Jun-Young Bae,
Hwea-Yoon Kim,
Young-Woo Lim,
Yoon-Hyeok Kim and
Byeong-Soo Bae*
Laboratory of Optical Materials and Coating (LOMC), Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Republic of Korea. E-mail: bsbae@kaist.ac.kr
First published on 8th March 2016
An ultraviolet (UV) transparent recoverable fluoro-siloxane hybrid material was prepared via a facile sol–gel process. The transparency and stability of a deep UV-LED encapsulant is a key factor in the light extraction efficiency and long-term reliability of a UV LED. In this study, we report a novel UV-LED encapsulation process through the thermal hydrosilylation curing of vinyl-fluoro and hydrogen-methyl oligosiloxane resins. The fluoro-siloxane hybrimer showed high UV transparency in the deep UV (<300 nm) region, with increased transmittance after UVB (300 nm) and UVC (250 nm) aging for 2000 hours from radical stabilization and a high cross-linking density. Specifically, vinyl radical formation and recombination during UV irradiation and their effects on deep UV transmittance were investigated. With its easy low-temperature solution processability and robust performance stability, the fluoro-siloxane hybrimer was used as a deep UV-LED packaging material to demonstrate its potential as a stable encapsulant that is also UV transparent.
Device performance and reliability levels are closely related to the characteristics of the encapsulant which significantly improves the light extraction capability and protects chips from stress sources such as heat, light, humidity, and mechanical damage.5–7 Thus, the materials used for UV-LED encapsulation must be transparent under deep UV light and must maintain their initial transparency for extended periods of UV exposure. Long-term stability during operation requires UV resistance against transmittance decreases, induced by absorbed UV light energy and radical formation from organic phases.8–10
For this reason, silica-based glass encapsulants are widely used in current UV-LEDs providing superior deep UV transparency and resistance from their stable inorganic phases.11,12 However, an extremely high processing temperature is needed for the encapsulation stage which involves the sintering of monolithic silica from glass frits, and consequently, the LED chip can be damaged from the heat. Compared to glass encapsulants, organo-siloxane based encapsulants offer a simple fabrication process using in situ polymerization after direct application of the resin into the LED chip.13–15 A recent issue regarding the use of siloxane encapsulants is the requirement of stability against deep-UV light, because the organic groups in siloxanes are susceptible to high UV energy induced oxidation in air. Thus far, no siloxane based encapsulants, having UVC transparency and resistance to UVC light induced degradation, have been reported. Therefore, it is highly desirable to develop stable materials that are UVC transparent which can also maintain optical transmittance during UVC irradiation.
Inorganic–organic hybrid materials (hybrimers) using sol–gel processed oligosiloxane resins provide the combined benefits of both inorganic and organic characteristics, such as optical transparency, flexibility, and thermal stability.16–20 We investigated different hybrimers and then fabricated various optical devices with the hybrimers using a simple production process to achieve superior optical, thermal, and mechanical reliability. In our previous work, hybrimers with a high refractive index or a low refractive index were fabricated through the hydrosilylation of the vinyl and hydrogen groups in oligosiloxane resins, taking advantage of the in situ curing inside the LED chip, low shrinkage and good adhesion.6,7,13
Based on the above considerations, in earlier work, we reported that a sol–gel processed methyl hybrimer using a newly synthesized hydrogen-methyl oligosiloxane resin with a vinyl-methyl siloxane could be used as a UV transparent, stable LED encapsulant with UVB light resistance at 300 nm.21 Owing to complete cross-linking, the methyl groups are caged by highly condensed siloxane bonds, inhibiting the cleavage of the methyl groups by UV light energy. However, there are still problems associated with limited deep UV stability, despite the fact, that methyl hybrimers show high UVC transmittance and UVB stability comparable to that of PDMS (polydimethylsiloxane).
Hybrimers, do nevertheless have inherent potential for use as a deep UV-LED encapsulant because the UV absorbing organic groups can be stabilized by adjusting the composition of the functional groups composition and the resulting UV irradiation induced radical formation, and oxidation phenomena. In this study, we introduce an optically recoverable fluoro-siloxane hybrid material (a fluoro hybrimer) which exhibits superior deep UV stability in the UVC region, and demonstrate its potential as an encapsulant for UV-LEDs using UVC light. The term ‘optically recoverable’ is used expressly to indicate that our hybrimer encapsulant exhibits increased UV transparency under practical UV radiation.
As shown in Scheme 1, we replaced the conventional linear vinyl-methyl siloxane resin with a sol–gel derived vinyl-fluoro oligosiloxane resin to increase the vinyl functionality and to form a densely cross-linked and branched siloxane network. Due to the structural modifications, the fluoro hybrimer had a higher cross-linking density and fewer methyl groups and methyl radicals. The stabilization of UV absorbing vinyl groups led to an increase in the UVC transmittance during the long-term UV exposure of the fluoro hybrimer. Most notably, enhanced deep UV stability in the UVC (200–280 nm) region was achieved, which has never been reported to the best of our knowledge for any organo siloxane-based UV-LED encapsulant. The encapsulant based on the fluoro hybrimer can provide long-term stable UV transparency for the performance and reliability of deep UV generating LEDs.
First, the alkoxy groups are hydrolyzed to form hydroxyl (–OH) groups, after which, condensation between the hydroxyl group and alkoxy group follows through a nucleophilic attack by deprotonation. As a result, covalently-linked siloxane (Si–O–Si) bonds are formed with a high degree of condensation (DOC), up to 94.2%, shown in Fig. 1a.22–24 The notations (Dn and Tn) in the 29Si NMR spectra represent Si atoms from the MVDMS with di-alkoxy groups and FTMS with tri-alkoxy groups, for which n denotes the number of siloxane bonds attached to a Si atom. A high D2 (−32 to −36 ppm) and T3 (−66 to −71 ppm) species content fully condensed to have bridged siloxane bonds without any unreacted alkoxy or hydroxyl groups was clearly detected. Additionally, there were no remaining monomers (D0 and T0) and only a small number of partially condensed alkoxy or hydroxyl (D1, T1, and T2) groups. The high degree of condensation is from the inductive effect of the electron-withdrawing fluorine groups; furthermore, there is a ladder-like siloxane structure induced by the T species. For UV transparency and stability of silicone-based materials, it is very important to form fully condensed siloxane bonds with a minimum number of unreacted groups, as they can be a source of UV absorbing radicals.
Fig. 1 (a) 29Si NMR spectra (b) FT-IR spectra (c) MALDI-TOF spectra of the synthesized vinyl-fluoro oligosiloxane resin. (d) DSC spectra of the VF and HM mixed resin (prepolymer). |
Additionally, the FT-IR spectra (Fig. 1b) show the formation of siloxane bonds with vinyl and fluoro groups after the sol–gel reaction with the silane precursors. We analyzed the molecular size and branched siloxane network of the VF using the MALDI-TOF spectra shown in Fig. 1c. It is well known that increases in the siloxane size and number of vinyl groups are closely related to a high degree of cross-linking. The vinyl-fluoro oligosiloxane consisted of oligomers with a molecular size from tetramers to decamers (500–2500 g mol−1). The empirical molecular weight of the oligomers matched the calculated molecular size assuming that the oligomers have a branched-linear structure, rather than assuming that the branched-linear siloxane chain is reduced by the presence of bulky trifluoromethyl pendants. The branched structure of the VF indicates a higher siloxane density compared to the linear structure of the methyl hybrimer in our previous study. The high molecular size and vinyl functionality of the VF helps to promote effective cross-linking and the formation of a densely linked structure of cured siloxane.
As shown in Fig. 1d, the DSC spectra (onset curing temperature = 103 °C) denote the curing behavior of the resin blends, showing an exothermic cross-linking reaction of the vinyl and silicone–hydrogen groups. According to the Pt catalyst content, we optimized the curing temperature and time for complete cross-linking. An excess amount of Pt catalyst in the cured hybrimer affects the UV transparency and stability because the catalyst strongly absorbs UV light.29 Thus, we minimized the amount of catalyst to 6 ppm in the mixed VF and HM resins to increase the initial UV transmittance and UV resistance during long-term aging. Based on these analyses, thermal curing was effectively achieved with 6 ppm of the Pt catalyst at 170 °C in air for 4 h owing to the large number of vinyl groups.
As the unreacted vinyl groups increase, the transmittance decreases due to the presence of unsaturated double bonds and radicals formed by the thermal or UV degradation which can be sources for UV light absorption.30 We showed that the number of vinyl groups is closely related to the initial UV transmittance of the fluoro hybrimer. An excess number of silicone–hydrogen groups did not have an adverse effect on the initial transparency; however, the remaining hydrogen groups also can be a source of UV degradation.31 Based on these considerations, the molar ratio between the vinyl and hydrogen groups was optimized at 1:1.3 which has the highest initial UV transparency and cross-linking density. Additionally, we determined the refractive index of the hybrimer (1.41) and achieved tunable shore hardness to fabricate soft or hard encapsulants.
To evaluate and compare the UV stability of the fluoro and methyl hybrimers, as-prepared bulks were aged under UVB lamps at an intensity of 10 mW cm−2 for 2000 hours in air. The transmittance spectra in Fig. 2b show a slight increase in the UV transparency due to the minimum amount of unreacted vinyl groups, while there is a high transmittance increase as a result of the stabilization of excess vinyl groups in the fluoro hybrimer with a vinyl to hydrogen molar ratio of 1.6:1.0 (Fig. 2c). Thus, we can conclude that the remaining content of the vinyl groups in the fluoro hybrimer affects the degree of optical transparency recovery when the hybrimers are exposed to UV light.
Although the total amount of UV absorption in the fluoro hybrimer increases with the aging time, the transmittance is nearly identical showing only a slight change. The hybrimer features a substantial number of vinyl and fluoro groups, relatively few methyl groups, and hydrosilylation-derived short cross-links which contribute to the high UV stability. Even after 2000 h of aging, the transmittance of the fluoro hybrimer increases because the vinyl groups are stabilized by the extended UV light exposure, whereas the methyl hybrimer eventually shows a drastic decrease in its UVC transmittance to 59% after 400 hours of aging.
The decrease in the optical transparency of the methyl hybrimer is due to the formation of methyl radicals and the radical-activated oxidative degradation of the organic pendants in the siloxane backbone which originate from the UV absorption of the methyl phases as well as from the loosely cross-linked siloxane network.32–34 However, the densely cross-linked fluoro hybrimer formed fewer methyl radicals compared to the methyl hybrimer with long linear siloxane chains and few cross-links. Additionally, the increased degree of condensation and branching of the siloxane bonds inhibited the cleavage of the methyl groups.
In addition to its excellent UVB stability, the fluoro hybrimer is highly transparent to radiation in the deep UV region (UVC), where UV absorption by the organic groups may become profoundly significant. As shown in Fig. 4, optical degradation caused by long-term UV irradiation was analyzed by tracing the transmittance curve during exposure to UVC light (200–280 nm). The UV/Vis spectra clearly show the higher transmittance of the methyl hybrimer (Fig. 4b) before UV exposure compared with that of the fluoro hybrimer, as the presence of unreacted vinyl groups and the formation of vinyl radicals during thermal curing or UV irradiation have adverse effects on the initial UV transparency.
As shown in Fig. 4c, however, the UVA and UVB transmittance levels of the fluoro hybrimer were maintained for 2000 h of UVC expected, the methyl hybrimer ended up with severe discoloration in the lower UV region which was consistent with the results of the UVB test. The spectra of the methyl hybrimer are shifted down and to the right moving the transmittance curve further into the visible region. The UV transparency in the UVA, UVB, and UVC regions decreases; especially, the UVC transparency, which decreases by more than 10%. In contrast, the optical transmittance values of the fluoro hybrimer (52% at 270 nm), which were traced every 72 hours under environmental conditions identical to those used in the UVB test, increased to 62%. The UVA and UVB transmittance levels were fairly stable until 2000 hours, and the curve showed little variation over the entire period without any discolorations or cracks in the bulk, confirming the superior UV stability of the fluoro hybrimer.
In general, methyl groups are susceptible to UV induced degradation because methyl radicals are cleaved from siloxane backbone chains by deep UV light energy. The fluoro hybrimer has fluorine groups with higher bonding energy and with a minimum number of methyl groups. The presence of strong carbon–fluorine and siloxane bonds and a densely cross-linked and branched structure formed by the complete condensation and hydrosilylation reaction of the precursors effectively inhibits the generation of methyl radicals. Thus, the low degree of degradation of the methyl groups can be attributed to their minimal exposure to extended UV light.
Organic phases in the linearly structured polysiloxanes are cleaved to form radicals, and siloxane bonds are cut during UV irradiation forming a cyclic ring structure. Additionally, the substantial number of remaining vinyl groups in the fluoro-siloxane network absorbs the deep UV light instead of methyl groups, thereby forming stable saturated bonds such as hydroxyl and carbon–carbon groups (Fig. 5).30 During UV irradiation, the vinyl groups easily absorb the UV light energy, and are converted to stable species with oxygen such as hydroxyl and carbon saturated bonds (Scheme 2a). The methyl groups in the methyl hybrimer are more easily cleaved to form radicals, then forming UV absorbing hydroperoxide after UV irradiation (Scheme 2b). Thus, the low initial UV transparency of the fluoro hybrimer is increased by this UV induced radical stabilization effect, whereas the high initial UV transparency of the methyl hybrimer decreases due to the formation of methyl radicals. We confirmed that the fluoro hybrimer shows improved UV stability compared to methyl-siloxane which has a high number of methyl groups and a linear structure. Moreover, there was no indication of cracks or shrinkage during UV irradiation, these issues can arise due to the chain scission of the organic groups.
Scheme 2 UV induced radical formation, stabilization, and degradation mechanism during long-term irradiation of the (a) fluoro hybrimer and (b) methyl hybrimer. |
We performed detailed investigations of the formation and stabilization of radicals against thermal curing and UV-induced oxidation. During UV exposure, the presence of vinyl groups/radicals and structural density changes was investigated through electron spin resonance (Fig. S3, ESI†), carbon and silicone NMR analysis. The silicone (29Si) NMR shown in Fig. 5b indicates that highly condensed and cross-linked siloxane networks are formed, these are not damaged by the extensive UVC irradiation which is consistent with the results from the thermal decomposition test (Fig. S4†). The spectra before and after UV exposure show similar curves, and the bands from the fluorine, hydrogen, and methyl siloxane species are stable under prolonged UV radiation. There is no chain scission of the siloxane backbone or breakage of the attached organic species during UV irradiation. The densely cross-linked fluoro hybrimer from the highly condensed VF resin shows a reduced formation of organic radicals caused by remaining silane monomers and unreacted silanol or methyl groups.
The carbon (13C) NMR spectra of the fluoro hybrimer clearly show the presence of vinyl groups and vinyl radicals in the cross-linked siloxane network. During UV radiation, the vinyl groups and radicals completely disappeared to form saturated chemical bonds, as described in Fig. 5c. For the UV-irradiated fluoro hybrimer, only characteristic bands from the carbon–fluorine (C–F) groups are seen, no bands from the vinyl groups and vinyl radicals (131–138 ppm) are observed.
The radical stabilization phenomenon was further confirmed in an additional analysis of the FT-IR curve showing the formation of hydroxyl groups (band at 3200–3600 cm−1) in the fluoro hybrimer during UV irradiation (Fig. 5d). We can conclude that the vinyl radicals are converted to this hydroxyl species with oxygen, which provides ESI† regarding the presence of radical species in the material. Corresponding to the above mentioned structural analysis and the UV-induced radical stabilization proposed in Scheme 2, the cured fluoro hybrimer bulk contained a substantial number of hydroxyl groups after UV irradiation. After UV irradiation, there were relatively few resonance signals from the radicals owing to the recombination to form non-radical species (Fig. S3, ESI†).
Organic functional groups could have dissociated easily to form radicals at the high curing temperature during hydrosilylation. The methyl hybrimer has advantages with regard to initial UV transparency due to its low number of vinyl groups, large free volume and linear siloxane backbone; however, the low cross-linking density and high number of methyl groups have adverse effects on the UV resistance capabilities. The fluoro hybrimer replaces the methyl groups with vinyl and fluorine groups to inhibit decreases in the UV transmittance under deep UV irradiation. The combined effects of an initially high number of vinyl groups and the electron-withdrawing ability of the fluorine groups promote the formation of vinyl radicals during thermal curing and UV aging. However, relatively few amount of methyl groups are cleaved by UV light due to the highly cross-linked structure and the presence of fluoro groups.
The UV-induced radical stabilization, robust siloxane network, hyper-branched cross-linking, and high cross-link density of the fluoro hybrimer result in optical transmittance recovery during deep UV irradiation. Such UV stability is not commonly achieved with conventional organo-siloxane based LED encapsulants. We anticipate that the fluoro hybrimer will have many applications which take advantage of its inherent benefits including its ease of processing, high UV transparency and good stability.
Footnote |
† Electronic supplementary information (ESI) available: Experimental details and additional information about material characterization. See DOI: 10.1039/c6ra01346e |
This journal is © The Royal Society of Chemistry 2016 |