Chao Fan‡
ab,
Yan Li‡b,
Fangyuan Lub,
Hui-Xiong Dengb,
Zhongming Wei*b and
Jingbo Li*b
aSchool of Electronics and Information Engineering, Hebei University of Technology, Tianjin 300401, China
bState Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 10083, China. E-mail: zmwei@semi.ac.cn; jbli@semi.ac.cn
First published on 1st December 2015
2D layered materials have attracted increasing interest, owing to their unique properties and large potential for versatile applications. As one of the 2D layered semiconductors, tin disulfide (SnS2) is rarely reported compared with other 2D materials like molybdenum disulfide (MoS2). Herein, high quality SnS2 flakes were grown by a facile and low-cost path, and photodetectors based on thin SnS2 flakes were fabricated and characterized. These flakes are of high quality according to the results of XRD, Raman and TEM measurements, and present hexagonal and half-hexagonal forms with an average diameter of 100 μm. The devices based on these SnS2 flakes showed wavelength dependent photo-responsive characteristics as the illuminating wavelength varied in the UV-Vis range (from 100 to 800 nm). They also showed excellent photo-responsive characteristics under monochromic illumination using three different wavelengths (533, 405 and 255 nm) with high photo-responsivity and high external quantum efficiency (EQE). The experimental results agree well with the first-principles calculated band structure and optical absorption coefficient curve.
As a 2D material, SnS2 is abundant in the earth and environmentally friendly. In the layered sandwich structure of SnS2 crystals, each layer of Sn atoms is sandwiched between two layers of S atoms and the layers of S–Sn–S interact with each other through van der Waals (VDW) interactions (Fig. 1a), which allow adjacent layers to slide. However, SnS2 has not yet attracted as much attention as other 2D materials. It is an indirect semiconductor material with a band gap of 2.1 eV,23–25 which would show more potential for modulating energy levels by doping and other methods. But SnS2 easily decomposes into tin and sulfur at 650 °C, which is an obstacle in the synthesis of SnS2 at high temperatures. SnS2 was successfully prepared using some chemical methods, such as hydrothermal methods26,27 and chemical transport deposition.23 Also, recently Huang et al. synthesized high-quality hexagonal nanosheets on carbon cloth via chemical vapour deposition (CVD), and they have huge potential in highly sensitive phototransistors.28 In this work, we grew SnS2 flakes via a facile and low-cost method. Furthermore, photodetectors based on the prepared SnS2 flakes were fabricated, and their photoresponsive characteristics under UV-Vis illumination at different wavelengths were investigated in detail.
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Fig. 1 (a) The crystal structure of SnS2. (b) Illustration of the growth process; all details of the experiments are presented in the ESI.† (c) Typical OM photograph of the as-prepared SnS2 flakes. (d, e and f) XRD pattern of SnS2 and Raman spectra of a flake in the circle marked in (c). (g and h) A HR-TEM image and corresponding SEAD pattern of SnS2. |
To confirm the composition and crystal structure of the SnS2 flakes, Raman spectra and XRD patterns were both detected and are shown in Fig. 1d–f. Fig. 1d shows the XRD pattern of the as-grown SnS2 flakes, which is assigned to a 2T-type layered structure (JCPDS: 23-677). The plane indexes according to the crystalline planes of SnS2 are labelled in the pattern, and there are no other peaks belonging to SnS, SnO or SnO2.29,30
Fig. 1e represents a Raman spectrum of the hexagonal flake in the marked circle in Fig. 1c. In the Raman spectrum, two strong Raman peaks are observed obviously in the range from 100 to 800 cm−1. The steep one is located at 313.2 cm−1, which is related to the A1g vibration mode of SnS2. The other broad one is located at around 159 cm−1, and it can be divided into an intergradation of four peaks using Lorentz fitting, which are located at 137.2, 159.1, 187.1 and 205.1 cm−1, as shown in Fig. 1f. The peak at 205.1 cm−1 is assigned to the Eg vibration mode of SnS2, and the other three peaks are attributed to the second-order vibration modes of SnS2.31 The Raman spectra were in accord with previous studies on SnS2 Raman spectra32,33, and in conclusion the results of Raman and XRD measurements confirmed that the obtained samples are pure SnS2.
The quality of the SnS2 flakes is further investigated using transmission electron microscopy (TEM). A typical high resolution TEM image and the related selected area-electron-diffraction (SAED) pattern are shown in Fig. 1g and h. In the HR-TEM image two lattices were marked, one corresponds to the (100) plane of SnS2, with an inter-plane distance of 0.31 nm. The other lattice corresponds to the (110) plane, with an inter-plane distance of 0.18 nm. The diffraction points are clear and regularly arranged in the SAED pattern. Both the HRTEM and SAED images clearly demonstrate the high crystallinity of the as-grown SnS2 flakes.
To further understand the growth mechanism of the SnS2 flakes, as-grown SnS2 flakes with different growth times from 2 to 6 min were studied. According to the images of the as-grown SnS2 flakes (Fig. S1, ESI†) the whole growth process can be mainly divided into four stages, and the related representative images are shown in Fig. 2a. The reaction times are 1, 2, 3 and 3.8 min, respectively. In the first stage, SnO powder was heated to SnO vapor. Then the SnO vapor made contact with the substrate and deposited on it. A Raman measurement was performed, and a Raman spectrum of a dot in the first stage is shown in Fig. 2b. There are three peaks located at 110, 206 and 516 cm−1. The peak at 516 cm−1 belongs to silicon, and the peaks at 110 and 206 cm−1 are assigned to the A1g and B1g vibration modes of SnO. SnO was confirmed in this stage according to the results of the Raman measurements. In the second stage, SnO particles began to react with S and small SnS2 particles formed. The whole reaction can be described as:
2SnO + 5S → 2SnS2 + SO2 |
SnO dots from the first stage became SnS2 crystal nuclei after this reaction. The strongest peak at 313 cm−1 in the Raman spectrum (Fig. 2c) is related to the A1g vibration mode of SnS2. The peak located at 520 cm−1 belongs to silicon. As the reaction continued, SnS2 grew larger based on the crystal nuclei, as shown in the third and fourth stages. According to the Bravais rule, the important crystal planes with the highest reticular densities and the greatest interlayer distances govern the crystal morphology during the growth process. The interlayer distance of the (001) plane is larger than other crystal plane distances for SnS2, and the (001) plane has a higher reticular density than other planes. The distance between atoms in this plane is smallest and the binding between them is strongest. Also this plane has the lowest surface energy, as in the previous literature.34,35 Atoms in the plane easily absorb other different atoms. When SnS2 nuclei formed, they were irregular and randomly located on the substrate with various directions. In the third stage, SnS2 flakes were irregular due to their nuclei. Finally, SnS2 flakes with different directions formed after the process of deposition–growth–nucleation–regrowth.
Due to the rough surface and difficulty in controlling SnS2 flakes, it is difficult to fabricate electrodes in situ for device fabrication. Thus, adhesive tape was used to mechanically exfoliate SnS2 flakes, and then the SnS2 flakes were transferred onto a SiO2/Si substrate. Devices were fabricated using photo-lithography using 300 nm Au and 50 nm Cr as the electrodes. Five devices were made and the transport and photoresponsive properties were measured. Fig. 3a and c represent an OM photograph and AFM image of a typical device. The size of the gap between the two electrodes is 4 × 20 μm and the size of the SnS2 flake in the gap is 4 × 7 μm. Before photo-lithography, Raman measurements were taken for the flake. The Raman spectrum is shown Fig. 3b, and there are two peaks which have different intensities. Peak B at 520 cm−1 belongs to silicon and peak A at 313 cm−1 is related to the A1g vibration mode of SnS2. Compared to the Raman spectrum in Fig. 1e, the existence of peak B means that the flake shown in Fig. 3a is thinner. Fig. 3c depicts an AFM image of a thin SnS2 flake, with black dashed lines surrounding it. The thickness of the flake was also detected, and the height of the SnS2 flake is about 111 nm as shown in Fig. 3d.
The photo-responsive characteristics of the devices under a continuously changing wavelength of incident light at room temperature and under normal air conditions were investigated. Fig. 3e shows the current curve under illumination with a wavelength varying from 100 to 800 nm continuously. During the process of measurement, the power density of the incident light remained almost the same. The current had its highest value in the range from 100 to 200 nm, then the current began to decrease slightly. Then when the wavelength changed from 250 to 360 nm, the current decreased steeply at first. At last in the range of 360 to 800 nm, the current decreased smoothly. The devices showed different photo-responsive characteristics under different illuminating wavelengths in the UV-Vis range.
Moreover, the photo-responsive characteristics of the devices were further investigated under three types of monochromatic illumination: green illumination (533 nm), blue illumination (405 nm) and ultraviolet illumination (255 nm). All the results of the PR measurements under the three different illuminations are shown in Fig. 4. Fig. 4a–c depict IV curves under green, blue and ultraviolet illumination. All the IV curves are almost linear, which demonstrates that the contact of the device is ohmic. The range of bias voltage is from 5 to −5 V. IV curves were measured after 1 minute of illumination. When the absolute value of the bias voltage increased, electrical current also increased.
At a bias voltage of 1 V, current–time (I–T) curves were measured when switching lights on and off repetitively. The illumination time period was 10 seconds. When the illumination was turned on, the electrical current increased rapidly, and then increased smoothly to reach saturation, and this state was defined as “ON”. After 10 seconds the illumination was turned off and immediately the electrical current reduced, finally recovering to the original state, which was defined as “OFF”. The shapes of the I–T curves under three different illuminating lights are different. The shape of the I–T curves under green illumination is similar to that under blue illumination, and is much different to that under ultraviolet illumination. The times to reach saturation after the illumination was turned on were 42 ms (533 nm), 42 ms (405 nm) and 2.01 s (255 nm). And the decaying times when the illumination was turned off were 40 ms (533 nm), 44 ms (405 nm) and 8.40 s (255 nm).
With repetitively switching the illumination on and off, the electrical current also was switched between “ON” and “OFF”, which demonstrated that the photo-responsive characteristic of the device is stable and reversible. The interval time between two adjacent “ON” states was 30 s, and the time period of the “ON” state was 10 s. To make observation more obvious, contour lines were added in Fig. 4g–i. With different wavelengths of incident light, the electrical current of the “ON” and “OFF” states showed different values. And the on/off ratio (Ion/Ioff)5,36,37 also showed a wavelength dependent phenomenon. All the experimental results are summarized in Table 1.
Wavelength (nm) | On/off ratio | Saturation/decaying time (ms) | Responsivity (A W−1) | EQE (%) |
---|---|---|---|---|
255 | 3.5 | 2010/8400 | 10.88 | 5290.6 |
405 | 102.6 | 42/44 | 1.568 | 480.1 |
533 | 12.5 | 42/40 | 0.305 | 71 |
The photo-responsivity Rλ and the external quantum efficiency (EQE) are both critical parameters for evaluating the sensitivity of photodetectors. The photo-responsivity Rλ is defined as the photocurrent generated per unit power of incident light on the effective area of a photodetector. The EQE is defined as the number of electrons detected per incident photon. The Rλ and EQE can be calculated using the following equations:38
Rλ = ΔIλ/(PλS) |
EQE = hcRλ/(eλ) |
To further understand the band–property relationship of the photo-responsive characteristics, first-principles calculations were performed using the Vienna ab initio simulation package (VASP)39,40 on the basis of density-functional theory (DFT).41,42 The band structure of bulk SnS2 is shown in Fig. 5b. The result reveals that bulk SnS2 is an indirect semiconductor, and the minimum indirect band gap is 2.27 eV. According to Planck’s formula E = hω = 2πhc/λ (h is Planck’s constant, c is the velocity of light and λ is the incident light wavelength), the energy of 533, 405 and 255 nm light is about 2.32, 3.06 and 4.86 eV, respectively. The three energies are in accord with the direct transmission at the Γ, M′ and Γ′ points in Fig. 5b. They are higher than the indirect band gap energy of bulk SnS2. When the illumination was turned on, electrons in the valence band absorbed the energy of photons and transmitted to the matching conduction band directly without the assistance of phonons as illustrated in Fig. 5a. Compared to green illumination, when blue illumination was turned on, electrons in the valence band would get more energy, and could transmit to a higher conduction band. When ultraviolet illumination was turned on, electrons absorbed photons with even higher energies, bringing photon-generated carriers with more energy, large enough to stimulate more additional carriers through impact ionization. However, the electrons excited by the ultraviolet photons interact with the crystal lattice strongly, and partial energy is emitted or absorbed in the form of phonons from the excited electrons, making them change position in the conduction band. As a result, the carrier mobility and recombination are hindered. Thus the saturation time and decaying time under ultraviolet illumination are longer than those under green and blue illumination.
The optical absorption coefficient of the vertical plane direction as a function of photon energy is illustrated in Fig. 5c and d. In the low energy range (below about 2.5 eV), the value of the absorption coefficient is very small, then it begins to increase suddenly until the energy reaches 4.5 eV, which means that the photons in the region of 2.5 to 4.7 eV can be effectively absorbed. After that the coefficient exhibits a monotonously rapid increase.
Footnotes |
† Electronic supplementary information (ESI) available: Experiment details; OM images of samples with different reaction times. See DOI: 10.1039/c5ra24905h |
‡ These authors contributed equally to this work. |
This journal is © The Royal Society of Chemistry 2016 |