Open Access Article
Deepa Sriramulua,
Shuvan Prashant Turagab,
Andrew Anthony Bettiolb and
Suresh Valiyaveettil
*a
aMaterials Research Laboratory, Department of Chemistry, National University of Singapore, 3 Science Dive 3, Singapore 117543. E-mail: chmsv@nus.edu.sg
bDepartment of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542
First published on 27th June 2017
Controlling the assembly of molecules in thin films is essential for developing functional materials for sensitive and smart coatings. Highly oriented heterogeneous and optically anisotropic 2D silica films were prepared at the liquid–liquid interface using octadecylsilane and perylenesilane as starting materials. The film formation involved the organization of molecules assisted by van der Waals interactions and network formation from silica polymerization. All films were fully characterized using a wide range of instruments. Wetting behavior of the thin film was established using contact angle measurement. The octadecylsilica (O-Si) film showed a water contact angle of ∼107° on the hydrophobic side and ∼70° on the hydrophilic side. The films prepared from perylenesilane (P-Si) and mixtures of perylenesilane and octadecylsilane (POx-Si) through hydrolysis, were fully characterized and showed higher contact angle than the O-Si films. As expected, an increase in the concentration of octadecylsilane in POx-Si film led to the disruption of the π–π stacking of perylene groups, followed by changes in optical properties of the film, which were established using spectroscopic techniques. Such bifunctional anisotropic films can be used for creating interesting functional coatings on different substrates.
Porous silica films are used for antireflective coatings13 and as membranes for molecular separations.14,15 General methods to prepare silicate films include the chemical vapor deposition method (CVD)16–18 or the sol–gel method followed by dip-coating,19,20 spin coating21,22 and spray coating.23 A simple and cost effective methodology is needed to prepare homogeneous silica film for practical applications. Liquid–liquid interface conditions have been exploited for the synthesis of silica films from methyltrimethoxysilane24 and mesoporous silica films were prepared for various applications.25
In this study, structurally oriented, optically anisotropic silica films were prepared at the liquid–liquid interface polymerization and orientation dependent optical and wetting properties were measured (Scheme 1). A unique advantage of this method is the ability to incorporate desired molecules at different concentrations without changing the direction of molecular orientations (i.e. ⊥ to the plane of the film) during the synthesis of silica film at the liquid–liquid interface. The factors such as concentration, molecular structure, intermolecular interaction and the aggregation properties are used to control the organization and distribution of individual molecules inside the film. Also, we investigate the structure–property relationship of silica films prepared from octadecyl silane and perylene silane molecules. Octadecylsilica films (O-Si) showed hydrophobic properties on one side and hydrophilic properties on the other side. Molecular orientation dependant optical properties of perylene silica film (P-Si) and the hybrid octadecyl–perylenesilica films (POx-Si) were investigated in detail.
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| Scheme 1 Molecular structure and schematic illustration of the general structure and formation of (a) O-Si and (b) P-Si and (c) POx-Si at the interface of two immiscible liquids. | ||
Octadecylsilica (O-Si) films were compared using different concentrations of octadecyltrichlorosilane and 2 wt% PEI as a catalyst for a fixed time of 20 min. PEI was used as a preferred catalyst over aqueous ammonia, due to the rapid polymerization of octadecyltrichlorosilane at the chloroform–water interface in presence of ammonia, preventing stable film formation at the interface. Silica film formation was observed within 20 min upon the addition of octadecyltrichlorosilane in chloroform layer and PEI catalyst in the aqueous layer. The film formed was used for further characterizations. The observed high rate of formation of the film could be due to high reactivity of trichlorosilane which readily reacts with water to form Si–OH group and undergo condensation stabilized by polyethylenimine catalyst.26
FESEM images of the film at the chloroform side (Fig. 1a and S2a†) and aqueous side (Fig. 1b) generated at the interface using octadecylsilane were recorded. Minimum differences in morphology of the film surface facing chloroform side (hydrophobic) and water side (hydrophilic) were observed. Microstructure analysis of hydrophilic side of the film was found to be smoother with RMS roughness of 64.4, as compared to hydrophobic side which had a RMS roughness of 84.4. Hydrolysis and condensation of silane precursors are much faster in the presence of water and silica film was formed at the interface of water and chloroform. Owing to the presence of abundant water molecules for the hydrolysis of octadecyltrichlorosilane, there is little time for the individual clusters to grow before they crosslink with each other leading to a smooth surface (Fig. 1b). As the film thickness increases, the network hinders supply of water molecules to the rest of the unhydrolyzed silane precursors in the chloroform layer. The individual clusters grew in size before crosslinking with each other leading to a formation of rough surface of the film (Fig. 1a).
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| Fig. 1 FESEM micrographs of O-Si film (a) organic side and (b) aqueous side, morphologies on the organic side of (c) P-Si and (d) PO100-Si film. | ||
Similarly, perylenesilane with triethoxy group formed a film at the interface after 1 day using ammonia as the catalyst. FESEM image of P-Si film shows a rough surface which is different from the surface morphology of O-Si film (Fig. 1c and S2b†). P-Si film showed a surface roughness of ∼115 on both sides of the silica films. This is due to packing and aggregation of rigid planar perylene molecules leading to highly disordered films as compared to the film formed from flexible and linear octadecyltrichlorosilane.
Silica films obtained by mixing N-(2-ethylhexyl)-N′-(3-(triethoxysilyl)propyl)perylene-3,4,9,10-tetracarboxylic acid diimide and octadecyltrimethoxysilane in molar ratios of 1
:
1, 1
:
10, 1
:
100 and 1
:
1000 showed changes in morphology upon increasing the concentration of octadecyltrimethoxysilane (Fig. S2c–f†) when compared to silica film formed from pure octadecylsilane (Fig. 1a) or perylenesilane (Fig. 1c) precursors. At higher concentration of octadecylsilane such as PO100-Si (1
:
100) and PO1000-Si (1
:
1000), silica films formed were continuous and showed a smooth morphology as compared to silica film containing lower concentrations of octadecylsilane, PO1-Si and PO10-Si films. At higher concentration of octadecyltrimethoxysilane, the flexible octadecyl group tend to fill in the gaps formed via the aggregation of the perylene units and form a smooth film surface (Fig. 1d).
In addition to the peaks corresponding to silica network, P-Si film showed the presence of carbonyl stretching vibrations of imide peaks around 1700 and 1600 cm−1 and C
C aromatic stretching vibrations around ∼1590 cm−1, as previously reported for other perylenediimide derivatives.28 Interestingly, IR spectra of POx-Si (using different molar ratio of perylene and octadecylsilane) film, showed increase in the intensity of –CH2 alkyl stretching peaks with increase in concentration of octadecylsilane from 1
:
1 (PO1-Si) to 1
:
1000 (PO1000-Si) and decrease in diimide peak corresponding to perylene molecules (Fig. 2b).
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Fig. 3 Thermogravimetric analysis of ( ) O-Si, ( ) P-Si film and ( ) PO100-Si film using a heating rate of 10 °C min−1 in air. | ||
The P-Si film shows a slight decrease in weight loss (5%) in the region of 100–200 °C which could be due to loss of physisorbed water from the film. The second degradation in the region of 300–500 °C with 53.2% weight loss is assigned to the degradation of alkyl groups, partial degradation of perylene diimide and unreacted ethoxy groups on silane functional group. The third weight loss of 26.2% at 500–800 °C region corresponds to degradation of all carbon contents, Si–C, and C–N groups and the remaining 15% residual weight is attributed to the SiOx.30,31
PO100-Si film showed a TGA trace almost similar to O-Si film, with 40.3% weight loss around 150–400 °C region is due to the loss of alkyl chain moieties from the material and unreacted ethoxy groups on silane functional group and about 30.6% weight loss in the region 400–550 °C due to the loss of perylene groups. The observed weight loss (9.1%) at 550–800 °C accounts for degradation of remaining carbon content present in the film. The 17% residual weight is attributed to silica from the film.
sin
θ = λ, with λ = 1.5406 Å gave corresponding d-values of 51.3 Å, 17.28 Å and 4.12 Å, respectively. The d-spacing at 4.12 Å, is attributed to intermolecular interactions and van der Waals's forces observed in densely packed alkyl chains.32 Peak observed at 51.3 Å is closer to the reported value of d = 52.4 Å for a bilayer structure of octadecylsilyl groups.29
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| Fig. 4 XRD spectra of (a) O-Si and (b) P-Si film showing a wide angle X-ray diffraction (inset – small angle X-ray diffraction pattern). | ||
XRD profiles of P-Si film (Fig. 4b) showed diffraction peaks at 2θ = 2.91°, 10.20°, 15.7° and 25.84° (corresponding d-spacing of 30.33 Å, 8.67 Å, 5.64 Å and 3.44 Å, respectively). The observed peak with d = 8.67 Å is similar to the width of perylene core (calculated value = 9.2 Å).33,34 Similar ordering was also observed for columnar packing of alkyl substituted perylene diimide liquid crystals.33,34 Diffractions corresponding to 5.64 Å and 3.44 Å are attributed to π–π stacking of cofacially stacked perylene cores.35 Similarly high resolution TEM images and selected area electron diffraction pattern (inset in Fig. 5) observed for P-Si film (Fig. 5a) and PO100-Si (Fig. 5b) indicate a close packed perylene crystalline lattice in the film.
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| Fig. 5 TEM images of P-Si film (a) and PO100-Si film (b), (inset: selected area electron diffraction pattern of the corresponding film). | ||
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| Fig. 6 AFM micrographs of the (a) aqueous side and (b) organic side of O-Si film, (c) aqueous of the P-Si film. Inset: corresponding contact angle of water on the surface of the films. | ||
Static contact angle measurements on silica films were performed using a goniometer with 1 μL water droplets. The wetting properties of silica film facing water side and chloroform side are shown in Fig. 6. One side of the O-Si film is hydrophilic (θ ∼ 70.5°, Fig. 6a, inset) and the other side of the film is hydrophobic (θ ∼ 107.9°, Fig. 6b, inset). It is expected to see such variations owing to the differences in functional groups present on both sides of the film. However, P-Si film surface showed a water contact angle θ of ∼118° (Fig. 6c, inset), which is greater than O-Si film. This can be attributed to the close packing of perylene molecules on the silica film surface. But, hydrophilic and hydrophobic side of the P-Si film did not show significant differences in contact angle, which needs to be further explored to understand the distribution of organic moieties before and after transferring the film on the cover slip. It is hypothesized that the perylene being a planar, rigid aggregating molecule, the large aggregate formation leads to defects on the surface, which then minimizes the difference in functionality on both side of the film.
Silica films formed by using perylenesilane and octadecylsilane precursors at different molar ratios, showed an increase in contact angle with an increase in the concentration of octadecyl chains incorporated in the film (Table 1). The increase in hydrophobicity observed can be attributed to the introduction of C18 alkyl groups, which could fill the defects created by the aggregation and packing of perylene molecules on the surface. But contact angle for PO100-Si (∼116°) is lower than that of PO1-Si and PO10-Si. With increase in concentration of octadecylsilane, the packing of octadecyl groups tend to be more dominant and compact, which then reduces the availability of alkyl chains needed to fill the defect caused by the perylene aggregates.
| Silane filmsa | Static contact angle (θ) | |
|---|---|---|
| Chloroform side/deg | Water side/deg | |
a Where, O-Si and P-Si refers to film formed from octadecasilane and perylenesilane alone. PO1-Si, PO10-Si and PO100-Si film formed by mixing perylenesilane and octadecasilane in certain molar ratios such as 1 : 1, 1 : 10 and 1 : 100, respectively. |
||
| O-Si | 107.9 | 70.5 |
| P-Si | 118.0 | 118.6 |
| PO1-Si | 125.8 | 125 |
| PO10-Si | 129.4 | 128 |
| PO100-Si | 116.4 | 105.7 |
Optical images of dropcasted films from unreacted perylene silane precursor using FITC filter and P-Si films are given in Fig. S5.† P-Si film showed a well-ordered homogeneous film morphology. Interestingly, optical micrographs of PO1-Si, PO10-Si, PO100-Si and PO1000-Si in bright field and under FITC filter showed significant changes from red to light green color with increasing the concentration of octadecyl groups in the film (Fig. S6†). This is further supported by UV-Vis absorption and emission spectra of the films (Fig. 7). The absorption spectrum of perylenesilane in chloroform solution showed corresponding monomeric peaks at 526 nm, 489 nm and 458 nm, due to π–π* transition of the perylene rings, designated as 0–0, 0–1 and 0–2 transition (Fig. 7a).36 Compared to solution state absorption spectra, the spectra of the films are broad and less structured. Inverse increase in intensity of A0–1 absorption peaks are observed in all silica films compared to perylenesilane in solution with respect to A0–0. P-Si film showed merging of peaks at 489 nm and 458 nm and a broad featureless absorption spectra indicating face to face stacked H-aggregates of perylene molecules in the film. Similar peak pattern was also observed for PO10-Si film, which indicates perylene molecules inside the silica films are aggregated via strong intermolecular π–π interaction. Upon increasing the concentration of octadecylsilane in PO100-Si and PO1000-Si, (0–1), vibronic band at (458 nm) showed a relative increase in intensity as compared to (0–0) transition at 520 nm and also vibronic peaks are clear and less broad in appearance. Such relative increase in intensity of (0–1) vibrionic transition is typically observed for perylene molecules stacked cofacially forming H-aggregates.37 Thus, ratio of absorption intensity for A0–0/A0–1 increased from 0.78 for P-Si to 0.93 for PO1000-Si film indicating that extent of aggregation decreases with increase in concentration of octadecylsilane in the hybrid silica film.38
The emission spectrum of perylenesilane in chloroform solution (Fig. 7b) showed characteristic non-aggregated peaks at 532, 567 and 617 nm.36 Significant changes in fluorescence properties were observed in silica films synthesized at the interface of two liquids. P-Si film showed a broad emission spectrum with a red shift in the maximum at 670 nm (Fig. 7b). The longer wavelength band confirmed the presence of cofacial π–π interaction between perylene groups in the solid state which is in agreement with the data obtained from powder X-ray diffraction studies (Fig. 4b). Intense excimeric peaks were observed for PO1-Si at 650 nm and 698 nm. Also, with increasing the concentration of octadecyl group with respect to perylenesilane, a blue shift in emission maximum was observed from 650 nm to 617 nm (PO1000-Si), which clearly indicates the reduction in π–π interaction of perylene groups in presence of long octadecyl groups during film formation. PO1000-Si film showed a major excimeric emission at 618 nm, whereas film formed using 1
:
1 mixture of the two silane precursors (PO1-Si) showed emission at 698 nm. However, the excimer emission of PO1-Si film showed a bathochromic shift when compared to PO1000-Si film, which implies that strong π–π interactions and well organized molecular aggregates in PO1-S facilitate better exciton migrations in PO1-Si film.39
In order to further understand the arrangement of perylene molecules inside the film formed at the interface of two liquids, optical anisotropy of the films was measured using polarized UV-Vis absorption (Fig. 8) and polarized angle dependent emission spectra (Fig. 9).
The measurements of absorbance anisotropy of the films were performed by changing the position of the polarizer of the incident light every 10° within the range of 0° to 90°. As expected low degree of packing was observed in the dropcasted film of perylenesilane (Fig. 8A) as compared to P-Si (Fig. 8B) and PO100-Si films (Fig. 8C). The degree of packing was measured by calculating absorbance ratio A = A0–0/A0–1. The absorbance ratios for the drop casted film from perylenesilane, P-Si and PO100-Si were 0.6, 0.8 and 0.9, respectively. However, slight variation in the absorbance ratio was also observed with the changes in polarization angle from 0° to 90°, indicating polarization dependent absorbance properties of the film. When the sample was held normal to incoming polarized light, polarization dependence was maximum for PO100-Si film and least polarization dependence was observed for drop casted film of perylenesilane and interfacial film of P-Si (Fig. 8D).
The lack of polarization dependence for the dropcasted film indicates that precursor perylenesilane molecules are randomly oriented on the glass slide.40 Further, in order to study the alignment of dye molecules in P-Si, and PO100-Si films, polarized emission spectra were recorded by rotating the incident polarizer (from 0° to 360°) at every 20° (Fig. 9). Significant differences in emission intensities of the polarized light parallel and perpendicular to the plane of polarization were observed for PO100-Si film (Fig. 9c) when compared to P-Si film (Fig. 9b) and drop casted film of perylenesilane precursor (Fig. 9a). Among the three films investigated, the least differences in parallel and perpendicular emission intensities were observed for drop casted films of perylenesilane (Fig. 9a) owing to low molecular order inside the film.
Polarization ratio was calculated using a formula (eqn (1)).41
![]() | (1) |
The alignment of perylene molecules can be quantitatively measured using the dichroic ratio (D) which is defined as the ratio of intensities of the dye molecule parallel (I∥) and perpendicular (I⊥) to the incident polarized light, as shown in eqn (2).42 D value is used to calculate the order parameter (S), as shown in eqn (3).43 Dye molecules are said to be fully aligned if the calculated order parameter, S = 1 and completely random alignment when S = 0.44
![]() | (2) |
![]() | (3) |
Dichroic ratio of two silica films and the drop casted film of perylenesilane are depicted graphically with respect to polarization angle in Fig. 9d. The estimated values of D and S are summarized in Table 2.
| Sample | Absorbance ratio, A0–0/A0–1 | λemi (nm) | Polarization degree (P) | Dichroic ratio (D) | Order parameter (S) |
|---|---|---|---|---|---|
| Perylenesilane dropcast film | 0.6 | 654 | 0.02 | 0.91–1.06 | −0.03–0.02 |
| P-Si film | 0.8 | 660 | 0.05 | 1.5–1.84 | 0.14–0.22 |
| PO100-Si film | 0.9 | 650 | 0.2 | 1.9–2.3 | 0.23–0.30 |
Drop casted film of perylenesilane showed the least order parameter (S ∼ 0.02), indicating a fully random arrangement of perylene molecules. This is expected due to the random organization of perylene molecules in the drop casted film. On the other hand, introduction of long octadecyl groups in excess with respect to perylene molecules (PO100-Si) provides an induced higher degree of order in the film, formation and organization of large aggregates of perylene is retarded, which then lead to alignment of molecules inside the silica film.
![]() | (4) |
Fluorescence quenching can be attributed to photoinduced electron transfer from HOMO of electron rich aniline to HOMO of electron poor perylene molecules. However, due to changes in aggregation of perylene, the vapor sensing for aniline is slightly different for different silica films (Fig. 10). Silica film formed using a combination of 1
:
1 mixture (PO1-Si) showed higher quenching efficiency of ∼81% than PO100-Si (69%). Decrease in concentration of perylene in the film led to changes in structure, solubility of amines in the film and interaction of amines with perylene molecules inside PO100-Si films. The observed fluorescence quenching can be attributed to strong interaction between electron deficient perylene molecules with electron rich aniline molecules.46,47
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Fig. 10 Fluorescence quenching response of POx-Si films after exposure to vapors of aniline for known time interval ( ) 30 min, and ( ) 24 h. | ||
:
1, 1
:
10, 1
:
100 and 1
:
1000) molecules. An increase in concentration of octadecylsilane inside the film led to the formation of homogenous film, which resulted in changes in properties of the silica films. Also, organization of perylene molecules inside the silica films was examined using polarized absorption and emission anisotropy of the film, measured using a polarized spectrophotometer. PO100-Si film showed a high dichroic ratio (D) of 2.3 when compared to the values of P-Si film (D = 1.8) and drop casted film of perylenesilane (D = 1.08). Thus, PO100-Si films showed strong molecular alignment with an order of parameter, S = 0.3 and the least order of parameter was observed for drop casted film of perylenesilane (S = 0.02). Different films also showed interesting optical responses in presence of aniline vapors. In this study, we investigated the structure–property correlation of perylene incorporated anisotropic 2D silica films formed through hydrolysis and condensation of silane precursors at the interface of water and chloroform. Such ordered silica films may have potential applications in different areas and we are currently exploring them in our lab.
:
1, 1
:
10, 1
:
100 and 1
:
1000 were dissolved in CHCl3 (10 mL) in a beaker. Ammonia solution (10 mL) was added slowly on top of the CHCl3 solution without disturbing the system. The ammonia initiated the polymerization of monomers at the interface under ambient conditions.
Footnote |
| † Electronic supplementary information (ESI) available: Molecular structure of precursors used for preparing silica films, SEM images of silica films, TGA-DTA analysis of O-Si, P-Si film and PO100-Si film, digital photograph of O-Si film surface collected on a glass substrate, optical images of film in the presence and absence of UV source. See DOI: 10.1039/c7ra05036d |
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