Open Access Article
Yong Huang†
a,
Xiqi Yang†a,
Xiaoqing Chen*a,
Rongkun Zhoua,
He Huanga,
Di Lua,
Yongcai Hea,
Wencai Zhou*b,
Hui Yana and
Zilong Zheng
*a
aState Key Laboratory of Materials Low-Carbon Recycling, Beijing Key Lab of Microstructure and Properties of Advanced Materials, College of Materials Science and Engineering, School of Information Science and Technology Key Laboratory Optoelectronics Technology of Ministry of Education, Beijing University of Technology, Beijing 100124, China. E-mail: zilong.zheng@bjut.edu.cn; chenxiaoqing@bjut.edu.cn
bHubei Key Lab of Photoelectric Materials and Devices, School of Materials Science and Engineering, Hubei Normal University, Huangshi, Hubei 435002, China. E-mail: zwc@hbnu.edu.cn
First published on 17th April 2026
Perovskite solar cells (PSCs) have achieved efficiencies exceeding 27%, yet their performance remains limited by defect-induced nonradiative recombination. Although hydrogen interstitials (Hi) are conventionally considered as bulk defects, this study reveals the dynamic instability of Hi within the bulk lattice of FAPbI3, which drives spontaneous migration to surface sites due to thermodynamic stabilization at the interface. By combining all-atom molecular dynamics (AAMD) with nonadiabatic molecular dynamics (NAMD), we elucidate the migration pathway of Hi and its electronic implications. Surface-trapped Hi induces significant lattice distortion, resulting in the formation of deep-level defect states and a modified potential energy landscape. This reorganization reduces the electron capture barrier (ΔEn decreasing from 0.09 eV to 0.03 eV) and the hole capture barrier (ΔEp dropping from 0.24 eV to 0.17 eV), and increases carrier capture coefficients by an order of magnitude (from 10−8 cm3 s−1 to 10−7 cm3 s−1). Strengthened vibronic interactions and enhanced nonadiabatic couplings shorten the carrier lifetime from 0.8 ns (bulk Hi) to 0.1 ns (surface Hi), indicating surface-accumulated Hi is the dominant nonradiative recombination source rather than bulk Hi. These findings emphasize that interfacial hydrogen management, rather than conventional bulk passivation, is critical for designing suppression strategies to overcome performance limitations in PSCs.
Broader contextPerovskite solar cells (PSCs) face fundamental efficiency limits from defect-induced recombination. While hydrogen interstitial (Hi) defects are recognized as detrimental, their dynamic behavior and spatial redistribution have been significantly overlooked. This work establishes that Hi in FAPbI3 are intrinsically unstable in the bulk lattice and migrate spontaneously to surface sites, where they achieve thermodynamic stabilization. This surface accumulation induces severe lattice distortion and deep-level trapping state that enhance carrier capture coefficients and reduce carrier lifetimes by nearly an order of magnitude compared to bulk-located defects. Our findings shift the focus of defect management by demonstrating that interfacial hydrogen, rather than its bulk form, dominates recombination losses. This new understanding resolves a critical limitation of conventional bulk passivation, which proves inadequate for managing high-mobile defects. This conclusion is supported by recent advances in passivation strategies, for instance multifunctional molecules that simultaneously engage with surface defects and co-modification approaches that reconstruct the perovskite surface to suppress defect activity. By connecting hydrogen migration dynamics with interfacial recombination kinetics, this study provides an understanding of mobile defects in soft lattice materials. These insights are essential for overcoming efficiency limitations in PSCs and provide strategic guidance for defect engineering in related semiconductor technologies. |
Extensive investigation over the past decade has explored the defect physics in metal halide perovskites through combined experimental and theoretical approaches. Early research focused predominantly on B-site (Pb) and X-site (I) defects as principal nonradiative recombination centers, consistent with the orbital characteristics of the band edge states.8 More studies have revealed the significant role of hydrogen-related defects originating from the A-site (MA and FA) cation deprotonation. For instance, hydrogen vacancies (VH)9 and hydrogen interstitials (Hi),10 have been identified as major contributors to nonradiative losses in MAPbI3 and FAPbI3 perovskites.
In contrast to VH, which exhibit self-healing behavior through coordination with lattice ions thereby suppressing their carrier capture coefficients,11–13 Hi present a more severe challenge to device stability and performance. Hi form persistent deep-level traps that induce significant nonradiative recombination within the bulk lattice.10 More critically, Hi exhibit high mobility with low migration potential barrier (0.17 eV) and strong thermodynamic driving force for redistribution.14–16 This unfavorable combination may promote the dynamic accumulation of Hi at charge sensitive regions such as surfaces.17 The Hi migration behavior has been experimentally confirmed and further accelerated under illumination and humidity,18,19 providing a mechanistic explanation for observed device instabilities, including current–voltage hysteresis, surface recombination, and environmental degradation.
Conventional bulk passivation strategies, for instance halogen mixing and alkali-metal incorporation, have demonstrated restricted effectiveness in mitigating Hi defects due to their inherent high mobility.20–23 This limitation becomes particularly significant when considering the distinct physical and chemical environment present in perovskite, where differences exist between bulk and surface regions that can fundamentally modify defect energetics and dynamics.24 The variation in local coordination and chemical potential suggests that surface-accumulated Hi may exhibit different recombination characteristics compared to bulk-located Hi. This critical divergence between surface and bulk Hi behavior highlights a fundamental knowledge gap in understanding the microscopic mechanisms and recombination impact of surface-accumulated Hi defects.
To address this challenge, we employed a multiscale computational framework integrating density-functional theory (DFT), all-atom molecular dynamics (AAMD), and nonadiabatic molecular dynamics (NAMD) to investigate the Hi migration and carrier capture kinetics from bulk to surface in FAPbI3. This approach combines the strengths of AAMD in capturing defect migration dynamics over nanosecond scales, the accuracy of DFT in determining electronic structures and defect energetics, and the capability of NAMD in simulating nonradiative carrier recombination processes. We find that Hi are intrinsically unstable in the bulk lattice, spontaneously migrating to surface sites within sub-nanosecond timescales due to a strong thermodynamic driving force, where they become energetically stabilized. This surface accumulation leads to a pronounced alteration in the defect electronic activity. The charge carrier capture barriers are significantly reduced, which in turn elevates the nonradiative carrier capture coefficient by an order of magnitude. Consequently, the carrier lifetime is drastically shortened from 0.8 ns for bulk-located Hi to 0.1 ns for surface-accumulated Hi, indicating surface-rich Hi as a severe recombination center that limits the performance of PSCs.
This work delivers fundamental insights into the surface-dominated Hi recombination. By connecting hydrogen migration dynamics with surface stabilization mechanisms and carrier capture kinetics, our findings highlight interfacial hydrogen management as an essential strategy for advancing high-performance PSCs.
The migration trajectory of Hi at 300 K is depicted in Fig. 1a. When initially positioned in the bulk region approximately 6 nm below the surface (Fig. 1b), Hi exhibits continuous directional drift toward the surface along with random thermal fluctuations, indicating a thermodynamic preference for surface accumulation. At the beginning (0–0.6 ns), Hi exhibited high mobility through rapid localized motion within neighboring unit cells. Subsequent migration to the surface (0.6–0.9 ns) is followed by lateral confinement and two-dimensional diffusion (0.9–1.2 ns), confirming surface stabilization.
The thermodynamic driving force for this behavior is clarified by the potential energy profile along the direction perpendicular to the surface, as shown in Fig. 1c. A pronounced energy minimum obtained at the surface region provides a quantitative explanation for the spontaneous accumulation of Hi, confirming that the surface possesses a lower energy state compared to the bulk. This potential energy gradient drives both directional migration and subsequent stabilization of Hi at the surface under room-temperature conditions.
Hi formation energies and charge-state transition levels show modifications in surface environments, see Fig. 3. Hi introduces three distinct charge-state transition levels within the bandgap, ε(±), ε(0/−) and ε(+/0). The ε(±) transition involves a two-electrons capture process, which is less probable and therefore contributes weakly to nonradiative recombination. Consequently, the overall recombination kinetics are predominantly governed by the single-carrier capture transitions ε(0/−) and ε(+/0).25 In the bulk, the ε(0/−) level sits 0.41 eV above the valence band maximum (VBM), while ε(+/0) lies 0.32 eV below the conduction band minimum (CBM), indicating the role of Hi as a recombination center. Surface accumulation shifts these levels to 0.53 eV above VBM and 0.38 eV below CBM, with ε(0/−) moving 0.12 eV closer to the conduction band, consistent with the enhanced lattice relaxation seen in surface-stabilized Hi in Fig. 2.
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| Fig. 3 Formation energies of Hi as a function of Fermi level under H-rich conditions for (a) bulk and (b) surface configurations, respectively. | ||
The neutral H0i introduces deep-level defect states within the bandgap, in contrast to the shallow states associated with Hi+ and Hi− defects, as discussed later. The configuration coordinate diagram showes carrier capture processes. For the Hi+ ↔ H0i transition, following photoexcitation, the system progresses through three distinct stages. Initially, Hi+ remains inactive toward carrier capture, denoted as Hi+⋯e−⋯h+; subsequently, electron capture transitions the defect to H0i, denoted as (Hi+ + e−)⋯h+; finally, hole capture returns the system to Hi+, denoted as (Hi+ + e− + h+), see Fig. 4a. The capture potential barriers were obtained from the saddle point on the PES. The electron capture barrier ΔEn+) corresponds to the energy at saddle point between Hi+⋯e−⋯h+ and (H+i + e−)⋯h+ transition; while hole capture barrier (ΔE0p) is derived from saddle point between (Hi+ + e−)⋯h+ and (Hi++e− + h+) transition.
For the (+/0) transition of bulk Hi, the associated configuration-coordinate displacement is ΔQ = 14.4 Å amu1/2. The corresponding electron capture process falls within the Marcus inverted region, characterized with a relative small configuration coordinate Q = 2.6 Å amu1/2 (0 < Q <ΔQ). In this regime, the ΔEn+ decreases as the (0/+) level shifts deeper below the CBM. In contrast, hole capture occurs in the Marcus normal region with Q = 16.4 Å amu1/2 (Q > ΔQ), resulting in an increased ΔE0p with rising transition energy relative to the VBM. With the (+/0) level located at 0.32 eV below the CBM, the resulting energy barriers are ΔEn+ = 0.13 eV for electron capture and small ΔE0p = 0.08 eV for hole capture. These values yield carrier capture coefficients of 2.0 × 10−8 cm3 s−1 for electrons (Cn+) and 2.8 × 10−7 cm3 s−1 for holes (C0p) at room temperature, see Fig. 4c. The modest barriers and efficient capture processes confirm Hi as an effective nonradiative recombination center in bulk regions.
The (0/−) transition of bulk Hi, exhibits distinct characteristics due to large lattice relaxation (ΔQ = 31.9 Åamu1/2), with both electron and hole capture processes occurring in the Marcus inverted regions (0 < Q < ΔQ). The (0/−) transition level are positioned at 0.41 eV above the VBM. The smaller electron capture barrier (ΔE0n = 0.09 eV) compared to hole capture barrier (ΔEp− = 0.24 eV) results in a significantly disparity in capture coefficients. The electron capture coefficient (C0n) reached 1.2 × 10−6 cm3 s−1, whereas the hole capture coefficient (Cp−) is limited to 1.9 × 10−8 cm3 s−1. Therefore, the overall capture coefficient (Ctot) is governed by the slower hole capture process, with the value of 1.9 × 10−8 cm3 s−1, derived from following equations under steady-state conditions.27
Hi surface-trapping substantially modifies these capture kinetics. Surface Hi exhibit larger lattice relaxation ΔQ = 34.3 Å amu1/2 (see Fig. 4d and e), yielding softer PESs and lower capture barriers for both electrons and holes. For the (0/−) transtion level, the electron capture barrier (ΔE0n) decreases from 0.09 eV (bulk Hi) to 0.03 eV (surface Hi), while the hole capture barrier (ΔEp−) drops from 0.24 eV (bulk Hi) to 0.17 eV (surface Hi). These reduced energy barriers lead to a rise in both C0n (up to 7.0 × 10−5 cm3 s−1) and Cp− (up to 1.8 × 10−7 cm3 s−1) by over one order of magnitude, see Fig. 4f. The overall Ctot remained limited by the slower hole capture process of Hi−, yielding Ctot = 1.8 × 10−7 cm3 s−1 at 300 K, approximately an order of magnitude higher than that in bulk (1.9 × 10−8 cm3 s−1).
Our electronic structure results revealed that among three charged states of Hi (Hi+, H0i, Hi−), only the neutral H0i introduces a persistent deep-level defect state within the bandgap. While Hi+ has a negligible influence on the band edges, and Hi− forms only shallow defect states level 0.16 eV away from the band edge (Fig. S1 and S2 in SI), H0i creates a localized state that acts as a recombination center. Notably, this defect level deepens from being 0.53 eV away from the band edge in the bulk to 0.84 eV at the surface. Therefore, H0i was considered as the dominant recombination active species and all subsequent NAMD analysis focused on its behavior. The charge densities of the defect states for both bulk Hi and surface Hi were provided in Fig. S3 of SI.
To explore the phonon-driven recombination mechanism, we calculated the spectral density via Fourier transform of the fluctuations in the energy gaps between relevant states, including CBM-VBM, CBM-Trap, VBM-Trap (see Fig. 5b and e). Each peak in the spectral density characterizes the strength of electron-phonon coupling for a specific phonon mode. The results indicated that the CBM-VBM energy gap coupling is dominated by low-frequency phonon modes (below 100 cm−1), which are associated with Pb–I lattice bending and stretching.30,31 In contrast, the energy gaps involving the H0i trap state (CBM-Trap and VBM-Trap) are significantly modulated by higher-frequency modes (100–300 cm−1) originating from the vibrations and torsions of organic FA molecules.30 This suggests that organic cation dynamics play an indirect but crucial role in the nonradiative recombination process mediated by H0i.
Although H0i defect couples to similar phonon modes in both bulk and surface environments, the coupling intensity is stronger at the surface. This enhancement arises from under-coordinated surface iodide ions and increased rotational freedom of FA cations near the surface. These stronger vibronic interactions also accelerated electronic decoherence, as confirmed by the dephasing functions obtained from the second-order cumulant expansion of the energy gaps correlation functions (see Fig. S4 in SI).32,33 Our calculated decoherence times for the bulk are 9.9 fs (CBM-VBM), 3.5 fs (CBM-Trap), and 3.8 fs (VBM-Trap), consistent with previous reports.34–36 Surface H0i exhibited even shorter decoherence times of 4.7 fs (CBM-VBM), 2.3 fs (CBM-Trap), and 2.4 fs (VBM-Trap), reflecting the stronger dynamic disorder at the surface. Although faster decoherence can, in principle, slow down the recombination rates, our findings indicated recombination is significantly accelerated at the surface. This implies that decoherence is not the rate-limiting factor here, prompting the following investigation into the non-adiabatic couplings (NAC).
We therefore quantified the NAC strength, φi|∇R|φf, which governs the probability of electronic transitions and is correlated with the wavefunction overlap between initial (φi) and final (φf) states. The results were summarized in Table 1 and S1. In the bulk, the CBM-to-VBM NAC was negligible (0.3 meV), leading to a very slow band-to-band recombination rate (0.008 ns−1). In contrast, NAC value between the H0i trap state and the band edges was substantially larger (2.5 meV for CBM-Trap and 0.8 meV for VBM-Trap), resulting in much faster defect-assisted trapping rates of 15.8 ns−1 (electron capture) and 1.2 ns−1 (hole capture).
| NA coupling (meV) | Dephasing (fs) | Rate (ns−1) | ||
|---|---|---|---|---|
| Bulk Hi | CBM-trap | 2.5 | 3.5 | 15.8 |
| VBM-trap | 0.8 | 3.8 | 1.2 | |
| Surface Hi | CBM-trap | 1.9 | 2.3 | 9.4 |
| VBM-trap | 2.9 | 2.4 | 25.4 | |
Critically, at the surface, the defect-mediated NACs increased to 1.9 meV (CBM-trap) and 2.9 meV (VBM-trap), while CBM-VBM coupling remained weak (0.2 meV). This enhancement, driven by the increased lattice distortion and wavefunction localization at the surface, resulted in electron and hole capture rates of 9.4 ns−1 and 25.4 ns−1, respectively. Since the slower carryier capture process dictates the overall recombination rate, the surface recombination rate (9.4 ns−1) is nearly an order of magnitude faster than that (1.2 ns−1) in the bulk. These results indicated that Hi-induced severe nonradiative recombination at the surface is dominated by enhanced non-adiabatic coupling rather than quantum decoherence effects.
Finally, by integrating the effects of lattice vibration, quantum decoherence, and non-adiabatic coupling effects, we performed NAMD simulations to track the recombination kinetics, see Fig. 5c and f. For bulk Hi, approximately 80% of electrons in the CBM were captured by the trap state within tens of picoseconds, followed by recombination with holes in the VBM yielding an overall carrier lifetime of 0.8 ns. In contrast, for surface-accumulated Hi, an ultrafast hole capture process was followed by rapid recombination with CBM electrons, drastically shortening the carrier lifetime to 0.1 ns. This order-of-magnitude acceleration in recombination at the surface confirms that surface Hi acts as a detrimental nonradiative recombination center.
Footnote |
| † Yong Huang, Xiqi Yang contributed equally to this paper. |
| This journal is © The Royal Society of Chemistry 2026 |