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Correction: Growth of p/n-type BiFeO3 thin films for construction of a bilayer p–n junction for photodegradation of organic pollutants
Hao-Yun
Tu
a and
Xiaoding
Qi
*ab
aDepartment of Materials Science and Engineering, National Cheng Kung University, Tainan City 70101, Taiwan. E-mail: xqi045@ncku.edu.tw
bCenter for Micro/Nano Science and Technology, National Cheng Kung University, Tainan City 70101, Taiwan
First published on 23rd December 2024
Abstract
Correction for ‘Growth of p/n-type BiFeO3 thin films for construction of a bilayer p–n junction for photodegradation of organic pollutants' by Hao-Yun Tu et al., J. Mater. Chem. A, 2024, 12, 12752–12761, https://doi.org/10.1039/D4TA01615G.
The authors regret that an incorrect version of Fig. 1 was included in the originally published article. The correct version of Fig. 1 is shown below.
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| Fig. 1 XRD θ–2θ scans. Single layer of BFO deposited with the Ar/O2 ratios of (a) 80/2 (p-type), (b) 80/5, (c) 80/10 (n-type), and (d) 80/15, respectively. (e) pn bilayer. | ||
The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.
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