Open Access Article
Muhammad Hamid Raza†
*a,
Simona Crispi†b,
Estelle Jozwiakc,
Marvin Frischd,
Ralph Kraehnertd,
Rutger Schlatmann
a,
Daniel Amkreutza,
Giovanni Neri
b and
Nicola Pinna
c
aPVcomB, Helmholtz-Zentrum Berlin für Materialien und Energie (HZB), Schwarzschildstrasse 3, 12489 Berlin, Germany. E-mail: hamid.raza@helmholtz-berlin.de
bDepartment of Engineering, University of Messina, C.da Di Dio, I-98166 Messina, Italy
cDepartment of Chemistry and The Center for the Science of Materials Berlin, Humboldt-Universität zu Berlin, Brook-Taylor-Str. 2, 12489 Berlin, Germany
dDepartment of Chemistry, Technische Universität Berlin, Strasse des 17. Juni 124, 10623 Berlin, Germany
First published on 5th November 2025
Functionalized metal oxide thin films are widely applicable in heterogeneous catalysis and gas sensing due to their distinct electrochemical properties. Given their importance in practical applications, developing a comprehensive understanding of their chemoresistive behavior is essential, which requires the precise engineering of thin-film-based nanostructures. Here, we report the on-chip fabrication of mesoporous Nb-doped titania (NbxTi1−xO2) thin films with template-controlled mesoporosity via dip-coating and subsequent calcination on conductometric transducers. The pore wall surfaces of mesoporous NbxTi1−xO2 films were surface-modified with variable NiO loadings via atomic layer deposition (ALD) to produce NiO-loaded NbxTi1−xO2 thin films (XNiO–NbxTi1−xO2). The NiO loading was controlled by adjusting the number of ALD cycles (X = 5–200). The chemoresistive properties of the synthesized mesoporous Nb−Ti1−xO2 and XNiO–NbxTi1−xO2 thin films were investigated under different environmental conditions, namely oxidizing and reducing gases. The XNiO–NbxTi1−xO2 thin films showed an enhanced response to reducing gases, particularly acetone and ethanol, compared to unloaded mesoporous NbxTi1−xO2. Among them, 5NiO–NbxTi1−xO2, featuring discontinuous NiO-decorated species, exhibits the strongest response to acetone. The superior sensing performance of the on-chip fabricated 5NiO–NbxTi1−xO2 sensor toward acetone is attributed to the high surface area of the mesoporous thin films and surface-modification with NiO species, which enhances the sensing properties through chemical sensitization.
The chemoresistive behaviors of heterostructured systems vary significantly and are not always associated with a single factor, such as heterojunctions.2,6,7 In some cases, the response may arise predominantly from the core or the shell material. For instance, our previous investigations on NiO-coated carbon nanotubes (CNTs) demonstrated that the gas response stemmed from the NiO shell only.8 Conversely, in our other study, where a secondary metal oxide layer was conformally deposited onto pre-contacted one-dimensional SnO2 nanowires, the observed gas responses were solely attributed to the core material.9 Although the deposition altered the interfacial depletion region, the shell did not significantly affect the fundamental transduction behavior but only modified the surface characteristics of the prefabricated sensor and hence interaction with analytes.9,10 Moreover, altering the fabrication sequence or architecture, such as incorporating shell–shell junctions in core–shell systems while avoiding direct core–core contact, can lead to transduction governed by the shell, the core, or the interface, depending on the device configuration.2,6,7 Additionally, if the core material already exhibits sufficient electrical conductivity, a large surface-to-volume ratio, and intrinsic chemoresistive sensitivity, the sensing performance may be further amplified through chemical sensitization, catalytic or spillover effects.2,11–13
We leverage this approach by utilizing mesoporous TiO2-based films as the primary high-surface-area substrate, serving as a model mesoporous SMOX. Titania was selected due to its tunable electrical conductivity (e.g., via transition metal doping) and chemical stability, while offering nanostructured porosity which is known to enhance solid–gas interactions, facilitate gas diffusion and promote mass-transfer kinetics.14–16 The addition of niobium at a concentration of 35 mol % has been found to increase the electrical conductivity while preserving the mesoporous TiO2-based framework (via dip-coating and subsequent calcination), thereby facilitating efficient gas diffusion and charge transport.14 The Nb-doped mesoporous TiO2 (NbxTi1−xO2) thin films directly fabricated on-chip via dip-coating and evaporation-induced self-assembly (EISA) were then surface-modified with controlled loadings of NiO species via atomic layer deposition (ALD). ALD was selected as a state-of-the-art technique for the deposition of homogeneous and conformal thin films over high-aspect ratio substrates, since it allows precise control over film thickness due to its self-limiting nature while preserving the intrinsic properties of the underlying substrate.9,10
The synthesized NiO-functionalized thin films are hereinafter denoted as XNiO–NbxTi1−xO2 (where X indicates the number of ALD cycles, ranging from 5–200). The chemoresistive behavior of the mesoporous NbxTi1−xO2 and XNiO–NbxTi1−xO2 films were evaluated using conductometric transducers, revealing an enhanced sensing response. This improvement is attributed to chemical sensitization effects, offering insight into the correlation between structure and sensing performance in engineered thin film systems.
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| Fig. 1 Schematics of the synthesis routes for mesoporous NbxTi1−xO2 and XNiO–NbxTi1−xO2 thin films directly on the conductometric transducer. | ||
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| Fig. 2 BF-HRTEM images of (aI and II) NbxTi1−xO2, (bI and II) 50NiO–NbxTi1−xO2, and (cI and II) 200NiO–NbxTi1−xO2 nanostructures. | ||
The mesoporous morphology of NbxTi1−xO2 remains well preserved even after the final synthesis step with NiO deposition via ALD, Fig. 2b and c. NiO deposition starts with the nucleation of small clusters during the initial ALD cycles (5 cycles). Due to the very small size of the deposited NiO species, identification via HRTEM is challenging (Fig. S2a). It is further noted that the ALD process does not essentially affect the crystallinity and mesoporosity of the NbxTi1−xO2 framework. The SAED patterns of both samples (NbxTi1−xO2 and 5NiO–NbxTi1−xO2) show similar features, with no additional diffraction rings observed after NiO deposition (Fig. S2b and c). This aligns with our earlier observations on ALD-modified mesoporous structures, for example IrTiOx modified by Ir–IrOx ALD and WCx modified by NiO ALD processes.15,16 As the number of ALD cycles increases, these clusters grow and gradually coalesce into a continuous particulate film. This evolution is clearly observed by comparing the micrographs of the 50NiO–NbxTi1−xO2 and 200NiO–NbxTi1−xO2 samples (Fig. 2b and c). A detailed discussion of NiO ALD growth and thin film evolution can be found in our earlier work.8,9,17
The 50NiO–NbxTi1−xO2 sample displays discrete NiO clusters dispersed across the pore wall surface of the mesoporous NbxTi1−xO2 film (Fig. 2bI and II), while the 200NiO–NbxTi1−xO2 sample exhibits a continuous, layer-like NiO film that fully covers the mesoporous framework (Fig. 2cI and II). High-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) and the corresponding energy-dispersive X-ray spectroscopy (EDX) elemental mappings for the 50NiO–NbxTi1−xO2 sample further demonstrate conformal and homogeneous NiO coverage across the framework (Fig. 3). The EDX mapping indicates a uniform distribution of Ni, Nb, Ti, and O within the nanostructures, consistent with the bright-field TEM micrographs shown in Fig. 2. The EDX spectra correspond to the elemental mappings in Fig. 3, and are shown in Fig. S3. Comprehensive characterization of the mesoporous NbxTi1−xO2 framework and ALD-deposited NiO, including morphology, crystallinity, and surface chemistry, is reported elsewhere.8,9,14,17
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| Fig. 3 (a) HAADF-STEM, (b) BF-STEM, and corresponding EDX mapping images for 50NiO–NbxTi1−xO2 thin films are shown in the bottom panel. The corresponding EDX spectra are shown in Fig. S3. | ||
Fig. 4a presents the baseline resistance in dry air at various temperatures for mesoporous TiO2, which serves as a reference having a similar pore structure and layer thickness but does not contain any Nb dopant, and for NbxTi1−xO2 as well as NiO–NbxTi1−xO2 nanostructures loaded with varying amounts of NiO. The mesoporous TiO2 shows higher electrical resistance than Nb-doped TiO2 (NbxTi1−xO2) in line with the computational, theoretical and practical findings on the effect of Nb doping into the TiO2 lattice.14 The resistance of the XNiO–NbxTi1−xO2 thin films with varying loadings of NiO is initially very complex particularly below 150 ALD cycles (ca. 3–4 nm NiO). The NiO ALD-deposition starts with NiO species nucleating initially, forming small NiO-species (5 ALD cycles), which grow with additional cycles, eventually forming a particulate film (ca. 150 cycles).8,15,17 Notably, partial NiO decoration of NbxTi1−xO2, where the core remains accessible, is crucial for enabling direct gas interactions with the core of the material.2,7,18 200NiO–NbxTi1−xO2 shows higher resistance than the unloaded NbxTi1−xO2 confirming the formation of electrical contact in between the NiO shell and the core of NbxTi1−xO2 (p–n heterojunction).7,8,19 At this point, where the underlying sensing film is almost fully covered with the NiO coating, the diffusion of gas molecules to the core is significantly reduced (cf. discussion below). Our devices are designed so that electronic conduction occurs primarily through the core (NbxTi1−xO2), which directly interfaces with the metal contacts. However, NiO deposition on the mesoporous NbxTi1−xO2 creates a heterojunction, thereby increasing the overall resistance of the system by narrowing the conduction channel due to the space-charge-region at the p–n interface.2,7
The chemoresistive properties of NbxTi1−xO2 and NiO–NbxTi1−xO2 were studied in the presence of ammonia (NH3), formaldehyde (HCHO), ethanol (C2H5OH) and acetone (C3H6O), as representative reducing gases. Initial measurements were conducted at 400 °C at a concentration of 40 ppm for the above gases (Fig. 4b). Fig. 4b shows that all the samples including mesoporous NbxTi1−xO2 and NiO–NbxTi1−xO2 behave differently in the presence of various gases. The pristine mesoporous TiO2 sensor shows the lowest response to all gases. A significant increase in response was observed upon doping the pristine TiO2 with Nb. NiO–NbxTi1−xO2 showed a higher response toward reducing gases than non-coated NbxTi1−xO2. The response of the mesoporous NiO–NbxTi1−xO2 thin films depends on the loading of NiO, i.e., the number of ALD cycles. The response of mesoporous NiO–NbxTi1−xO2 decreased with increasing ALD cycles. Notably, higher sensitivities are observed for ethanol and acetone, where the 5NiO–NbxTi1−xO2 sensor is more selective to acetone. The increased sensitivity to ethanol and acetone is attributed to the charge carriers within the nanocomposite and to the interaction of analyte with the surface species.2,18,20,21 These results highlight the optimization of the sensing conditions to achieve selectivity toward specific gases.
The response of all the sensors toward acetone and ethanol increased up to 300–350 °C and then decreased (Fig. 5a and b). The 5NiO–NbxTi1−xO2 sensor (with 5 NiO ALD cycles) showed the highest selectivity to acetone at 300 °C (Fig. 5a and b). Therefore, all further experiments were conducted with this sensor. The isothermal dynamic response for 5NiO–NbxTi1−xO2 to different concentrations of acetone and ethanol is shown in Fig. 5c and d. Both gases exhibited similar dynamic behavior, with response/recovery times of 28 s/170 s for acetone and 33 s/175 s for ethanol, respectively. Fig. 5e presents the response vs. concentration curves (log–log) for acetone and ethanol, highlighting a higher sensitivity to acetone. 5NiO–NbxTi1−xO2 showed excellent selectivity for acetone at 300 °C when exposed to a mixture of gases at different concentrations (Fig. 5f). The memory effect of the 5NiO–NbxTi1–xO2 sample was studied by performing measurements at increasing and decreasing acetone concentrations, which demonstrates the sensor's signal progression over time and its stable recovery across the tested concentrations (Fig. 6a). This further confirms the repeatability of the sensor's response. Specifically, as the concentration changes from 12.5 to 400 ppm and back, the sensor exhibits consistent and repeatable responses, with practically superimposable values (Fig. 6b). The higher the concentration of acetone, the greater the response of the sensors. The calibration curves, response versus acetone concentration, follow a power-law relation in agreement with the reported trend for SMOX-based gas sensors.9,10 This indicates that the interaction between the gas and the sensor surface is physisorption, i.e., the molecules physically adsorb onto the surface without forming strong chemical bonds.2,6,20 Fig. 6c demonstrates the reproducibility of the sensor signals without any drift at 300 °C for 250 ppm acetone. The sensor maintained stable acetone response over one month, confirming a long-term sensing stability (Fig. 6d).
Chemoresistive sensing in SMOX occurs via surface reactions governed by the physicochemical properties of the SMOX surface and the nature of the analyte species. These processes range from redox reactions, such as reduction and re-oxidation of the SMOX surface (for CO and H2), to more complex transformations involving dehydrogenation and partial oxidation (for VOCs such as ethanol and acetone). When any of these reactions involve charge transfer between SMOX and surface-adsorbed species, the concentration of charge carriers' changes, thereby modulating electrical resistance, which is the sensor signal. Details of these mechanisms, including the loaded type of heterostructures, have been reported elsewhere.2,6,7,9,18
TiO2 and NbxTi1−xO2 are n-type SMOXs. In NbxTi1−xO2, resistance modulation arises from two main factors: variation in the surface depletion layer and modulation of the potential barrier across intergranular boundaries (homojunctions).2,6 Our devices are designed such that the NbxTi1−xO2 framework remained in direct electrical contact with the electrodes, confining the dominant conduction pathway within NbxTi1−xO2, in both pristine and NiO–NbxTi1−xO2 devices. Therefore, NiO deposition modifies only the surface of the prefabricated NbxTi1−xO2 structures without directly contributing to the bulk conduction. Nevertheless, NiO can influence electrical conduction indirectly in two ways: (i) by forming a depletion layer at the p–n heterojunction, thereby modulating overall resistance,9 and (ii) through a discontinuous (ultra-low) decoration with a secondary material, where the catalytic activity of the loaded material alters surface reactions.2,18 In the latter case, NbxTi1−xO2 remains the primary sensing material, but resistance modulation is enhanced by the chemical or electronic sensitization of the loaded species (NiO in this case).12,13,18
In XNiO–NbxTi1−xO2 nanostructures, a p–n heterojunction is established at the NiO/NbxTi1−xO2 interface for X values ranging from 150 to 200, with a continuous NiO film of approximately 4–6 nm thickness (in the case of 200NiO–NbxTi1−xO2). However, this continuous NiO surface layer impedes direct analyte access to NbxTi1−xO2, thereby reducing the sensor response. Here, the primary interaction of analyte species occurs with the NiO film (p-type SMOX); however, the response remains n-type due to the predominant charge transport by NbxTi1−xO2, as dictated by the device design. At lower NiO coverages (≤100–150 ALD cycles, approximately 2–4 nm, cf. HRTEM in our earlier work),8,9,17 the NiO layer is >discontinuous, comprising nanoscale NiO and Ni(OH)2/NiOOH clusters (cf. XPS in our earlier work),8,16,17,22 likely forming localized p–n junctions while leaving substantial areas of the NbxTi1−xO2 pore walls exposed. This configuration allows simultaneous analyte interactions with both the NiO and the mesoporous NbxTi1−xO2 film (in the case of 50NiO-NbxTi1−xO2 and 100NiO–NbxTi1−xO2).
The case of ultrathin NiO decoration (the case of 5NiO–NbxTi1−xO2 sample with 5 ALD cycles) is notably distinct. Here, the NbxTi1−xO2 surface is modified with ultra-small NiO, Ni(OH)2/NiOOH and/or ionic species (Ni+2/Ni+3), which serve as catalytic centers.17,22 These Ni-based species enhance oxygen ionosorption via spillover, thereby promoting VOC interactions at the NbxTi1−xO2 pore wall surface, resulting in the exceptionally high response observed for 5NiO–NbxTi1−xO2 (Fig. 7).23,24 NiO/Ni(OH)2 species act as oxygen dissociation catalysts, generating reactive species such as O−, O2−, and O22−, which migrate to NbxTi1−xO2 via spillover.25,26 These activated species capture electrons from the conduction band of NbxTi1−xO2, and hence their reactions with target gases produce pronounced resistance changes. The enhanced sensitivity of 5NiO–NbxTi1−xO2 toward ethanol and acetone (shows a response of 40 to 40 ppm of acetone at 300 °C) thus stems from increased oxygen coverage mediated by NiO sensitization.26–29 While acetone detection does not involve classical spillover, it still relies on spillover-activated oxygen species at the NiO/NbxTi1−xO2 interface.26–30 For ethanol, both oxygen spillover and catalytic dehydrogenation at Ni sites contribute. Ethanol is oxidized to intermediates such as ethanal, which subsequently react with spillover oxygen to yield CO2 and H2 (or other by-products). This redox cycle dynamically modulates carrier density, thereby amplifying the sensor response.23,30 Experiments, including further engineering with well-known, high-surface-area nanostructures of an active sensing material but with similar NiO loading, as well as in situ spectroscopic studies, will be helpful to further elucidate the underlying mechanisms. This knowledge-based design of highly efficient SMOX gas sensor materials would enable the next step toward adopting thin-film technologies for practical sensing applications.
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| Fig. 7 Chemoresistive response of the 5NiO–NbxTi1−xO2 thin films as a function of the NiO layer thickness toward 40 ppm of acetone at 300 °C. | ||
Footnote |
| † Authors contributed equally to this work. |
| This journal is © The Royal Society of Chemistry 2025 |