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Correction: Synthesis of U3Se5 and U3Te5 type polymorphs of Ta3N5 by combining high pressure–temperature pathways with a chemical precursor approach

Ashkan Salamat *a, Katherine Woodhead b, S. Imran U. Shah c, Andrew L. Hector *c and Paul F. McMillan *c
aLyman Laboratory of Physics, Harvard University, Cambridge, MA 02138, USA. E-mail: salamat@physics.harvard.edu
bDepartment of Chemistry, Christopher Ingold Laboratory, University College London, London, WC1H 0AJ, UK
cChemistry, University of Southampton, Southampton, SO17 1BJ, UK. E-mail: a.l.hector@soton.ac.uk; p.f.mcmillan@ucl.ac.uk

Received 25th February 2025 , Accepted 25th February 2025

First published on 5th March 2025


Abstract

Correction for ‘Synthesis of U3Se5 and U3Te5 type polymorphs of Ta3N5 by combining high pressure–temperature pathways with a chemical precursor approach’ by Ashkan Salamat et al., Chem. Commun., 2014, 50, 10041–10044, https://doi.org/10.1039/C4CC05147E.


The authors regret an error in the PXRD data in Fig. 2 of this paper. The same dataset appears for the 500 °C and 600 °C traces. The authors do not have access to the original data due to the time lapsed but have prepared the replacement figure using diffractometer files for other examples of these preparations by the same student. The collection times and resolutions are not all the same, so the signal[thin space (1/6-em)]:[thin space (1/6-em)]noise ratio varies.
image file: d5cc90085a-f2.tif
Fig. 1 PXD patterns (λ = 1.5406 Å) of the tantalum nitrides obtained by firing the polymer precursor under ammonia at various temperatures. The reflections observed after firing at 800 °C match those expected for the Cmcm phase of Ta3N5. Inset: The UV-visible spectrum of crystalline-Ta3N5 obtained by firing the polymer precursor under ammonia at 800 °C.

An independent expert has viewed the corrected image and has concluded that it is consistent with the discussions and conclusions presented.

The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.


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