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Correction: Large-scalable, ultrastable thin films for electromagnetic interference shielding

Jae Seo Park a, Ji Yong Park a, Kyunbae Lee b, Young Shik Cho c, Hyunji Shin a, Yeonsu Jung b, Chong Rae Park c, Taehoon Kim *b, Jae Ho Kim *ac and Seung Jae Yang *a
aDepartment of Chemistry and Chemical Engineering, Education and Research Center for Smart Energy and Materials, Inha University, Incheon 22212, Republic of Korea. E-mail: sjyang@inha.ac.kr
bComposites Research Division, Korea Institute of Materials Science (KIMS), Changwon 51508, Republic of Korea. E-mail: tkim67@kims.re.kr
cDepartment of Materials Science and Engineering, Seoul National University, Seoul 08826, Republic of Korea. E-mail: advho@snu.ac.kr

Received 24th July 2023 , Accepted 24th July 2023

First published on 4th August 2023


Abstract

Correction for ‘Large-scalable, ultrastable thin films for electromagnetic interference shielding’ by Jae Seo Park et al., J. Mater. Chem. A, 2023, https://doi.org/10.1039/D3TA02862C.


The authors regret the misspelling of the email address of one of the corresponding authors, Taehoon Kim (tkim67@kims.re.kr), in the published article. The correct affiliations, including email addresses, are as shown here.

The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.


This journal is © The Royal Society of Chemistry 2023
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