Open Access Article
Abid Zaman
*a,
Salhah Hamed Alrefaeeb,
Shirin Shomurotovac,
Anvar Nurmuhammedovd,
Salah Knani*e,
Vineet Tirth
fg,
Ali Algahtanifh and
Noureddine Elboughdiri
i
aDepartment of Physics, Riphah International University Islamabad, 44000, Pakistan. E-mail: zaman.abid87@gmail.com
bDepartment of Chemistry, College of Science in Yanbu Governorate, Taibah University, Saudi Arabia
cDepartment of Chemistry Teaching Methods, Tashkent State Pedagogical University Named After Nizami, Bunyodkor Street 27, Tashkent, Uzbekistan
dWestern Caspian University, Baku, Azerbaijan
eCenter for Scientific Research and Entrepreneurship, Northern Border University, Arar 73213, Saudi Arabia. E-mail: saleh.kenani@nbu.edu.sa
fMechanical Engineering Department, College of Engineering, King Khalid University, Abha 61421, Aseer, Kingdom of Saudi Arabia
gCentre for Engineering and Technology Innovations, King Khalid University, Abha 61421, Aseer, Kingdom of Saudi Arabia
hResearch Center for Advanced Materials Science (RCAMS), King Khalid University, Guraiger, P.O. Box 9004, Abha-61413, Aseer, Kingdom of Saudi Arabia
iChemical Engineering Department, College of Engineering, University of Ha'il, P.O. Box 2440, Ha'il 81441, Saudi Arabia
First published on 20th October 2025
Multiferroic materials, which simultaneously exhibit electric and magnetic ordering, have garnered increasing attention due to their potential to revolutionize next-generation spintronic, memory, and multifunctional devices. Their unique ability to couple electric polarization and magnetic states offers low-power operation, electric field control of magnetism, and enhanced device scalability. Among these, altermagnetic multiferroics are particularly promising for enabling spin-polarized transport without stray fields. In this context, we have systematically investigated the structural, electronic, ferroelectric, and optical properties of the trigonal R3c-phase HfMnO3 using first-principles density functional theory. The compound is found to be thermodynamically and dynamically stable, with a Goldschmidt tolerance factor of 0.88 supporting a distorted perovskite framework. The spin-resolved band structure revealed energy-dependent spin splitting without net magnetization, which is characteristic of altermagnetic behavior. Furthermore, our Berry phase calculations predict a robust spontaneous polarization of approximately 104 μC cm−2 along the [111] direction, positioning HfMnO3 as a strong ferroelectric candidate. Remarkably, the polarization-switched state retains both dynamic and electronic stability while preserving the altermagnetic signatures, confirming the multiferroic nature of the material. Optical analyses show high UV absorption, a notable refractive index, and plasmonic features above 7.5 eV, suggesting potential applications in optoelectronics and UV photodetectors. These findings establish HfMnO3 as a promising altermagnetic multiferroic oxide for multifunctional applications in spintronic and optoelectronic technologies.
Parallel to these developments, ferroelectric materials, characterized by a spontaneous electric polarization that can be reversed by an external electric field, have long been studied for their applications in non-volatile memory, piezoelectric sensors, and energy-harvesting technologies. In recent years, thin films of BiFeO3 have exhibited remarkably high ferroelectric polarizations surpassing those found in classical ferroelectric materials such as BaTiO3 and PbTiO3.12–14 These enhanced polarization values correlate well with the significant atomic displacements observed in the crystal structure. Interestingly, such behavior appears to differ from earlier findings on the bulk BiFeO3, where much smaller polarization values were reported.15 The discrepancy between thin film and bulk forms remains a subject of ongoing discussion. Notable magnetization values, reaching approximately 1 μB per formula unit, have been detected, particularly in films with reduced thickness,8 and these magnetic features are accompanied by strong magnetoelectric coupling effects.
The combination of altermagnetism and ferroelectricity in a single material presents a compelling opportunity to explore a new class of multiferroic altermagnets. Such systems would unite the benefits of zero-net-magnetization spintronics with electric-field-tunable polarization, offering rich physics and potential device applications. While still relatively unexplored, a few theoretical efforts have proposed that certain materials, such as BaCuF4 and BiFeO3, may simultaneously support spin-polarized compensated magnetic states and ferroelectricity.16,17 Further, some 2D and other materials have been explored, which have altermagnet behaviors along with ferroelectricity.18–20 These studies have many limitations, and the materials either have small spontaneous polarization or small critical temperature.
Herein, we investigate a multiferroic HfMnO3 perovskite exhibiting both altermagnetic and ferroelectric properties. To the best of our knowledge, there have been no prior reports regarding this. Using density functional theory (DFT), we have performed comprehensive calculations of its electronic band structure, revealing spin-polarized states indicative of altermagnetic ordering. In addition, we have evaluated its piezoelectric response and spontaneous electric polarization using the Berry phase method, confirming the presence of robust ferroelectricity. The coexistence of these ferroic orders in a single-phase perovskite offers promising prospects for magnetoelectric coupling, spin-charge conversion, and the design of next-generation multifunctional devices.
| Ps = Ppolar − Pcentro | (1) |
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| Fig. 1 (a) The structure of an altermagnet HfMnO3 unit cell. (b) The obtained energy vs. volume curve for FM and stable AFM configurations. | ||
To assess the structural stability of HfMnO3, we calculated the Goldschmidt tolerance factor (t), which provides insight into the geometric compatibility of ions within the perovskite lattice. Using the standard formula
![]() | (2) |
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| Fig. 3 The obtained spin-polarized band structure for the altermagnet HfMnO3 in windows of (a) −2 eV to 2 eV and (b) −0.5 eV to −1.0 eV. | ||
The TDOS results are consistent with the electronic band structure, providing a comprehensive reflection of the system's electronic behavior, whereas the PDOS analysis revealed that the states near the Fermi level are dominated by Mn atom contributions. In the valence band, O exhibits a higher contribution compared to Hf, whereas in the conduction band, an opposite trend is observed. To more meaningfully study the electronic properties, we calculated the electronic charge density difference, which is presented in Fig. 5. The redistribution of charge is depicted using different colors, where blue indicates the charge depletion, while yellow represents the charge accumulation, i.e., the area showing the blue color corresponds to regions experiencing a loss of charge, whereas those in the yellow color highlight zones with an enhanced charge presence. The figure shows that Mn and Hf are losing the charge while O is gaining the charge. This feature is attributed to the high electronegativity of O compared to Mn and Hf. Fig. 6 presents the spin density distribution of the HfMnO3 system. Here, the yellow and blue isosurfaces correspond to regions dominated by spin-up and spin-down electrons, respectively, which specifically represent the spin-up and spin-down states of Mn atoms, revealing an alternating spin alignment within the lattice. The alternating colors localized around Mn atoms indicate an antiferromagnetic (AFM) ground state with compensated sublattices. As a result, neighboring Mn atoms adopt opposite spin orientations, leading to spin compensation between the Mn sublattices and a net-zero macroscopic magnetization. The compensated sublattices ensure that, despite the strong local moments, the net magnetization remains nearly zero. This distribution is consistent with the spin-polarized density of states, which shows unequal occupation of spin-up and spin-down bands. Altogether, the spin density distribution in HfMnO3 demonstrates that Mn atoms carry dominant antiparallel moments. Such an antiferromagnetic ground state confirms the stability of spin ordering in HfMnO3 and also highlights its potential relevance to altermagnetic phenomena, where compensated magnetic configurations can still produce spin-polarized band splitting due to lattice symmetry.
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| Fig. 5 The obtained charge density difference plots for the altermagnet HfMnO3. Here, the isosurface value is considered to be 0.012. | ||
The observed spin-dependent band splitting without net magnetization positions HfMnO3 as a promising altermagnetic material. This class of materials is gaining attention due to their potential to support spin-polarized currents without stray fields, making them ideal candidates for spintronic devices, magnetic sensors, and non-volatile memory technologies. Therefore, the combination of spin anisotropy and band splitting in HfMnO3 may open pathways for novel device architectures that exploit the advantages of both antiferromagnetic robustness and spin-selective transport.
c (No. 167), which possesses inversion symmetry and does not exhibit spontaneous polarization. To evaluate the ferroelectric nature of HfMnO3, we calculated its spontaneous polarization using the Berry phase approach, a modern and widely accepted method implemented in VASP that accurately captures electronic contributions based on the geometric phase of the electronic wavefunctions.24 The polarization of the polar (ferroelectric) and centrosymmetric (non-polar) reference structures is as follows:| Ps = Ppolar − Pcentro | (3) |
The electronic contribution to polarization P can be expressed as a Berry phase integral over the Brillouin zone (BZ):25
![]() | (4) |
is the Born effective charge tensor of the ith atom, and
is the displacement vector of atom i along the polarization direction, in this case, the [111] axis. Our calculations predict a large spontaneous polarization of approximately 104 μC cm−2 oriented along the [111] crystallographic direction, consistent with the symmetry axis of the R3c structure, as shown in Fig. 7. This polarization magnitude is comparable to well-studied ferroelectric perovskites such as BiFeO3, which typically exhibit spontaneous polarizations in the range of 90–100 μC cm−2.26 The strong polarization in HfMnO3 is primarily driven by significant off-centering displacements of Hf and Mn ions relative to the oxygen octahedra, which distort the lattice and break inversion symmetry. The [111] direction corresponds to the body-diagonal of the pseudo-cubic unit cell, a common polarization direction in rhombohedral perovskites due to their crystal symmetry.
Physically, the sizable polarization arises from the strong covalent interactions and hybridization between the transition metal d-orbitals and oxygen p-orbitals, which facilitate the ionic displacements and stabilize the ferroelectric phase. Compared to other reported materials with similar trigonal R3c symmetry, the polarization magnitude and direction in HfMnO3 underscore its potential as a robust ferroelectric material with possible multiferroic coupling when combined with its magnetic ordering. Besides calculating the spontaneous polarization, we also investigated the dynamic stability of the structure at the polarization-switched state. The phonon dispersion curve, presented in Fig. 2, shows no imaginary frequencies throughout the Brillouin zone, confirming the dynamic stability of the switched ferroelectric phase. This ensures that the structure is mechanically stable and can sustain polarization switching without undergoing structural collapse or phase transformation. Furthermore, we computed the spin-polarized electronic band structure for the polarization-switched configuration shown in Fig. 8 and observed signatures of altermagnetic behavior, characterized by spin-split bands with compensated magnetization. The coexistence of altermagnetism and ferroelectricity in HfMnO3 establishes it as a multiferroic material, which combines both magnetic and electric order parameters. This unique coupling opens promising opportunities for spintronic applications, where electric fields could control spin currents or magnetic states, enabling low-power, multifunctional devices. Thus, the robust multiferroic behavior in HfMnO3 makes it a compelling candidate for future spintronic technologies.
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| Fig. 8 The obtained spin-polarized band structure for switchable polarization (P < 0) of the altermagnet HfMnO3 in windows of −2 eV to 2 eV and −0.5 eV to −0.85 eV. | ||
![]() | (5) |
The imaginary part ε2(ω), which reflects the absorption due to electronic transitions from occupied to unoccupied states across the Brillouin zone, is given by the following:
![]() | (6) |
![]() | (7) |
![]() | (8) |
![]() | (9) |
![]() | (10) |
Fig. 9 illustrates the real part of the dielectric function, ε1(ω), which reflects the material's capacity to polarize in response to incoming electromagnetic waves. This polarization directly influences how light propagates and disperses through the material. According to our results, the static dielectric constant ε1(0) was calculated to be 3.91. From zero photon energy, ε1(ω) gradually increases, reaching a maximum value of approximately 5.89 at around 2.2 eV. Following this peak, the function exhibits several smaller peaks before sharply declining near 6 eV. Beyond 7 eV, the real part of the dielectric function turns negative, indicating a transition in optical behavior. Notably, at photon energies exceeding approximately 7.5 eV, ε1(ω) becomes negative, signaling a metallic response characterized by the excitation of plasmons, which are collective oscillations of free electrons.28 This negative dielectric permittivity in the high-energy regime implies that HfMnO3 strongly reflects incident light, demonstrating high reflectivity and supporting plasmonic behavior. These optical responses are governed by the electronic band structure and interband transitions that dominate the absorption and dispersion of light in the material. The presence of plasmonic features suggests potential applications in optoelectronic devices and plasmonic technologies, where strong light–matter interaction is desired.
Fig. 9 displays the imaginary component of the dielectric function ε2(ω), which quantifies the material's ability to absorb incident electromagnetic radiation. This quantity is directly linked to the energy absorbed when photons promote electrons from occupied states in the valence band to unoccupied states in the conduction band, representing interband electronic transitions.29 In the case of HfMnO3, the value of ε2(ω) remains close to zero, up to about 1.7 eV, indicating very low absorption at lower photon energies. Above this energy, a broad absorption feature appears, extending to nearly 10 eV, with the highest peak observed near 6.2 eV where ε2(ω) attained its maximum around 5.4. These absorption characteristics arise from electronic excitations at key symmetry points within the Brillouin zone, as indicated by the electronic band structure. The absorption edge at 1.7 eV marks the threshold energy required to excite electrons across the band gap. The wide absorption in the ultraviolet range is due to numerous allowed transitions between deeper valence bands and higher conduction bands. This strong optical absorption behavior reflects the intimate connection between the electronic structure and the optical response and suggests that HfMnO3 could be a promising candidate for ultraviolet photodetection and other optoelectronic applications where strong light–matter interaction is essential.30
Further, our calculations revealed that HfMnO3 possesses a direct band gap, which implies that the lowest energy optical transitions occur without the need for phonon assistance, resulting in a sharp absorption edge. The features observed in the imaginary part of the dielectric function and the absorption spectra can be directly attributed to interband electronic transitions. Since the material is a direct-gap semiconductor, the optical absorption edge is determined primarily by these direct transitions, rather than being suppressed by indirect gap constraints. Besides, the presence of a direct band gap suggests that strong excitonic effects are unlikely to dominate in this material, as the onset of absorption is well aligned with the fundamental gap. Therefore, the detailed optical response, such as the prominent peaks in dielectric functions, originates from band-to-band transitions consistent with the electronic band structure. These clarifications have been incorporated into the revised manuscript to provide a more complete physical understanding of the optical behavior.
The refractive index (ω) characterizes how light behaves as it passes through a material, providing insight into the degree of bending or refraction experienced by the incident light.31 Fig. 10(a) presents the variation of n(ω) for HfMnO3. The static refractive index (0) was calculated to be approximately 1.97. As photon energy increases, the refractive index gradually rises, reaching a peak value of around 2.4 at about 2 eV, which lies within the visible spectrum. This increase suggests strong interactions of light with the electronic states of the material at lower energies. Beyond this point, the refractive index remains relatively steady before exhibiting a sharp decline after 5.8 eV, indicating a significant reduction in the material's ability to refract high-energy photons. This downward trend signifies that the optical density of the material drops at higher energies, particularly in the ultraviolet region. The observed behavior of (ω) closely follows the real part of the dielectric function ε1(ω), which is expected since both quantities are related by the following relation:
. The consistency between these two optical parameters reaffirms the reliability of the calculated data. Given the notable refractive index in the visible to near-UV range, HfMnO3 may be considered a viable candidate for use as an intermediate optical layer in devices designed to manage or manipulate UV light, such as UV filters, coatings, or waveguides.
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| Fig. 10 The obtained optical parameters for the altermagnet HfMnO3: (a) refractive index, (b) absorption coefficient, (c) reflectivity, and (d) energy loss function. | ||
The optical absorption spectrum of HfMnO3 is depicted in Fig. 10(b). The absorption coefficient (ω), which is directly derived from the imaginary part of the dielectric function ε2(ω), provides insight into the material's ability to absorb incident electromagnetic radiation. It describes the exponential attenuation of light intensity as it propagates through the material and is essential for assessing the optoelectronic applicability of the compound.32 In the case of HfMnO3, the absorption edge begins around 2.0 eV, indicating that the material starts to absorb photons in the visible region of the electromagnetic spectrum. As the photon energy increases, the absorption gradually intensifies, showing a broad and strong absorption band in the 6–12 eV range, which lies in the ultraviolet (UV) region. This broad UV absorption indicates a high photon capture capability, making HfMnO3 a suitable candidate for UV photodetectors and protective coatings against harmful UV radiation. A notable absorption peak is observed at approximately 9.0 eV, with a maximum absorption coefficient value reaching 1.5 × 10−6 cm−1. Such a high absorption intensity further underscores the compound's excellent potential for UV optoelectronic applications. Moreover, the absorption coefficient remains relatively low in the lower-energy visible region (below 2 eV), suggesting that HfMnO3 exhibits optical transparency in this regime. This transparent behavior in the visible region opens up the possibility of utilizing HfMnO3 as a transparent electrode or buffer layer in solar cells or other multilayer optoelectronic devices. The ability to allow visible light transmission while absorbing higher-energy UV photons could enhance the overall efficiency and longevity of devices by maximizing light harvesting and minimizing UV-induced degradation.
The reflectivity behavior of HfMnO3 as a function of photon energy is illustrated in Fig. 10(c). At zero photon energy, the initial reflectivity (0) was calculated to be approximately 15%, indicating that a relatively small fraction of incident light is reflected at very low energies. This low initial reflectance implies that most of the low-energy photons can enter the material, contributing to its absorption behavior. As the photon energy increases, the reflectivity gradually rises. In the visible spectrum, the reflectivity remains below 40%, suggesting that the material does not significantly reflect visible light. This observation aligns well with the absorption characteristics, confirming that visible light is primarily absorbed or transmitted through the compound rather than reflected. Beyond the visible region, particularly in the ultraviolet range, the reflectivity exhibits a sharp increase, reaching a maximum value of approximately 80% at 12 eV. This substantial rise in the UV domain indicates that HfMnO3 begins to behave more like a metallic reflector at high photon energies. The increase in reflectivity corresponds to the regions where the real part of the dielectric function becomes negative, a typical indicator of plasma resonance or metallic optical response. The strong reflectivity in the UV range implies potential applications for HfMnO3 in devices requiring UV mirrors or protective coatings, while its moderate to low reflectivity in the visible region supports its transparency and absorption efficiency for solar and optoelectronic technologies.
The electron energy loss spectrum (EELS), represented by the energy loss function, L(ω), provides insight into the energy dissipated by fast-moving electrons as they traverse a material under the influence of incident electromagnetic radiation.33 The calculated (ω) for HfMnO3 is shown in Fig. 10(d). In this context, the energy loss is primarily associated with plasmonic excitations, which result from the collective oscillations of conduction electrons stimulated by external electromagnetic fields. Peaks in HfMnO3 are indicative of plasma resonance frequencies, signifying significant electron oscillation and energy loss within the system. For HfMnO3, the energy loss function remains very low (below 1) in the low photon energy range up to approximately 8 eV, indicating minimal energy dissipation in this region. This suggests that the compound does not exhibit notable plasmonic activity at lower energies, which complements earlier findings that most visible light is absorbed or transmitted rather than contributing to electronic excitation losses. However, beyond 8 eV, a gradual rise in the energy loss function is observed, reaching a prominent peak of around 5 at 12 eV. This peak indicates the presence of a plasmon resonance, marking the energy at which collective electron oscillations lead to significant energy dissipation. The sharp increase in (ω) at higher photon energies confirms the onset of strong interband transitions and energy loss phenomena in the ultraviolet regime. Such behavior is characteristic of materials with the potential for plasmonic and high-frequency optoelectronic applications, where control of electron energy dissipation is essential.
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