Issue 9, 2019

Pressure-driven band gap engineering in ion-conducting semiconductor silver orthophosphate

Abstract

The obtainment of active semiconductor photocatalysts remains a challenge for converting sunlight into clean fuels. A pressing need is to explore a novel method to tune the electronic band structures and gain insightful knowledge of the structure–property relationships. In this work, taking silver orthophosphate (Ag3PO4) as an example, a static pressure technique is applied to modulate the band gap and indirect–direct band character via altering its crystal structure and lattice parameters. Under ambient conditions, cubic Ag3PO4 possesses an indirect-band gap of ∼2.4 eV. At elevated pressure, the band gap of Ag3PO4 narrowed from 2.4 eV to 1.8 eV, reaching the optimal value for efficient solar water splitting. During the pressure-induced structural evolution from cubic to trigonal phases, the indirect-to-direct band gap crossover was predicted by first-principles calculations combined with structure search and synchrotron X-ray diffraction experiments. Strikingly, the observed band gap narrowing was partially retained after releasing pressure to ambient pressure. This work paves an alternative pathway to engineer the electronic structure of semiconductor photocatalysts and design better photo-functional materials.

Graphical abstract: Pressure-driven band gap engineering in ion-conducting semiconductor silver orthophosphate

Supplementary files

Article information

Article type
Paper
Submitted
04 Nov 2018
Accepted
31 Dec 2018
First published
03 Jan 2019

J. Mater. Chem. A, 2019,7, 4451-4458

Pressure-driven band gap engineering in ion-conducting semiconductor silver orthophosphate

Y. Lu, S. Zhu, E. Huang, Y. He, J. Ruan, G. Liu and H. Yan, J. Mater. Chem. A, 2019, 7, 4451 DOI: 10.1039/C8TA10606A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements