Issue 9, 2025

Controllable synthesis of environmentally stable vdW antiferromagnetic oxyhalide CrOCl

Abstract

Layered antiferromagnetic oxyhalides with high environmental stability have recently attracted significant interest owing to their applications in spintronics and quantum devices. These materials can sustain a host of interesting phenomena that arise from magnetic phase transitions associated with structural changes. Although bulk crystal synthesis for some members of this oxyhalide family has been previously reported, bottom-up approaches for scalable growth remain limited. In this work, we demonstrated the controllable synthesis of CrOCl on different substrates through an atmospheric pressure chemical vapor deposition (APCVD) technique using CrCl3 and KMnO4 precursors. Our results demonstrate the successful gas-phase reaction and subsequent nucleation followed by island growth on different target substrates. Comprehensive structural and optical characterization reveals that the effect of temperature, growth time, and carrier gas flow rates ultimately dictate the overall phase and morphology of the crystal. Overall, our findings enhance the understanding of the bottom-up growth mechanisms for synthesizing layered oxyhalides and further expand the library of stable magnetic oxides.

Graphical abstract: Controllable synthesis of environmentally stable vdW antiferromagnetic oxyhalide CrOCl

Supplementary files

Article information

Article type
Paper
Submitted
10 Sep 2024
Accepted
10 Jan 2025
First published
27 Jan 2025

Nanoscale, 2025,17, 5472-5480

Controllable synthesis of environmentally stable vdW antiferromagnetic oxyhalide CrOCl

R. Banerjee, S. Uppala, J. Kopaczek, S. Ahmed, C. Wu, M. Kumar, K. Yumigeta, U. Celano and S. A. Tongay, Nanoscale, 2025, 17, 5472 DOI: 10.1039/D4NR03715D

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements