Rou-Yu
Li
,
Wenyu
Yuan
*,
Meng-Ru
Cui
,
Boda
Li
,
Hui
Zhang
,
Zhenhao
Peng
and
Quan-Guo
Zhai
*
Key Laboratory of Macromolecular Science of Shaanxi Province, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education, School of Chemistry & Chemical Engineering, Shaanxi Normal University, Xi'an, Shaanxi 710062, China. E-mail: wenyu.yuan@snnu.edu.cn; zhaiqg@snnu.edu.cn
First published on 6th March 2025
The interfaces in heterostructure photocatalysts play an important role in charge migration, but the rational controllable interfacial construction remains a challenge. Herein, a covalently bonded interface with delocalized π bonds was controllably constructed via the encapsulation of UiO-66-NH2 nanoparticles in MUV-10 skeletons. The UiO-66-NH2/MUV-10 heterojunction enabled both efficient capture and conversion of CO2 and H2O. The delocalized π bond in the covalent interface efficiently accelerated interfacial charge migration, suppressed carrier recombination, and reduced the work function for electronic effusion. As a consequence, UiO-66-NH2/MUV-10 exhibited superior CO2 photoreduction activity with H2O under visible light irradiation in the gas–solid phase. The CO evolution rate reached as high as 38.7 μmol g−1 h−1, which surpassed that of most commonly reported gas–solid phase photocatalysts. This work not only provides a feasible strategy for the controllable construction of interfaces but also demonstrates the great potential of interfacial engineering for efficient photocatalysis and other related areas.
To achieve efficient CO2 photoreduction in gas–solid phase, tremendous efforts have been made to address the above challenges.27–29 Among the many methods, heterojunctions are considered to be an extremely effective means to enhance the activity.30 For instance, by gradually inserting Li ions into the TiO2 lattice from the outside, Li et al. constructed a plaque-like Li2TiO3/TiO2 heterostructure to effectively inhibit carrier recombination and improve the CO2 adsorption capacity.31 Bi et al. proposed a novel COF/MOF heterojunction photocatalyst using an olefin (C
C)-linked covalent organic framework (TTCOF) and NH2-UiO-66 as building units, which effectively inhibited carrier recombination and enhanced the reduction of CO2 to CO.32
Nevertheless, electron migration at the interface of heterojunction plays an important role in the development of high-performance heterojunction photocatalysts. The design of strong interface interactions and the overall improvement of their dynamic processes play an important role in promoting CO2 photoreduction, while weak interface interactions will greatly limit the efficiency of electron migration and thus limit its activity. For instance, Wang et al. successfully constructed covalent bonds between CN and CQD in CN-CQD which facilitated efficient carrier migration and CO2 activation. However, the electronegativity of different atoms in covalent bonds leads to electron localization, which affects electron transport.33 Delocalized π bonds provide efficient electron transport channels and have been widely shown to be an effective way to facilitate charge transport (e.g., graphene).34,35 Therefore, the construction of strong covalent interfaces containing delocalized π bonds is of great significance but challenging for photocatalysis.
Constructing amide bonds (–CO–NH–) at the interfaces is promising for overcoming the above challenge.33,36 The π electron on the –CO–NH–carbonyl group and the lone pair electron on the nitrogen atom in the adjacent carbon–nitrogen bond together to form a three-centre four-electron delocalized π bond, which can effectively improve the interfacial charge transfer efficiency (Scheme 1). Herein, MUV-10 and UiO-66-NH2 containing –COOH and –NH2 functional groups were chosen to construct the desired heterojunction with strong covalent bonding. A MOF-in-MOF heterojunction, in which UiO-66-NH2 nanoparticles were encapsulated in MUV-10, was successfully synthesized via a PVP-assisted in situ growth method, and an amide bonded heterogeneous interface was successfully constructed. The results showed that UiO-66-NH2/MUV-10 exhibited superior gas–solid phase CO2 photoreduction activity with a CO evolution rate of 38.7 μmol g−1 h−1 under visible light irradiation, which surpassed those of the most commonly reported gas–solid phase photocatalysts. Further analysis demonstrated that UiO-66-NH2/MUV-10 with a Z-scheme junction exhibits superior gas capture ability toward both CO2 and H2O vapor, reduced work function, suppressed carrier recombination, and accelerated charge transfer efficiency. This study underscores the importance of interfacial bonding design in photocatalysis.
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| Scheme 1 Schematic for the interfacial covalent bonding design for efficient CO2 photoreduction in the gas–solid phase. | ||
000, 10 mL) was added into the suspension, and the mixture was stirred at room temperature for 24 hours. The PVP-modified UiO-66-NH2 nanoparticles were collected by centrifugation at 9000 rpm for 3 minutes, washed three times with DMF, and finally redispersed in DMF.
Fig. 1a illustrates the strategy for synthesizing the UiO-66-NH2/MUV-10 heterostructure. UiO-66-NH2 nanoparticles were synthesized via a solvothermal reaction of ZrCl4 and NH2-BDC in a DMF/HAc/H2O mixed solvent. The resulting UiO-66-NH2 nanoparticles were then stirred in a PVP solution to obtain PVP-modified UiO-66-NH2 nanoparticles. These PVP-modified nanoparticles were subsequently added to a mixture containing Ti(OiPr)4, H3BTC, MnCl2·4H2O, DMF, and CH3COOH. After the solvothermal reaction, the target product UiO-66-NH2/MUV-10 was obtained. The PVP assisted in situ growth method can ensure the effective encapsulation of UiO-66-NH2 in MUV-10, successfully constructing a heterogeneous interface with –CO–NH– bonding. A series of UiO-66-NH2/MUV-10 heterojunction catalysts were obtained by adjusting the amounts of UiO-66-NH2 nanoparticles (denoted as x-UiO-66-NH2/MUV-10, where x represents the amount of UiO-66-NH2/MUV-10).
The crystalline structures of the synthesized samples were characterized using X-ray diffraction (XRD). As depicted in Fig. 1b, the diffraction peaks of the UiO-66-NH2/MUV-10 heterojunction are in accordance with those of UiO-66-NH2 and MUV-10, indicating that the structures of UiO-66-NH2 and MUV-10 remain largely unchanged during heterojunction formation. The XRD patterns also suggest the successful encapsulation of UiO-66-NH2 nanoparticles in MUV-10 skeletons (Fig. 1b and S2†). The morphology and microstructure of the samples were characterized using high-resolution field emission scanning electron microscopy (SEM), transmission electron microscopy (TEM), and high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM). SEM images (Fig. 1c, S3a and b†) show that the UiO-66-NH2 nanoparticles are octahedral with a diameter of approximately 50 nm. MUV-10 is a regular octahedral crystal with a particle size of ∼1 μm (Fig. 1d, S3c and d†). After encapsulation, the morphology has been well preserved. A series of (20, 30, and 40)-UiO-66-NH2/MUV-10 heterojunctions were successfully synthesized via the PVP-assisted in situ growth method, as shown in Fig. 1e and S4.† With increasing amounts of UiO-66-NH2 nanoparticles, obvious agglomeration of UiO-66-NH2 nanoparticles can be observed. TEM images (Fig. 1f–h) reveal that UiO-66-NH2/MUV-10 forms an octahedron with a uniform size of ∼500 nm at low magnification. Under high magnification, UiO-66-NH2 nanoparticles are encapsulated in MUV-10, indicating that this strategy successfully forms MOF-in-MOF heterojunctions. The HAADF-STEM image (Fig. 1i) shows uniform encapsulation of UiO-66-NH2 in MUV-10 in the heterojunction catalyst. Clearly, the approximately octahedral UiO-66-NH2 nanoparticles are well confined to both the surface and interior of MUV-10 in the UiO-66-NH2/MUV-10 heterojunction (Fig. S5 and S6†). The corresponding energy dispersive X-ray (EDX) maps further confirm the nearly uniform distribution of N, Mn, Ti, Zr, C, and O elements and their overlap in a typical region (Fig. 1i).
Fourier transform infrared (FT-IR) spectroscopy was applied to analyze chemical bonds and functional groups in the sample (Fig. S7†). For MUV-10, a strong C
O vibration peak was observed at 1680 cm−1, indicating that MUV-10 is rich in carboxyl groups. For UiO-66-NH2, a strong absorption peak at 3000–3300 cm−1 in UiO-66-NH2 can be assigned to N–H vibration, indicating that UiO-66-NH2 is rich in amino groups. 20-UiO-66-NH2/MUV-10, 30-UiO-66-NH2/MUV-10 and 40-UiO-66-NH2/MUV-10 exhibit similar FT-IR spectra. The peaks at 1200–1600 and 1680 cm−1 are assigned to the vibration of C–N and C
O, respectively, which may be caused by the amide bond formed at the hetero-interfaces.
UV-vis absorption spectra were recorded to detect the optical properties of these samples. As shown in Fig. 2a and S8,† all samples exhibit distinct light absorption in the region of 200–600 nm. Compared with the pure MUV-10, the light absorption window of UiO-66-NH2/MUV-10 is significantly broadened due to the narrow band gap of UiO-66-NH2. The light absorption wavelength is slightly red shifted. The corresponding band gaps were further calculated using the following equation: αhγ2 = A(hγ − Eg), where α, h, γ, A, and Eg denote the absorption coefficient, Planck's constant, light frequency, fitting parameter, and bandgap, respectively. The plots of (αhγ)2 against the photonic energy are shown in Fig. 2a and S9.† Pure MUV-10 exhibited the largest bandgap (2.98 eV), while UiO-66-NH2 exhibited the smallest bandgap (2.85 eV). Three UiO-66-NH2/MUV-10 samples showed similar band gap values (approximately 2.90 eV).
The pore structures of the synthesized MUV-10 and UiO-66-NH2/MUV-10 samples were further confirmed by N2 adsorption–desorption isotherms at 77 K. MUV-10 exhibited a typical feature of microporous materials (Fig. 2b), and the calculated pore size distribution (PSD) further verified its microporous structure. Moreover, Brunauer–Emmett–Teller (BET) SSA was calculated to be 802.8 and 1225.8 m2 g−1 for MUV-10 and UiO-66-NH2, while the SSA value for UiO-66-NH2/MUV-10 was as high as 1092.6 m2 g−1, indicating that UiO-66-NH2/MUV-10 showed a higher SSA than pure MUV-10. We further compared the total pore volume (P/P0 = 0.99). The total pore volumes for MUV-10, UiO-66-NH2, and UiO-66-NH2/MUV-10 were 306.4, 667.9 and 390.9 cm3 g−1, indicating that the embedding of UiO-66-NH2 in MUV-10 does not greatly affect the pore structure. Fig. S10† shows the porous structures of MUV-10, UiO-66-NH2 and UiO-66-NH2/MUV-10, wherein the pores with diameters of 4.8, 4.5 and 4.4/5.1 Å could be clearly observed. Compared with pure MUV-10 and UiO-66-NH2, the aperture of UiO-66-NH2/MUV-10 increases.
Gas uptake ability, one of the key factors affecting the photocatalytic CO2 reduction process, was further tested. The CO2 adsorption capacity of UiO-66-NH2, MUV-10, and UiO-66-NH2/MUV-10 at 298 K was 75.8, 45.0, and 66.4 cm3 g−1, respectively (Fig. 2c). Obviously, UiO-66-NH2 showed the highest CO2 absorption capacity among these samples, while UiO-66-NH2/MUV-10 exhibited comparable CO2 uptake ability. The adsorption properties of H2O molecules directly affect the CO2 photoreduction activity in a gas–solid system of CO2 and water vapor. Through the water vapor adsorption performance test of UiO-66-NH2, MUV-10 and UiO-66-NH2/MUV-10 at 298 K, it was found that these samples have excellent water vapor adsorption performance, and the adsorption capacity reached up to 465.9, 403.1, and 368.0 cm3 g−1, respectively (Fig. 2d). The PXRD spectra of the adsorbed samples (Fig. S11†) showed that the whole skeletons were well preserved during the gas adsorption process. The results showed that the pore volume increase of the heterojunction material is beneficial to enhancing the activity of the CO2 reduction process.
X-ray photoelectron spectroscopy (XPS) was performed to study the chemical state of the elements in UiO-66-NH2/MUV-10. All XPS spectra were calibrated to C 1s with a binding energy of 284.6 eV (Fig. S12†). Two peaks in the C 1s XPS spectrum at 285.9 and 288.6 eV are attributed to C–O and O–C
O bonds, respectively, indicating the presence of carboxyl groups (Fig. S12†).40 Three peaks at 530.0, 531.5, and 532.8 eV in the high resolution O 1s XPS spectrum are assigned to C–O, O–H and M–O bonds, respectively (Fig. 3a). Notably, as the UiO-66-NH2 content increases from 20-UiO-66-NH2/MUV-10 to 40-UiO-66-NH2/MUV-10, the intensity of O–H bonds decreases, which may be caused by the condensation reaction between the –NH2 in UiO-66-NH2 and the –COOH in MUV-10. In the N 1s XPS spectra (Fig. 3b), the peaks at 399.9 eV and 401.0 eV are assigned to (C)3–N and N–H bonds, respectively. As the amount of UiO-66-NH2 increases, no obvious intensity increase for the N–H bond can be observed, implying that the –NH2 is involved in the condensation reaction, which suggests the generation of the –CO–NH bond. A plot of O–H/N–H against various amounts of UiO-66-NH2 is shown in Fig. 3c. O–H/N–H decreases with the increasing amount of UiO-66-NH2 in the UiO-66-NH2/MUV-10 formulation, which is consistent with the breakage of –OH and the formation of –NH when the condensation reaction proceeds. All these XPS spectra suggest the successful construction of the interfacial amide bonds in UiO-66-NH2/MUV-10 heterostructures. Two peaks of Zr 3d5/2 and Zr 3d3/2 at 182.9 eV and 185.2 eV can be observed in the Zr 3d XPS spectra (Fig. 3d).36,41 As the amount of UiO-66-NH2 increases, the peak intensity of Zr 3d5/2 and Zr 3d3/2 also increases, reflecting the growing presence of UiO-66-NH2. In the XPS Mn 2p spectrum (Fig. 3d), one peak was observed at 653.1 eV, assigned to Mn 2p1/2. The Mn 2p3/2 spectrum was separated into two peaks at 641.9 and 643.1 eV, which were assigned to Mn3+ 2p3/2 and Mn4+ 2p3/2, respectively.42 The Ti 2p XPS spectrum showed typical peaks for Ti 2p3/2 and Ti 2p1/2, suggesting the oxidation state of Ti(IV) (Fig. 3d),43 which was in accordance with the crystal structure of MUV-10. Both UiO-66-NH2 and NUV-10 demonstrate weak ESR intensity. The signal at g = 2.01 for the UiO-66-NH2/MUV-10 heterojunction can be clearly observed, which can be attributed to the presence of the π-conjugated electron system in amide bonds (Fig. S13†). The highly enhanced ESR spectra suggest that the heterostructure demonstrates a tight interaction due to the formation of interfacial amide bonds.
In addition, the photocatalytic stability of UiO-66-NH2/MUV-10 was examined using a recycling test (Fig. 4e and S20†). During 6 cycles of photocatalytic reaction, the CO2RR activity of UiO-66-NH2/MUV-10 can be well preserved. The SEM image in Fig. S21a† suggests that the structure of the UiO-66-NH2/MUV-10 heterojunction basically remains intact, confirming its high stability. XRD and XPS were utilized to characterize the UiO-66-NH2/MUV-10 sample after the photocatalytic reaction (Figs. S21b and S22†). Compared with UiO-66-NH2/MUV-10 before the reaction, no obvious changes were observed in the sample after CO2 photoreduction, verifying its excellent photostability. The enhanced intensity of the M–O bond may be caused by the SiO2 impurities from the quartz substrate. Its superior stability originated from the high thermal stability of MUV-10 and UiO-66-NH2, while the gas–solid photocatalytic system enabled excellent recycling features.44 Overall, the obtained UiO-66-NH2/MUV-10 demonstrated superior CO2 photoreduction activity due to the covalently bonded interfaces with delocalized π electrons. Table S2† shows that UiO-66-NH2/MUV-10 outperforms most reported excellent photocatalysts in the gas–solid phase system, including TiO2, C3N4, PCN-601, and 2D Mn-MOFs (Fig. 4f).
The photogenerated current as an important indicator of photoelectric response was assessed using a three-electrode system. The photocurrent of UiO-66-NH2/MUV-10 reached as high as ∼0.13 mA cm−2 (Fig. 5a), which is 10-fold and 5.2-fold higher than that of MUV-10 and UiO-66-NH2, respectively, suggesting the positive effect of the delocalized π bond between the UiO-66-NH2 and MUV-10 interface on photoelectron excitation. Among all heterojunction samples, 30-UiO-66-NH2/MUV-10 demonstrated the highest photocurrent, which is consistent with the CO2 photoreduction results (Fig. S23†). Electrochemical impedance spectroscopy (EIS) spectra and the Nyquist plots show that UiO-66-NH2/MUV-10 has the lowest charge transfer resistance, indicating the enhanced charge transfer efficiency (Fig. S24, S25 and Table S3†). The suppressed charge-carrier recombination was then probed using the steady-state photoluminescence (PL) technique. As shown in Fig. 5b, the PL intensity is drastically quenched compared with those of UiO-66-NH2 and MUV-10, indicating that the recombination of photoexcited charge carriers has been efficiently suppressed (Fig. S26†). Time resolved photoluminescence spectroscopy (TRPL) was further applied to study the charge carrier dynamics and the lifetime of photoinduced carriers. As shown in Fig. 5c, the average fluorescence lifetimes of UiO-66-NH2, MUV-10, 20-UiO-66-NH2/MUV-10, 30-UiO-66-NH2/MUV-10, and 40-UiO-66-NH2/MUV-10 were 4.71, 9.33, 4.16, 3.95, and 5.17 ns, respectively. 30-UiO-66-NH2/MUV-10 had the shortest survival time, suggesting the efficient separation of photogenerated carriers (Fig. S27†). The above results indicate that the Z-scheme UiO-66-NH2/MUV-10 heterojunction is capable of inhibiting charge-carrier recombination and facilitating charge transfer due to the delocalized π bond formed at the interfaces.
O and C
O), implying the efficient activation and conversion of the adsorbed CO2 into CO. Notably, surface-bonded OH− from adsorbed H2O (∼3412 cm−1) can be clearly detected in UiO-66-NH2/MUV-10. Interestingly, when UiO-66-NH2/MUV-10 was again exposed to CO2 gas without H2O, the H2O peak can still be observed, indicating that the adsorption of H2O was strengthened in UiO-66-NH2/MUV-10. In addition, the peak intensity of the *COOH and *CO intermediates in UiO-66-NH2/MUV-10 was significantly higher than that in UiO-66-NH2 and MUV-10, suggesting the high CO2RR activity (Fig. 5e). These results imply that the adsorption of gas molecules was strengthened, while their kinetics accelerated.
The electronic structure and charge migration pathway were analysed via valence-band XPS and UPS. The valence-band potentials of MUV-10, UiO-66-NH2, 20-UiO-66-NH2/MUV-10, 30-UiO-66-NH2/MUV-10 and 40-UiO-66-NH2/MUV-10 were determined from valence-band XPS spectra to be 2.42, 2.20, 2.35, 2.37, and 2.38 eV, respectively. Based on the formula ECB = Eg − EVB, the conduction potentials of MUV-10, UiO-66-NH2, 20-UiO-66-NH2/MUV-10, 30-UiO-66-NH2/MUV-10 and 40-UiO-66-NH2/MUV-10 can be obtained (Fig. S28†). The UPS measurements were calibrated using a gold reference sample, and the working function values of the sample were correctly obtained in our setup. The work functions of 20-UiO-66-NH2/MUV-10 (2.11 eV), 30-UiO-66-NH2/MUV-10 (2.02 eV) and 40-UiO-66-NH2/MUV-10 (2.34 eV) were lower than those of MUV-10 (2.36 eV) and UiO-66-NH2 (2.50 eV) (Fig. 5f). Notably, the work function of UiO-66-NH2/MUV-10 is significantly reduced to 2.02 eV, indicating that the delocalized π bonds in the covalent interfaces can significantly reduce the energy barrier for electron effusion (Figs. S29†).
To further understand the above CO2 and H2O adsorption performances, GCMC simulations were performed to analyse the adsorption sites and distribution density of CO2 and H2O molecules. The adsorption sites and strength were measured by the distance between the guest molecule and the skeleton via loading one molecule of CO2 or H2O into the skeleton. In MUV-10 (Fig. S30a†), CO2 underwent CCO2⋯O and OCO2⋯C electrostatic interaction with uncoordinated carboxylic O and C (CCO2⋯O = 3.57–3.58 Å and OCO2⋯C = 3.50–3.88 Å); whereas, in UiO-66-NH2, the distances between CO2 and the framework are 3.56 (CCO2⋯O) and 3.15–3.98 Å (OCO2⋯C) (Fig. S30c†). In addition, the distances between the H2O molecule and adsorption sites were measured to be 3.01–3.63 Å (O–H⋯O) for MUV-10, while that for UiO-66-NH2 are 2.92–3.77 Å (O–H⋯N), and 2.87–3.50 Å (O–H⋯O) (Fig. S30b and d†). Nevertheless, the calculation results reveal that the CO2 loading density in UiO-66-NH2 was lower than that in MUV-10 (Fig. S31 and S32†), which was due to the presence of–NH2 in UiO-66-NH2 that hinders the entry of gas molecules. The obtained results suggest that both MUV-10 and UiO-66-NH2 possess high adsorption ability toward both CO2 and H2O via the C⋯O interaction and N⋯H interaction.
Based on the above results, the proposed photocatalytic mechanism is shown in Fig. 5g. Upon photoexcitation, the electrons of UiO-66-NH2 transition from the valence band to the conduction band, which then quickly transfer to MUV-10 in the Z-type heterojunction through the interface and stimulate the CO2 reduction. The CO2 molecule is first adsorbed and activated, which then receives electrons and protons to form *COOH intermediates,45 further accepts a proton to remove a molecule of water to form *CO, and then desorption of CO occurs to realize the entire photocatalytic CO2 reduction process.46 The covalent π electron interface plays three important roles: (1) inhibition of electron–hole recombination, (2) reduce the electron effusion work function and achieve efficient electron interface transfer, and (3) enhance the capture, adsorption and conversion of gas molecules. In conclusion, the covalent π electron interface of heterojunctions can effectively enhance the photocatalytic CO2 reduction activity.
Footnote |
| † Electronic supplementary information (ESI) available. See DOI: https://doi.org/10.1039/d5ta00012b |
| This journal is © The Royal Society of Chemistry 2025 |