Review of the effect and progress in uniform films prepared by the magnetron sputtering method

Abstract

Recent advances in thin film materials have attracted considerable scientific interest owing to their exceptional physicochemical properties and broad applicability in emerging technological domains such as energy harvesting, electronic devices, and display technologies. The continuous development of thin film technology and sophisticated characterization methods has placed increasing demands on achieving precise control over the performance characteristics of films. As critical parameters governing the functional performance of films, the thickness and uniformity represent fundamental metrics that require comprehensive investigation. This highlight focuses on the effects of the thickness and uniformity of films on their structural properties, the influencing factors and measurement methods of magnetron sputtering coating, and the research progress on several popular films. In the future, thin film technology will continue to evolve, making sustained contributions to the advancement of various fields.