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Abstract | Cited by

We report for the first time on a pulsed vapor phase copper-free azide–alkyne click reaction on ZnO by using the atomic layer deposition (ALD) process technology. This reproducible and fast method is based on an in situ two-step reaction consisting of sequential exposures of ZnO to propiolic acid and benzyl azide.

Graphical abstract: Introducing the concept of pulsed vapor phase copper-free surface click-chemistry using the ALD technique

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