Issue 41, 2024

Photoelectron “bridge” is introduced to realize the precise transport of C3N5-CoPc interface charge for efficient photocatalytic H2O2 production

Abstract

Noble metal-loaded semiconductor photocatalysts have attracted extensive attention in the field of photocatalytic two-electron oxygen reduction to generate H2O2 due to their high atomic utilization rate. However, the rareness and high cost of materials significantly hinder their industrial application. Here, we introduce phosphate as an electron bridge in carbon nitride (C3N5)-cobalt phthalocyanine (CoPc) (C3N5-YP-XCoPc) to enable the accurate transmission of photogenerated electrons to the metal Co atoms, and then excite them as catalytic centers to achieve the efficiency of a noble metal-like loaded semiconductor photocatalyst. The photocatalytic H2O2 yield of C3N5-8P-0.9CoPc is as high as 3080.3 μmol g−1 h−1, which is 8.3 and 4.4 times higher than C3N5 and C3N5-0.9CoPc, respectively. Experimental and theoretical calculations demonstrate that photogenerated electrons are precisely transported to Co atoms via phosphate molecules, exciting the Co 3d orbitals to higher energy levels, thereby making the Co atoms catalytic centers and enhancing their ability to adsorb and activate O2. Meanwhile, phosphate passivated the adsorption of H2O2 on C3N5-8P-0.9CoPc and inhibited the in situ decomposition of H2O2. This work opens up new perspectives for the development of efficient photocatalysts, while demonstrating the potential of small molecules as bridging mediators.

Graphical abstract: Photoelectron “bridge” is introduced to realize the precise transport of C3N5-CoPc interface charge for efficient photocatalytic H2O2 production

Supplementary files

Article information

Article type
Paper
Submitted
18 Jul 2024
Accepted
20 Sep 2024
First published
23 Sep 2024

J. Mater. Chem. A, 2024,12, 28233-28246

Photoelectron “bridge” is introduced to realize the precise transport of C3N5-CoPc interface charge for efficient photocatalytic H2O2 production

R. Chen, W. Gan, J. Guo, Y. Lu, S. Ding, R. Liu, S. Wang, M. Zhang, Q. Yang and Z. Sun, J. Mater. Chem. A, 2024, 12, 28233 DOI: 10.1039/D4TA04970E

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