their limited long-term stability remains a challenge.5 A major factor underlying this instability is the presence of mobile ions within the perovskite absorber, whose redistribution under electrical bias and illumination modifies the internal electric field and affects charge-carrier dynamics.

Standard photovoltaic characterization methods, including current density–voltage (JV) and Suns-Voc measurements, are routinely employed to evaluate device performance and infer recombination mechanisms.6–9 Their interpretation typically relies on the assumption of fast electronic charge-carrier response under steady-state conditions.10,11 In PSCs, however, this assumption is frequently invalidated by slow ionic motion. The measured optoelectronic response reflects a convolution of electronic transport and recombination with bias-dependent effective built-in potentials (Vbi),12 contact instabilities,13–16 interfacial band offsets7,17 and electric field screening due to mobile ion redistribution within the perovskite (PK) layer.18–20 Among these, ionic accumulation at PK/charge transport layer (CTL) interfaces can dynamically reshape recombination pathways, impede charge extraction, and induce JV hysteresis.21 Consequently, the ideality factor derived from JV or Suns-Voc measurements alone provides limited insight into underlying losses. Decoupling these coupled electronic and ionic processes requires characterization techniques capable of resolving distinct temporal scales, supported by physical interpretation via drift-diffusion (DD) simulations.22,23

Impedance spectroscopy (IS) is a powerful method to probe these coupled dynamics in the frequency domain. PSCs exhibit characteristic impedance features spanning multiple decades in frequency, reflecting fast electronic processes in the PK bulk and slower ionic redistribution and interfacial charge accumulation.24,25 The strong coupling between these processes produces complex spectra, including pronounced low-frequency capacitances and bias-dependent resistive elements. Multiple equivalent electric circuit models (ECMs) have been proposed to interpret these responses,25–29 mainly depending on the given operating conditions such as voltage bias and light illumination under short-circuit (SC), maximum power point (MPP) or open-circuit (OC) conditions, as well as on device-specific factors including composition and degree of degradation. The use of general ECMs, for the interpretation of IS spectra in PSCs, remains limited. A unified physical understanding of IS in PSCs therefore requires models that incorporate coupled electronic and ionic transport across operating conditions.

Bias-dependent IS offers complementary insight into the dominant device physics. Under SC conditions, the impedance response primarily reflects charge transport and extraction processes.30 Under OC conditions, the IS response is governed by recombination and diffusion-driven mobile ionic redistribution.20,24,25 This is due to the device operating at zero current flow and near-flat-band conditions in the case of standard one sun illumination (open circuit voltage close to the Vbi). At the MPP, the high nonlinearity in the JV response, together with the overlap of charge transport-recombination and extraction, complicates the interpretation of IS spectra. Although IS in PSCs has been widely studied under OC31–33 and, more recently, under SC conditions,30 a unified framework that consistently combines both regimes and enable direct comparison with DD simulations remains limited. In this context, a multi-bias approach is essential to resolve the coupled effects of electric field screening, recombination, and ionic dynamics, which is the focus of this study.

In this work, we present a comprehensive optoelectric characterization methodology for PSCs, combining JV, Suns-Voc and IS with a multi-biasing approach to quantitatively resolve coupled electronic–ionic effects in PSCs. Using an inverted (p–i–n) architecture as a case study, IS measurements are performed under SC and OC conditions over a wide range of illumination intensities. To enable a physically grounded interpretation, the experimental spectra are analyzed using ECMs and compared with the ECM fitting of the one-dimensional DD simulations performed with the open source Driftfusion code.34 To the best of our knowledge, this work provides the first study integrating both OC and SC regimes through combined experimental and DD simulations. In particular, we analyze the IS data through the representation of resistive and capacitive elements as a function of short-circuit current density (JSC) and open-circuit voltage (VOC). First, DD simulations are used to evaluate the impact of key device parameters, with particular emphasis on mobile ion concentration, and to identify new correlations with high- and low-frequency resistive components. We analyze the effect of field screening and IS response difference between SC and OC conditions. Subsequently, the combined experimental–numerical framework enables extraction of key physical parameters, including carrier mobility (µPK), mobile ion concentration (Nion), and shunt resistance (RSH) from SC measurements. In addition, ideality factors (nid) derived from dark JV and Suns-Voc analyses are compared with those obtained from OC impedance, establishing a consistent framework for assessing dominant recombination pathways. This approach further enables evaluation of the coupled effects of mobile ions and interfacial energy band offsets at perovskite/CTL interfaces.

Results and discussion

In this work, we analyzed PSCs with an inverted (p–i–n) configuration that were fabricated on FTO/glass substrates with the structure glass/FTO/NiOx/perovskite/C60/SnO2/Au, as depicted in Fig. 1(a). First, dynamic light JV curves were measured under 1 sun equivalent illumination and compared with DD simulations using the one-dimensional Driftfusion code (see the simulated device structure in Fig. 1(b)). For the device performance analysis, we focused on the variation of four key parameters in the PSCs. First, the carrier mobility in the perovskite µPK was varied from 0.2 to 20 cm2 V−1 s−1, covering the typical range reported in the literature,35 with electron and hole mobilities assumed to be equal for simplicity. Second, the mobile ion concentration Nion was varied from 1015 cm−3 to 1019 cm−3 (ref. 36 and 37), considering two mobile ion species (cations and anions) present within the perovskite layer. From the JV simulations, an ionic concentration close to 1018 cm−3 is expected considering the set of fixed device parameters (Fig. 1(c)). Further details regarding device fabrication, parameter selection (Table S1), and simulation methodology are provided in Section S1 of the SI. Third, the energy band offsets and built-in potential (Vbi) are defined as the difference between the anode and cathode work functions ϕaϕc (Fig. 1(b)). Interfacial band misalignment can effectively reduce Vbi impacting the JV characteristics (see Fig. 3). In the simulations, Vbi is modified by varying the valence band offset ΔVB at the perovskite/HTL interface and the conduction band offset ΔCB at the perovskite/ETL interface through adjustment of the electron affinity of the respective CTLs. The CTLs are assumed to be highly doped, with their Fermi level positioned 100 meV from the band edge (conduction band for the ETL and valence band for the HTL, respectively). For simplicity, metal contacts are fixed as ohmic, and their Fermi level is perfectly aligned with the respective CTL Fermi level as an approximation in the DD model (SI section S1). Fourth, bulk recombination is modelled via defect-assisted Shockley–Read–Hall (SRH) processes assuming a single trap level34 characterized by equal electron–hole lifetimes (τSRHPK = τe = τh) in the PK bulk.
image file: d6el00034g-f1.tif
Fig. 1 (a) PSC schematic and corresponding top-view photograph deposited on FTO/glass. (b) Energy levels of the one-dimensional structure, before contact equilibrium, defined in DD simulations. (c) Experimental vs. DD simulated JV curves, varying Nion (cm−3) = {1015, 1017, 1019} and µPK (cm2 V−1 s−1) = {0.2, 20}, at τSRHPK = 1 µs and a low Vbi = 0.6 V (ΔVB = 500 meV and ΔCB = 300 meV). All JV scans are simulated and experimentally performed in reverse direction at 30 mV s−1 and under 1 sun equivalent illumination.

After the JV measurements, the IS response was measured under dark conditions and increasing illumination intensity (Ψ) from 10−4 to 1 sun (1000 Wm−2), in the range of 100–1 MHz under ambient conditions and at a controlled temperature of 25 °C. Measurements were performed under both SC and OC conditions. The results are shown in Fig. 2, as Nyquist plots with real (Z′) vs. (–Z″) imaginary semicircle representation and the corresponding frequency-dependent capacitance Bode plots.


image file: d6el00034g-f2.tif
Fig. 2 IS data with increasing Ψ, measured under SC (a and c) and under OC (b and d) bias conditions, presented as: Nyquist plots (a and b), with real Zvs.Z″ imaginary components. Multipliers indicate the required scale-up factor for full magnitude display in measurements towards low Ψ conditions. Bode plots (c and d), with frequency-dependent capacitance. Experimental data (dots) and respective fits (solid lines) to the selected ECM, as the inset depicted in (d).

Impedance spectra were fitted to the selected ECM, as shown in the inset of Fig. 2(d). The model consists of a nested configuration connected in line with a series resistance (RS), accounting for contact- and transport-related ohmic losses. Two primary Voigt elements, each comprising a resistor (R) in parallel with a capacitive element (C), describe the high-frequency (HF) and low-frequency (LF) responses, with characteristic relaxation times τ = RC. To account for non-ideal capacitive behaviors arising from interfacial inhomogeneities and material disorder, ideal capacitors were replaced by constant phase elements (CPEs), reflecting a distribution of relaxation times rather than a single one.38 The high-frequency semicircle (ω > 1 kHz) is usually attributed to electronic transport-recombination and geometric capacitance effects of the multilayer device stack. A second semicircle at low frequencies (tens Hz to mHz) is ascribed to additional slow ionic–electronic dynamics and its coupling to interfacial charge accumulation and recombination.

The fitted values of the individual R and C elements were analyzed as a function of JSC and VOC. To interpret the experimental results, IS spectra were simulated using DD simulations under equivalent bias and illumination conditions, while varying key device parameters, particularly the mobile ion concentration. Under SC conditions and low illumination, the LF semicircle is often not fully closed within the frequency range measured experimentally (until 100 mHz), which may introduce uncertainty in the extraction of the LF components (RLF and CLF). Therefore, experimental accuracy is very important when analyzing extrapolated LF parameters. DD simulations were extended to lower frequencies (down to 0.1–1 mHz), enabling a more reliable estimation (see SI Section S4 and Fig. S4.17). However, when comparing simulations and experiments, uncertainties related to extrapolation and parameter correlation should be considered. Both experimental and simulated spectra were fitted using the same ECM, enabling a consistent extraction of circuital elements, and a summary of the fitting parameters, including errors, is provided in the SI (Section S4, Tables S4.1–S4.4).

A shunt resistance RSH was not explicitly included in the selected ECM, although it is included in the DD simulator. The contribution of RSH to the resistive components (RHF and RLF), which depends on bias and illumination conditions,25 is analyzed in the next sections. Further details on the measurement protocol, the impedance transfer function of the selected ECM (with and without the RSH element), and discussion of additional RC contributions reported for PSCs are provided in Section S2 of the SI.

Analysis of JV and Suns-Voc characterization

Performance parameters extracted from JV measurements under 1 sun illumination are shown in Fig. 3 and summarized in Table S3.1 of the SI. Experimental results (dot distributions) are compared with DD simulations (plots). Although VOC values exceeding 1100 mV were achieved, reduced JSC and FF limited the PCE compared with state-of-the-art inverted PSCs39 (Table S3.2 of the SI). While FF losses are partly attributable to high series resistance (Rs) and/or low shunt resistance (RSH), reduced JSC may arise from optical or extraction losses.40 DD simulations performed with fixed Rs, RSH, and photogeneration show that the performance limitations also originate from coupled effects of reduced carrier mobility and increased mobile Nion, which appears to be governed by band offsets, captured via variations in Vbi.
image file: d6el00034g-f3.tif
Fig. 3 Simulated power conversion efficiency (PCE) (a), open-circuit voltage (VOC) (b), fill factor (FF) (c) and short-circuit current (JSC) (d), extracted from DD simulated JV curves assuming τSRHPK = 1 µs and varying Vbi (V) = {0.6, 0.8, 1}, within the ranges of high (solid lines) and low (dashed lines) electron–hole mobility µPK. Side comparison with experimental results (black dots) with dashed horizontal lines indicating the median of the measured distributions.

Energy band offsets greater than 300 meV (low Vbi) are detrimental for the PCE, VOC and FF in PSCs.13,14,40 However, simulations (Fig. 3(a–c)) reveal enhanced tolerance to such band offsets as Nion increases from 1015 to 1019 cm−3, due to ionic screening that lowers interfacial barriers even under forward bias (MPP and OC; SI Section S4, Fig. S4.1 and S4.2), in line with previous reports.19,20 Yet, as shown in Fig. 3(d), at low µPK, high Nion hinders charge extraction and reduces the Jsc,40 evidencing a trade-off between barrier screening and transport constraint. We note that for other device configurations with low doped CTLs and high interface recombination, an increase of the mobile ion concentration leads to a decrease of the PCE.

Experimental dark JV curves and Suns-Voc (JscVOC points) measurements are presented in Fig. 4(a). Dark JV exhibit three regimes: shunt-dominated leakage at low bias (V < 0.6 V), a recombination-controlled intermediate region, and RS-limited saturation at high bias (V > 1.1 V), when Vbi is surpassed and the injection of charge is significative. In the recombination regime, the current density (Jd) follows the diode expression:41

 
image file: d6el00034g-t1.tif(1)
where kB is the Boltzmann constant, q is the elementary charge, J0 is the saturation current density pre-factor, nid is the ideality factor and T is the temperature of the internal diode. The Rs induces V = VintJ RS, and the internal voltage, Vint, approximates the quasi-Fermi level splitting (ΔEF/q).11,42,43 Therefore, Suns-Voc measurements directly probe intrinsic recombination, as VOC = Vint under OC conditions and a sufficiently large RSH 8,9 Experimental JscVOC points in Fig. 4(a) closely reproduce the Jd profile without the Rs saturation effect towards high applied voltages.


image file: d6el00034g-f4.tif
Fig. 4 (a) Dark JV curves in forward (solid) and reverse (dashed) sweep directions at 30 mV s−1, directly compared with Suns-Voc (JscVOC) measurements (solid dots) for recombination analysis at the diode-like current (Jd) zone. (b) DD simulated dark JV curves (reverse scans), varying Nion (cm−3) = {1017, 1018, 1019, at µPK = 0.2 cm2 V−1 s−1, low Vbi at 0.6 V (ΔVB = 500 meV and ΔCB = 300 meV) and RSH = 108 Ω cm2. The nid values of 1 and 2 were estimated using linear regression fits to eqn (1) and from its local derivative minimum applied to the JV (nid (V) inset in (b)).

An ideality factor nid close to 2 (see SI, Tables S3.3 and S3.4) was obtained experimentally using eqn (1), as shown in Fig. 4(a), which suggests dominant SRH recombination.8,41,44 In classic recombination theory for p–n junctions, nid = 1 indicates that the JV response is dominated by band-to-band recombination in the quasi-neutral regions, while nid = 2 corresponds to dominant SRH recombination mediated by deep defects in the space charge region. In inverted PSCs, strong interfacial recombination may reduce the apparent nid towards unity.7,17 Within the DD framework, modifications of Vbi, via ΔCB (PK/ETL), ΔVB (PK/HTL), or interfacial Nion accumulation, directly modulate carrier collection and modify the magnitudes of nid and J0.12 As shown in Fig. 4(b) the diode-regime recombination analysis is highly dependent on Nion, complicating quantitative extraction of nid in these devices.

Comparable nid values were obtained from Suns-Voc and dark JV curves (SI, Tables S3.3 and S3.4), whether extracted by linear regression or from the local derivative yielding the minimum nid(V), as shown in the inset of Fig. 4(b). As Suns-Voc measurements largely eliminate RS and RSH contributions, recombination remains governed by minority carrier concentrations. Under illumination, high Nion can therefore produce apparent nid equal and above 2 (SI, Fig. S4.3).

Consistent with the JV analysis, at a low µPK and high band offsets, the tolerance effect at high Nion cannot fully compensate recombination losses. Simulations show electron–hole concentration imbalances within the PK layer (see SI, Fig. S4.4) for large band offsets ΔVB and ΔCB at the PK/HTL and PK/ETL interface, respectively. These coupled interactions between band offsets and mobile ions, and their impact on recombination, are further examined through the comparison between experimental and simulated IS in the following sections.

IS under short-circuit conditions at variable illumination

To further interpret the device behavior, RHF and RLF are plotted as a function of Jsc in double-logarithmic representation, as shown in Fig. 5, comparing experimental data with DD simulations varying µPK and Nion. Under SC conditions, the internal electric field, determined by Vbi, can be partially screened by mobile ion accumulation at the PK/CTL interfaces. However, varying Vbi from 0.6 to 1.0 V in the simulations does not produce significant changes in the resistive or capacitive response across the explored ranges of Nion and τSRHPK. Noticeable deviations arise at low Vbi under transport-limited conditions (i.e. at lower µPK) in the PK, as detailed in SI Fig. S4.5.
image file: d6el00034g-f5.tif
Fig. 5 RHF (a–c) and RLF (d–f), as a function of JSC under increasing Ψ from 1 × 10−4 to 1 sun equivalent, extracted from IS fits to the selected ECM (as the inset of Fig. 4(d)). For DD simulations, the ion concentration varies in the range of Nion = [1015 − 1019] cm−3, with Vbi = 0.6 V, RSH = 108 Ω cm2 and τSRHPK = 1 µs. Effect of increasing Nion at high (b and e) vs. low (c and f) electronic mobility, µPK (cm2 V−1 s−1) = {0.2, 20}, respectively.

In general, RHF and RLF exhibit two distinct regimes as a function of Jsc. At low Ψ, both resistances exhibit an apparent plateau reaching a maximum value, denoted here as image file: d6el00034g-t2.tif. At higher Ψ, they decrease linearly with increasing Jsc, consistent with a dominant recombination resistance (Rrec) associated with the enhanced photogenerated carrier density in the PK bulk. Accordingly, despite their different frequency origins (HF and LF), each resistance contribution can be independently described by a parallel combination of an effective image file: d6el00034g-t3.tif and an illumination intensity-dependent Rrec (Jsc), expressed as follows:

 
image file: d6el00034g-t4.tif(2)
 
image file: d6el00034g-t5.tif(3)

Focusing on the image file: d6el00034g-t6.tif plateaus in Fig. 5(a–c), we find that RHF is affected by an additional resistive contribution (Rion) coming from the static Nion distribution, which screens the internal electric field and remains effectively invariant within the HF perturbation range. The effect of mobile ions in the HF response has been often considered negligible in previous studies.24–26,28 For the PSC architecture investigated here, the combined IS and DD analysis suggests Nion in the range of 1018–1019 cm−3. In the case of low mobile ion concentration and ideally no shunt resistance, the plateau would originate from a resistive dark recombination that is in parallel with Rion. This resistance Rion is independent of illumination intensity and should be distinguished from the Rrec–LF, which is rather associated with additional modulation of recombination from slow ion motion in the LF range.

DD simulations also show that the slope of the linear Rrec decay, both at HF Fig. 5(b and c) and LF in Fig. 5(e and f), is independent of the selected parameters. Additional simulated IS results (SI, Fig S4.6) explore µPK = [0.2–20] cm2 V−1 s−1 and τSRHPK from 10 ns to 1 µs, spanning typical recombination rates reported for comparable PSC devices.20,30,45 The illumination range in which Rrec predominates is strongly governed by µPK and τSRHPK in the PK layer. Hence, we find that the best agreement with experimental IS fits is obtained for medium-to-low mobilities of µPK = [0.2–2] cm2 V−1 s−1 and τSRHPK = 1 µs. A complementary analysis of IS fits, that takes into account the impact of the imbalance of the electron–hole mobilities (µe/µh) in the PK, can be found in the SI (see section S4, Fig. S4.16). Notably, the same RJsc profiles are obtained in DD simulations when varying µPK and τSRHPK independently, as long as their product µPK·τSRHPK, which determines the diffusion length image file: d6el00034g-t7.tif, remains constant for a given Nion. This behavior arises from the implementation of the Einstein relation in the DD simulations, which couples mobility and diffusion coefficient. Under dark conditions, where current is dominated by shunt-assisted leakage recombination, both image file: d6el00034g-t8.tif and image file: d6el00034g-t9.tif would be expected to converge toward RSH, consistent with the JV analysis. Experimentally, RHF and RLF exhibit markedly different magnitudes at the lowest illumination (Ψ =10−4 sun), as shown in Fig. 5(a) and (d). DD simulations at high µPK, in Fig. 5(b) and (e), indicate that RLF approaches the input RSH = 108 Ω cm2 across all Nion; whereas RHF progressively departs from RSH with increasing Nion. The pronounced divergence between RHF and RLF near dark conditions at 0 V bias suggests that the HF and LF responses are differently influenced by RSH, mediated by ionic effects in the PK layer, as illustrated by the ECMs in Fig. 6(a) and (b). From the maximum experimental RLF values, the dark RSH is estimated to be equal or higher than 10 MΩ cm−2 (lower RSH effects on simulated IS are shown in SI Fig. S4.7).


image file: d6el00034g-f6.tif
Fig. 6 (a) Extended ECM proposed from the IS analysis of inverted PSCs in this study. It includes resistance dependence on the static Nion distribution (Rion) at high frequencies, in parallel with internal diode recombination (Rrec–HF) and parasitic RSH. At low frequencies, the diode recombination (Rrec–LF) is modulated by mobile ions in the PK. (b) Equivalent structure from the perspective of individual shunt effects at high (image file: d6el00034g-t10.tif) and low (image file: d6el00034g-t11.tif) frequencies, resulting from a dynamic role of Nion in the parasitic leakage currents, respectively.

It should be noted that the alternative ECMs proposed in Fig. 6(a and b) are not intended for a direct experimental implementation, as parallel resistive elements are reduced to a single equivalent resistance in the fitting process. Rather, they serve as a conceptual framework to illustrate the distinct physical contributions inherent to the RHF and RLF components arising from the multiple “aggregated” ionic and electronic effects identified through DD simulations.

For RLF, shown in Fig. 5(d–f), increasing Nion does not impact the image file: d6el00034g-t12.tif plateau, but enhances Rrec–LF at high illumination. DD simulations indicate that internal bulk screening in the perovskite is reached for Nion ∼ 1017 cm−3 (see SI, Fig. S4.2) enabling ion redistribution under small LF perturbations. Consequently, the interfacial ion layer that contributes an additional Rion at HF becomes less effective at LF due to ion migration. This is of particular importance because, for all the IS fits in this study, the magnitude of RLF was always higher than that of RHF, indicating that the LF contribution dominates the resistive component of the JV response at JSC. Similar trends have been reported in DD simulations of inverted PSCs, where Nion > 1017 cm−3 leads to an overall resistance increase (primarily dominated by RLF) and a concurrent reduction in the low frequency capacitance.30 Importantly, as shown in Fig. 5, RLF and RHF exhibit opposite dependences on mobile ion concentration. An increase in Nion reduces the HF resistance due to enhanced internal field screening, while it increases the LF resistance by modulating charge accumulation at the interfacial barriers. Complementary CJsc profiles are included in the SI (see Fig. S4.8).

Within the wide range of parameters explored in our simulations, the high frequency SC resistance in the dark and under illumination shows a clear dependency on the recombination parameters and the mobile ion concentration, given a sufficiently high shunt resistance. This suggest that, depending on the nature of the coupled capacitance, the high frequency RC response time τHF can be considered as a recombination lifetime. However, our analysis also indicates that the low frequency resistance under dark and low illumination SC conditions is governed by the shunt resistance and shows no dependency on the concentration of mobile ions or the recombination parameters (except for high recombination rates). This implies that the RC response time τLF associated with the corresponding dark low frequency process cannot be straightforwardly interpreted as a recombination lifetime. Furthermore, this also questions the nature of τLF under illumination, whose values typically are in the order of the dark τLF. These findings are not only important for our general understanding of the recombination-related features of impedance spectra in PSCs, but they are particularly relevant for perovskite-based indoor photovoltaic and photodetector applications.

IS under open-circuit conditions at variable illumination

The combined protocol of IS measurements under OC conditions, compared with DD-simulations, enables a refined recombination analysis by separating fast HF processes, where ionic profiles remain effectively frozen, from slower LF dynamics governed by ion redistribution. We measured IS under open-circuit conditions (Vapp = VOC) increasing Ψ from 10−4 up to 1 sun illumination, which corresponds to Voc ≈ 0.6–1.2 V, as presented in Fig. 2(b) and (d). Lower voltages (VOC ≤ 0.6 V) were not accessible due to instrumental limitations. At very low Ψ, the OC response is expected to show trends similar to those reported under SC conditions due to the reduction of electron and hole carrier concentrations in the PK bulk.

The resulting RVOC plots present two regimes, analogously to the SC case, and are described using eqn (2) and (3). RHFVOC profiles are presented in Fig. 7(a–c) (RLFVOC profiles are included in SI section S4, Fig. S4.12) for which the experimental IS data were fitted with DD simulations. We particularly highlight the impact of energy band offsets at the PK/HTL interface (ΔVB, in Fig. 1(b)), which modify Vbi, and of the mobile ion concentration on the IS response under OC conditions.


image file: d6el00034g-f7.tif
Fig. 7 RHF (a–c) and CHF (d–f) under open-circuit conditions for different illumination intensities from 10−4 up to 1 sun equivalent, obtained from IS fits to the selected ECM (inset in Fig. 2(d)). Comparison of experimental IS measurements in (a) and (d) versus DD simulations in (b and c) and (e and f) varying Nion and Vbi at τSRHPK = 1 µs. The nid and m reference values, indicated by dashed lines, were determined using eqn (4) and (5), respectively.

At low VOC < 0.6 V, RHF displays a plateau image file: d6el00034g-t13.tif consistent with a high RSH (∼108 Ω cm2), whose magnitude is modulated by Nion (see the effect of low RSH under varying Nion, in SI, Fig. S4.13). At higher VOC, once RS and RSH contributions are excluded and in the absence of strong injection/extraction barriers (resulting in a strong deviation of Vint from Vapp),46 RHF is predominantly governed by diode recombination under flat-band conditions, following the characteristic exponential decay of Rrec:8

 
image file: d6el00034g-t14.tif(4)
In line with the approach of Caprioglio et al.,7,17 we evaluated the impact of ΔVB on the recombination analysis by extracting nid from the RHFVOC slope (eqn (4)). Simulated IS fits were compared for moderate band offsets (ΔVB = ΔCB of 250 meV) and high band offsets (ΔVB of 500 meV and ΔCB of 300 meV) mainly at the PK/HTL interface. The corresponding cases, with Vbi = 0.9 V and 0.6 V, are shown in Fig. 7(b) and (c), respectively.

Comparing experimental data (Fig. 7(a)) with DD simulations (Fig. 7(b and c)) in the Rrec–HF decay regime at increasing Voc reveals that higher Nion leads to larger extracted nid values, consistent with the dark JV analysis. Experimental nid (HF) values closer to 2 for representative devices confirm SRH-dominated recombination in the investigated PSCs. At the high Nion range (1018–1019 cm−3) identified under SC conditions, the electric field in the PK bulk becomes fully screened. Notably, at medium Vbi and high Nion, the inflection point of RHFVOC is at Vbi.

In PSCs, the resistance extracted from IS under OC conditions is commonly interpreted as electronic at HF, where ionic motion is effectively frozen, and as ion-modulated at LF due to ionic redistribution. The electronic resistance exclusively refers to the charge carriers (electrons and holes) that can follow the HF perturbation. In that sense, under OC conditions,31 the HF response is governed by recombination consistent with diode behavior. However, even at HF, the resistance can be affected by the effect of mobile ions via field screening and modification of the charge density profile (as seen in Fig. 7). Our results show that this “ionic–electronic contribution separation” is most valid at Voc near flat-band conditions (Fig. 7(b) and (c), dashed line), while deviations arise at lower illumination or away from Vbi. This approximation remains valid over a broader range of Vapp approaching to Vbi, particularly in devices with higher Vbi (Fig. 7(b and c)). Under OC conditions, LF features arise from ion-induced modulation of the internal electric field (linked to Vbi, see Fig. S4.12) and interfacial charge accumulation. Notably, devices with larger Vbi exhibit a reduced dependence of RLF on the mobile ion concentration. By contrast, under SC conditions, both HF and LF resistive components are influenced by mobile ions through distinct mechanisms. Under low illumination conditions, the formation of a HF resistance plateau depends on the mobile ion concentration (if the electronic mobility is high enough), highlighting the impact of ionic screening on the nominally “electronic” response. At LF, RLF is governed by interfacial charge accumulation and dependent on mobile ionic parameters. Therefore, mobile ions influence both HF and LF resistances, emphasizing the need for a unified ionic–electronic interpretation of IS spectra.

Experimental and simulated CHFVOC profiles are shown in Fig. 7(d–f). In all cases, CHF exhibits a bias-independent contribution up to 0.9 V, corresponding to the total geometrical capacitance (CTgeo), followed by a pronounced increase (≈2–5 times within ∼200 mV), whose magnitude depends on Vbi and Nion. Illustratively, a second sample also showed an apparent saturation at high values of VOC > 1.0 V (Fig. 7(d)). The monotonic increase is consistent with the onset of chemical-like electronic capacitance associated with carrier accumulation, whereas the saturation behavior may indicate additional parasitic contributions, such as contact depletion capacitance.36,37,47 However, additional effects from a temperature rise in the device during IS measurements at high Ψ cannot be fully excluded. As a first approximation, CHF increases exponentially towards higher VOC following the relation:

 
image file: d6el00034g-t15.tif(5)
where C0 corresponds to the chemical capacitance at dark equilibrium and m to the factor limiting the voltage-dependent activation related to electron and hole accumulation in the PK layer at a given forward bias.48 The effective CHF values presented in Fig. 7(d–f) were calculated following the fitting methodology presented in section S2 of the SI (eqn (S23)). A summary of the IS fitting results is provided in section S4 of the SI (Tables S4.1–S4.4). At HF, the CPEHF fits generally present values of αHF > 0.91, indicating a response close to an ideal capacitance behavior, with limited impact on the extracted CHF and mHF values.

From DD simulations in Fig. 7(e and f), we observe that the defined ΔVB offset shifts the activation of CHF (V) towards higher VOC, likely by changing the activation factor m, as in eqn (5). For large ΔVB (i.e., low Vbi) at low Nion, the misalignment of the energy level at the PK/HTL interfaces increases the hole injection barrier under high VOC, leading to electron accumulation in the PK bulk (see SI, Fig. S4.4).49 Increasing Nion effectively reduces this injection barrier due to ionic screening in the PK (see SI, Fig. S4.12). The saturation of CHF at high VOC is also reproduced in DD simulations, particularly for the case of large energy band offsets (Fig. 7(e)). Experimental extracted m values closer to 5 (Fig. 7(d)) suggest a high Nion in the investigated PSCs. Although the parameter m can provide insight into the magnitude of Nion, large extracted m values in an exponential fit may indicate that the capacitance–voltage dependence is not purely exponential, but instead associated with a transition between regimes and/or the overlap with polynomial or fractional space-charge capacitance contributions.

In this work, we do not include the analysis of additional inductive effects on performance loss, as reported in the IS literature for some PSCs. For all the IS fits presented, as shown in Fig. 2, CPE values at HF and LF for the selected ECM displayed a dominant capacitive nature. However, we do observe some incipient inductive signatures only towards limiting frequencies <1 Hz for some experimental measurements under OC conditions at high illumination close to 1 sun. From DD simulations, we note that dominant inductive features, from mid to low frequencies (see SI Section S4, Fig. S4.10), can emerge mainly under conditions where VOCVbi, as reported in literature.32,50 The inductive behavior is generally associated with surface polarization and interfacial barriers that dynamically modulate charge injection and extraction under ion redistribution,51,52 resulting in a phase delay between voltage and recombination currents.51,53,54

Conclusion

By combining JV, Suns-Voc, and multi-bias IS with drift-diffusion simulations, we conclude that the interplay between mobile ions and interfacial energy band offsets at perovskite/CTL interfaces can limit the electronic transport and recombination in inverted (p–i–n) PSCs, ultimately affecting the device performance. Pronounced band offsets at the PK/CTL interfaces were identified as a key factor limiting FF and VOC. Dark JV and Suns-Voc analyses indicate high mobile ion concentrations (Nion = 1018–1019 cm−3), which enhance tolerance to interfacial band offsets and influence the extracted nid. However, high Nion values cannot fully compensate for reduced charge transport in the case of low carrier mobility in the perovskite (µPK ∼0.2 cm2 V−1 s−1).

IS measurements under both SC and OC conditions combined with DD simulations were performed under equivalent bias and illumination, enabling a consistent interpretation of the impedance response. Experimental and simulated IS spectra were fitted with a common ECM as a function of Jsc and Voc. IS under SC conditions enabled an independent estimation of the electronic mobility (0.2–2 cm2 V−1 s−1), mobile ion concentration (1018 – 1019 cm−3), and the dark shunt resistance (107–108 Ω cm2). Complementary OC at IS revealed distinct signatures of coupled ionic–electronic processes, linking resistive and capacitive responses to ion density and effective built-in voltage.

The role of the mobile ion concentration was analyzed for both regimes, SC and OC. Under SC conditions, the high- and low-frequency resistances exhibit distinct dependencies on ion concentration, associated with ionic screening and interfacial charge accumulation, respectively, highlighting their different physical origins. Under OC conditions, the analysis reveals that the high-frequency response approaches a purely electronic recombination regime near flat-band conditions influenced by the static ionic distribution, while low-frequency features reflect ion-modulated recombination. Our simulations yield that the extracted ideality factor is also affected by the effective built-in voltage. Finally, we show that under dark conditions at 0 V, the RLF resistance is dominated by the shunt resistance and is largely independent of recombination and Nion. Consequently, the associated RC time constant cannot be directly interpreted as a recombination lifetime.

Overall, this integrated methodology provides a physically grounded framework to disentangle transport, recombination, and ionic effects in perovskite photovoltaics, offering guidance for interface optimization and device performance analysis.

Conflicts of interest

There are no conflicts to declare.

Data availability

The data supporting the findings of this study, including experimental measurements and device characterization data, are available within the article and its supplementary information (SI). Additional raw data generated during the study are available from the corresponding authors upon reasonable request. Supplementary information is available. See DOI: https://doi.org/10.1039/d6el00034g.

Acknowledgements

This work was supported by the French National Research Agency (Agence Nationale de la Recherche, ANR; Grant Nos. ANR-21-CE05-0022 and ANR-IEED-002-01) and by the National Association for Research and Technology (Association Nationale de la Recherche et de la Technologie, ANRT; Grant No. 2021/1814). The authors gratefully acknowledge this financial support.

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