Vapour-phase deposition of oriented copper dicarboxylate metal–organic framework thin films

Timothée Stassin; Sabina Rodríguez-Hermida; Benedikt Schrode; Alexander John Cruz; Francesco Carraro; Dmitry Kravchenko; Vincent Creemers; Ivo Stassen; Tom Hauffman; Dirk De Vos; Paolo Falcaro; Roland Resel; Rob Ameloot

doi:10.1039/C9CC05161A

Vapour-phase deposition of oriented copper dicarboxylate metal–organic framework thin films†

Timothée Stassin,

^a Sabina Rodríguez-Hermida,

^a Benedikt Schrode,^b Alexander John Cruz,

^ac Francesco Carraro,^d Dmitry Kravchenko,^a Vincent Creemers,^a Ivo Stassen,

^a Tom Hauffman,^c Dirk De Vos,

^a Paolo Falcaro,

^d Roland Resel

^b and Rob Ameloot

*^a

Author affiliations

* Corresponding authors

^a Centre for Membrane Separations, Adsorption, Catalysis and Spectroscopy for Sustainable Solutions (cMACS), KU Leuven, Celestijnenlaan 200F box 2454, 3000 Leuven, Belgium
E-mail: rob.ameloot@kuleuven.be

^b Institute of Solid State Physics, Graz University of Technology, Petersgasse 16, 8010 Graz, Austria

^c Department of Materials and Chemistry, Research group Electrochemical and Surface Engineering, Vrije Universiteit Brussel, Pleinlaan 2, 1050 Brussels, Belgium

^d Institute of Physical and Theoretical Chemistry, Graz University of Technology, Stremayrgasse 9/Z2, 8010 Graz, Austria

Abstract

Copper dicarboxylate metal–organic framework films are deposited via chemical vapour deposition. Uniform films of CuBDC and CuCDC with an out-of-plane orientation and accessible porosity are obtained from the reaction of Cu and CuO with vaporised dicarboxylic acid linkers.

Chemical Communications

Vapour-phase deposition of oriented copper dicarboxylate metal–organic framework thin films†

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