Open Access Article
Hengshuai Li
*abc,
Haiquan Huc,
Chenglin Baic,
Chunjiang Baob,
Feng Guoc,
Zhenbao Fengc and
Yongjun Liu
*a
aSchool of Chemistry and Chemical Engineering, Shandong University, Jinan 250100, China. E-mail: yongjunliu_1@sdu.edu.cn
bSchool of Mechanical & Automotive Engineering, Liaocheng University, Liaocheng, 252000, China. E-mail: lihengshuai@lcu.edu.cn; Tel: +86-13475895656
cShandong Key Laboratory of Optical Communication Science and Technology, School of Physics Science and Information Technology, Liaocheng University, Liaocheng, 252000, China
First published on 6th March 2019
The electronic structure of the graphitic carbon nitride (g-C6N6) under strain was obtained using the hybrid density functional HSE06 with a larger computational workload. The g-C6N6 could withstand 12% of the applied tensile strain. The electronic structure of g-C6N6 could be changed effectively under the tensile force. The band gap changed from direct to indirect under the strain and could be tuned in the range of 3.16 eV to 3.75 eV. At approximately 4% of the applied strain, there was a transition of the valence band maximum (VBM). A wider range of light absorption could be obtained under the strain. Our results provide a prospect for the future applications of two-dimensional materials in electronic and optoelectronic devices.
Cao et al. synthesized a graphitic carbon nitride (g-C6N6) through the reaction of cyanuric chloride (C3N3Cl3) with sodium using NiCl2 as a catalyst.12,13 The material presented an ideal bandgap and faster carrier moving speed, indicating its potential for application in electronics and optoelectronic devices.
In order to realize its application in electronic and optoelectronic devices, it is necessary to regulate its electronic structure reasonably. It is known that application of a strain is a very effective way to adjust the electronic structure of two-dimensional materials.14,15 Two-dimensional materials can withstand greater strain than bulk materials. In previous studies, it has been proven that many two-dimensional materials present good mechanical strain properties, for example graphene, MoS2, and phosphorene.16–22 As a result, strain has become a common way to regulate the properties of two-dimensional materials effectively.23–28
In this study, the strain force was applied to g-C6N6, and the changes of its electronic structure and optical properties were analysed. To obtain more accurate results, the calculations were based on the hybrid density functional theory (HSE06).29,30 It was found that g-C6N6 could sustain of up to 12% of the applied strain. In the range of tolerable strain, with the increasing in tensile force, the band gap of energy band increased gradually. Moreover, a wider range of light absorption could be obtained under strain.
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| Fig. 1 (a) The atomic structure diagram of g-C6N6, where the read area represents unit cell. (b) Strain–stress relation for g-C6N6. | ||
In general, the application of a strain has been regarded as an effective mechanism for regulating semiconductor performance. For two-dimensional materials this effect is more obvious because two-dimensional materials can withstand greater strain. Thus, the use of tensile strain is an effective method to adjust the properties of these materials. Next, we applied the strain to the g-C6N6 to observe the change of its properties. Tensile strain is defined as
![]() | (1) |
First, in order to measure the maximum borne strain force of g-C6N6, we applied biaxial strain force to the material and calculated the strain–stress relationship.38,39 As shown in Fig. 1(b), it is observed that g-C6N6 exhibits a linear elastic response when the strain is less than 7%, and a smooth curve change when the strain ranges from 7% to 12%. The maximum biaxial strain is 12%. Due to the existence of some defects,3,18,40 the tensile force of g-C6N6 is smaller than that of graphene. However, it is much larger than that of most three-dimensional materials.
In order to analyze the variation of system energy during tensile strain process, the relationship between energy and tensile strain was obtained, as shown in Fig. 2(a). With the increase in strain, the energy of the system increases gradually. When the tensile strain is less than 12%, the process of change is uniform, indicating that it is still a stable structure. The results obtained from this experiment are consistent with those obtained in Fig. 1(b).
The variation of bond length of C–C and C–N bonds under tensile strain was obtained (Fig. 2(b)). It was found that the C–C bond length varied greatly. The extension of g-C6N6 was mainly attributed to the stretching of C–C bond; since, the bonding properties of C–C bond and C–N bond are different, the reaction to tensile strain is different, which led to the change in band structure after stretching.
Next, we studied the variation in energy band with tensile force. The band with no tensile force applied is shown in Fig. 3(a). It can be seen that there is a direct band gap of about 3.16 eV near K point using the HSE06 functional, which is consistent with previous results.41 The band gap calculated by PBE functional is 1.53 eV, which is very different from the HSE06 value and the experimental value.12,13,41 Obviously, the band gap using PBE functional is underestimated. Moreover, this band gap, using the HSE hybrid functional, is slightly different from the results obtained by the experiment. The reasons include, but are not limited to the following: experimental error, measurement error, exciton effect, and impurity defect.
Fig. 3(b), (c) and (d) show the band structures of the materials at tensile strains ε = 4%, 8% and 12%, respectively. The energy band under the Fermi surface increases gradually at point Γ and decreases at point K, which leads to the shift of the valence band maximum (VBM) from point K to point Γ. At approximately ε = 4%, VBM is also located at two points in this band, which is a transition. After the transition, VBM remains at the Γ point of the band. It is found that the material changes from a direct band gap semiconductor to an indirect band gap semiconductor, and the band gap increases gradually. With the increase of tensile strain, the shape of the conduction band is almost unchanged; however, its position is slightly upward. From Fig. 4, the band gap of g-C6N6 increases equably from 3.16 eV to 3.75 eV, indicating that tensile force can effectively change the size of the band gap.42
To further understand the variation of the band below Fermi surface, we drew the charge–density diagram of the 27th band at Γ and K points, as is shown in Fig. 5. It can be seen that the electron cloud at K point is mainly composed of electrons around N atom, while the electron cloud at Γ point is composed of electrons around N and C atoms. That is to say, the transition probability of the electrons around N atom is high before stretching; however, the transition probabilities of the electrons around N atom and C atom are all high after stretching.43 This is also the reason why the direct band gap semiconductor changes to the indirect band gap semiconductor.
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| Fig. 5 The charge density of the 27th energy band under Fermi level at point Γ (a) and at point K (b). The isosurface value is set to 0.003 Å−3. | ||
Next, we analyzed the effect of strain on optical properties. To obtain the optical absorption properties of g-C6N6, frequency-dependent dielectric matrix was calculated using HSE06 function.44 The complex dielectric constants were given as
| ε(ω) = ε1(ω) + iε2(ω) | (2) |
The absorption coefficient I(ω) was defined as45
![]() | (3) |
The absorption coefficient was above zero, when only if the imaginary part
| ε2(ω) > 0 | (4) |
The imaginary part was determined by a summation over empty states using the equation19
![]() | (5) |
is the cell periodic part of the orbitals at the K point. A large number of empty conduction band states, which is almost twice higher than the number of valence band, were included for the summation of eqn (5).
The imaginary part of the dielectric function for the g-C6N6 was calculated using HSE06 hybrid function. The Fig. 6 shows the absorption spectra of the g-C6N6 with strains ε = 0%, ε = 4%, ε = 8%, and ε = 12%. As the tension increased, the range of the light absorption changed from 260 nm to 220 nm, where 220 nm is the down limit. When the strain reached 12%, the number of absorption peaks is clearly higher than for that without tensile strain. This results show that the tensile strain effectively changes the optical absorption property of the material, which is consistent with many previous studies.46–50 The change of optical absorption properties by tensile strain will be useful in the application of two-dimensional materials in optoelectronic devices.
Footnote |
| † Electronic supplementary information (ESI) available. See DOI: 10.1039/c9ra00396g |
| This journal is © The Royal Society of Chemistry 2019 |