Issue 42, 2024

Asymmetrical Sc coordination-induced bridging structure and surface relaxation for boosting H2O2 photoactivation in Fenton-like catalysis

Abstract

The utilization of photo-Fenton technology in the treatment of refractory pollutants is a significant area, dependent on a stable and highly efficient catalyst for reliable performance. However, the weak van der Waals force between two semiconductors, such as graphitic carbon nitride (g-C3N4) and MoSe2, limits charge carrier transfer and photocatalytic activity. Herein, a single-atom of the transition metal scandium (Sc) is introduced into the g-C3N4/MoSe2 (CSM) heterojunction interfaces to form a single-atom bridging structure (Se–Sc–N) for H2O2 activation in a photo-Fenton-like system. The Sc single-atom bridging structure improves the interaction between the two semiconductors, and the asymmetrical coordination causes surface relaxation to lower the activation energy barrier of H2O2 to ˙OH. Theoretical calculations and experimental characterization demonstrate that the unique structure precisely boosts interfacial charge transfer in g-C3N4/MoSe2 heterojunctions. The synthesized CSM achieves 100% removal of tetrabromobisphenol A (TBBPA) within 20 min, with a debromination efficiency of 54% (120 min) under visible light irradiation. These findings enrich the application of single-atom catalysts in advanced oxidation fields and reveal the bridging function of single-atoms between semiconductors in photo-Fenton-like system.

Graphical abstract: Asymmetrical Sc coordination-induced bridging structure and surface relaxation for boosting H2O2 photoactivation in Fenton-like catalysis

Supplementary files

Article information

Article type
Paper
Submitted
19 Aug 2024
Accepted
03 Oct 2024
First published
07 Oct 2024

J. Mater. Chem. A, 2024,12, 29254-29261

Asymmetrical Sc coordination-induced bridging structure and surface relaxation for boosting H2O2 photoactivation in Fenton-like catalysis

C. Liu, M. Yu, Y. Ma, Y. Zhang, Y. Zhou and J. Niu, J. Mater. Chem. A, 2024, 12, 29254 DOI: 10.1039/D4TA05800C

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