Issue 12, 2023

β-Ga2O3: ultralow-loss and low-permittivity dielectric ceramic for high-frequency packaging substrate

Abstract

As the core carrier of integrated circuits, packaging substrates usually respond in time to the evolution of electronic products. Among which, ceramic substrate materials are desired to have excellent dielectric and voltage-resistant properties, high reliability, and good thermal and chemical stability. The β-Ga2O3 ceramic prepared in this work has excellent microwave dielectric properties with a Q × f value of ∼133 140 GHz (Q = 1/tan δ), εr of ∼9.57, and temperature coefficient of resonant frequency (TCF) value of ∼−58.2 ppm °C−1, which meet the requirements of high-frequency packages. Another highlight is that the β-Ga2O3 ceramic has a higher dielectric strength of ∼30 kV mm−1 compared with conventional ceramic substrates, such as Al2O3, AlN, etc., allowing it to be used in higher-power circuits. Meanwhile, a flexural strength of ∼110 MPa, a thermal expansion of ∼+8.9 ppm °C−1 and a thermal conductivity of ∼15 W m−1 K−1 have been achieved in the β-Ga2O3 ceramic. In addition, a patch antenna for sub-6 GHz applications was designed and fabricated using the Ga2O3 ceramic substrate, showing good performance with a wide bandwidth of ∼140 MHz, a return loss S11 of ∼−21 dB at the center frequency, a radiation efficiency of ∼92% and a gain of ∼5 dBi. The stated results guarantee that the Ga2O3 ceramic shows great potential in applications towards high-frequency and high-power fields.

Graphical abstract: β-Ga2O3: ultralow-loss and low-permittivity dielectric ceramic for high-frequency packaging substrate

Supplementary files

Article information

Article type
Research Article
Submitted
29 Mar 2023
Accepted
12 May 2023
First published
16 May 2023

Inorg. Chem. Front., 2023,10, 3723-3729

β-Ga2O3: ultralow-loss and low-permittivity dielectric ceramic for high-frequency packaging substrate

W. Wang, C. Du, X. Wang, D. Xu, H. Qiu, B. Jin, Z. Shi, F. Hussain, M. A. Darwish, T. Zhou, Y. Chen, Q. Liang, M. Zhang and D. Zhou, Inorg. Chem. Front., 2023, 10, 3723 DOI: 10.1039/D3QI00578J

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