Charge transport of phosphonate self-assembled monolayers across large-area molecular junctions
Abstract
Using indium tin oxide (ITO) substrates as the bottom electrode and eutectic gallium and indium (EGaIn) as the top electrode, we successfully formed alkyl phosphate self-assembled monolayers (SAMs) on ITO and molecular junctions in the form of ITO–PO3(CH2)nH//GaOx/EGaIn (n = 8, 10, 12, 14, or 16). The tunneling decay coefficient (β, decay of charge transport rate vs. n) of junctions obtained from direct current (DC) methods is 0.90 n−1 with a log-injection current density (log10|J0|) of 1.87 A cm−2 at an applied bias of 0.5 V, which is confirmed by the impedance spectroscopy results from the resistance of the SAM (RSAM), indicating that the evolution of RSAM with molecular length is the main origin of decay of charge transport rate in the phosphate junctions. The dielectric constant (εr) values of PO3(CH2)nH SAMs measured in junctions range from 2.28 to 2.60, indicating that the semiconductor ITO substrates do not affect the dielectric and electrical responses of junctions. This work provides a compatible platform for studying the interfacial charge transport, dielectric responses, and even potential optical properties of a hybrid electronic system of organic molecules with phosphonic acid anchoring groups, semiconducting substrates and metallic electrodes.

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