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Correction: Mixed H2O/H2 plasma-induced redox reactions of thin uranium oxide films under UHV conditions
Ghada
El Jamal
a,
Thomas
Gouder
b,
Rachel
Eloirdi
b,
Evgenia
Tereshina-Chitrova
cd,
Lukáš
Horák
d and
Mats
Jonsson
*a
aSchool of Engineering Sciences in Chemistry, Biotechnology and Health (CBH), Department of Chemistry, Applied Physical Chemistry, KTH Royal Institute of Technology, SE-100 44 Stockholm, Sweden. E-mail: matsj@kth.se
bEuropean Commission, Joint Research Centre, Postfach 2340, DE-76215 Karlsruhe, Germany
cInstitute of Physics, ASCR, Prague, Czech Republic
dFaculty of Mathematics and Physics, Charles University, 12116 Prague, Czech Republic
First published on 12th November 2021
Abstract
Correction for ‘Mixed H2O/H2 plasma-induced redox reactions of thin uranium oxide films under UHV conditions’ by Ghada El Jamal et al., Dalton Trans., 2021, DOI: 10.1039/d1dt01020d.
The authors regret an error in the surname of one of the authors, Lukáš Horák, in the original manuscript. In addition, the previous corresponding author Ghada El Jamal has now moved on from her position at KTH Royal Institute of Technology and so the corresponding author for this article has been changed to Mats Jonsson. The corrected list of authors and affiliations for this paper is as shown above.
The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.
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