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Correction: Composition control of conformal crystalline GeSbTe films by atomic layer deposition supercycles and tellurization annealing

Yewon Kim a, Kwonyoung Kim a, Okhyeon Kim a, Chang Yup Park b, Dong Geon Koo b, Dong-Ho Ahn b, Bong Jin Kuh b and Won-Jun Lee *a
aDepartments of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 05006, Republic of Korea. E-mail: wjlee@sejong.ac.kr
bProcess Development, Semiconductor R&D Center, Samsung Electronics Co., Ltd., 1, Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do 18448, Republic of Korea

Received 1st August 2022 , Accepted 1st August 2022

First published on 8th August 2022


Abstract

Correction for ‘Composition control of conformal crystalline GeSbTe films by atomic layer deposition supercycles and tellurization annealing’ by Yewon Kim et al., J. Mater. Chem. C, 2022, 10, 9691–9698, DOI: https://doi.org/10.1039/D2TC00784C.


The authors regret errors in affiliation b of the coauthors in the published article, from which the words “Samsung Electronics Co., Ltd.” were unfortunately omitted. The correct affiliation list is as shown here.

The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.


This journal is © The Royal Society of Chemistry 2022
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