Issue 6, 2021

Space-confined CVD growth of 2D-MoS2 crystals with tunable dimensionality via adjusting growth conditions

Abstract

Two-dimensional MoS2 is demonstrated to be a prospective material for next-generation ultrathin nanoelectronics and optoelectronics. However, it remains an enormous challenge to fabricate high-yield, large-sized, and high-quality monolayered MoS2 crystals. Here, we present a feasible space-confined chemical vapor deposition method to grow 2D MoS2 flakes with tunable dimensionality. By tailoring the experimental parameters, such as growth temperature, the amount of S powder, and the distance between Mo foil and growth substrate/S powder, diverse MoS2 flakes with adjustable edge size can be obtained, and their corresponding thickness and crystalline quality have been evaluated by OM, AFM, Raman and PL techniques. Furthermore, the reason for the evolution of lateral dimension under tuned S amount and adjusted distance between Mo foil and S powder/growth substrate is revealed by the concentration variation of Mo : S. Our study presents an effective pathway to realize the controllable fabrication of 2D TMDC structures with tunable dimensionality via simply adjusting growth conditions.

Graphical abstract: Space-confined CVD growth of 2D-MoS2 crystals with tunable dimensionality via adjusting growth conditions

Article information

Article type
Paper
Submitted
23 Nov 2020
Accepted
27 Dec 2020
First published
28 Dec 2020

CrystEngComm, 2021,23, 1345-1351

Space-confined CVD growth of 2D-MoS2 crystals with tunable dimensionality via adjusting growth conditions

F. Chen, X. Jiang, J. Shao, B. Lu, L. Fu, S. Zhao and W. Su, CrystEngComm, 2021, 23, 1345 DOI: 10.1039/D0CE01711F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements