Issue 33, 2018

Ultra-low power Hf0.5Zr0.5O2 based ferroelectric tunnel junction synapses for hardware neural network applications

Abstract

Brain-inspired neuromorphic computing has shown great promise beyond the conventional Boolean logic. Nanoscale electronic synapses, which have stringent demands for integration density, dynamic range, energy consumption, etc., are key computational elements of the brain-inspired neuromorphic system. Ferroelectric tunneling junctions have been shown to be ideal candidates to realize the functions of electronic synapses due to their ultra-low energy consumption and the nature of ferroelectric tunneling. Here, we report a new electronic synapse based on a three-dimensional vertical Hf0.5Zr0.5O2-based ferroelectric tunneling junction that meets the full functions of biological synapses. The fabricated three-dimensional vertical ferroelectric tunneling junction synapse (FTJS) exhibits high integration density and excellent performances, such as analog-like conductance transition under a training scheme, low energy consumption of synaptic weight update (1.8 pJ per spike) and good repeatability (>103 cycles). In addition, the implementation of pattern training in hardware with strong tolerance to input faults and variations is also illustrated in the 3D vertical FTJS array. Furthermore, pattern classification and recognition are achieved, and these results demonstrate that the Hf0.5Zr0.5O2-based FTJS has high potential to be an ideal electronic component for neuromorphic system applications.

Graphical abstract: Ultra-low power Hf0.5Zr0.5O2 based ferroelectric tunnel junction synapses for hardware neural network applications

Supplementary files

Article information

Article type
Paper
Submitted
11 Jun 2018
Accepted
21 Jul 2018
First published
23 Jul 2018

Nanoscale, 2018,10, 15826-15833

Ultra-low power Hf0.5Zr0.5O2 based ferroelectric tunnel junction synapses for hardware neural network applications

L. Chen, T. Wang, Y. Dai, M. Cha, H. Zhu, Q. Sun, S. Ding, P. Zhou, L. Chua and D. W. Zhang, Nanoscale, 2018, 10, 15826 DOI: 10.1039/C8NR04734K

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