Issue 27, 2017
From the journal:

Polymer Chemistry

Photo-reversible bonding and cleavage of block copolymers†

Siham Telitel,a   Eva Blasco,a   Lukas D. Bangert,a   Felix H. Schacher, ORCID logo *bc   Anja S. Goldmann ORCID logo *ad  and  Christopher Barner-Kowollik ORCID logo *ad  

* Corresponding authors

a Macromolecular Architectures, Institut für Technische Chemie und Polymerchemie, Karlsruhe Institute of Technology (KIT), Engesserstr. 18, 76131 Karlsruhe, Germany
E-mail: anja.goldmann@kit.edu, christopher.barner-kowollik@kit.edu

b Institute of Organic Chemistry and Macromolecular Chemistry (IOMC), Friedrich Schiller University Jena, Humboldtstr. 10, 07743 Jena, Germany

c Jena Center for Soft Matter (JCSM), Friedrich Schiller University Jena, Philosophenweg 7, 07743 Jena, Germany
E-mail: felix.schacher@uni-jena.de

d School of Chemistry, Physics and Mechanical Engineering, Queensland University of Technology (QUT), 2 George Street, Brisbane, Australia
E-mail: a.goldmann@qut.edu.au, christopher.barnerkowollik@qut.edu.au

Abstract

We introduce the photo-dimerization and critically the reversible cleavage of block copolymers featuring different polarities via reversible [4 + 4] anthracene cycloadditions at specific wavelengths (λ1 = 350 nm, λ2 = 270 nm). The facile and rapid access to the photochemical bonding and cleavage of amphiphilic anthracene-functionalized polystyrene-block-poly(butyl acrylate) (PS-b-PBA) has been verified by SEC and 1H-DOSY NMR.

Graphical abstract: Photo-reversible bonding and cleavage of block copolymers

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Article information

DOI
https://doi.org/10.1039/C7PY00843K
Article type
Paper
Submitted
21 May 2017
Accepted
14 Jun 2017
First published
16 Jun 2017

Polym. Chem., 2017,8, 4038-4042

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Photo-reversible bonding and cleavage of block copolymers

S. Telitel, E. Blasco, L. D. Bangert, F. H. Schacher, A. S. Goldmann and C. Barner-Kowollik, Polym. Chem., 2017, 8, 4038 DOI: 10.1039/C7PY00843K

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