Jianbo Wang, 
Jianghuai Hu, 
Ke Zeng* and 
Gang Yang*
State Key Laboratory of Polymer Materials Engineering, College of Polymer Science and Engineering, Sichuan University, Chengdu, P. R. China.. E-mail: yanggang65420@163.com
First published on 26th November 2015
The in situ reaction of a hydroxy group with a phthalonitrile system was carried out by the simple nucleophilic displacement of a nitro-substituent from 4-nitrophthalonitrile in a dipolar aprotic solvent, in a one-pot reaction. The hydroxy-containing phthalonitrile system (HPBD) was prepared by mixing 4-hydroxyphenoxy phthalonitrile (HPPH) and 1,3-bis(3,4-dicyanophenoxy)benzene (BDB), followed by heating. The curing behavior was studied using differential scanning calorimetry and dynamic rheological analysis, and the results indicated that the HPBD exhibits a large processing window (∼75 °C) and low complex viscosity (0.1–1 Pa s) at moderate temperatures. Fourier transform infrared spectroscopy (FT-IR) showed that polytriazine, polyindoline and phthalocyanine structures were formed during polymerization, and that the introduction of HPPH facilitated the curing reaction. Additionally, the prepared HPBD polymers showed outstanding thermal stability, a high modulus and a high glass transition temperature (Tg). After curing at 300 °C, the Tg of HPBD resin was raised to 410 °C. Postcuring effects on the thermal and dynamic mechanical properties were evaluated using thermogravimetric analysis (TGA) and dynamic mechanical analysis (DMA).
The polymerization of the neat resins is extremely sluggish and requires several days at elevated temperatures before a vitrified product is obtained.9 The polymerization reaction of phthalonitrile can be initiated with many different types of curing additives such as organic amines,9 strong organic acids,10 organic acid/amine salts,11 metallic salts,12 and metals.13 During the past few decades, systematic studies have been conducted at Naval Research Laboratory (NRL) on phthalonitrile resins in terms of curing behavior, processability and the effects of various linkages between the terminal phthalonitrile units on the properties of the cured resins.14–22 They mainly focused on commercially available aromatic diamine curing additives, such as 1,3-bis(3-aminophenoxy)benzene (m-APB). The formulation of the resins at the NRL is achieved typically by physically mixing a bisphthalonitrile monomer and a curing additive below the melting temperature (Tm) of the bisphthalonitrile monomer or adding the additive to the melting monomer under vigorous stirring.23 Until now, phthalonitrile polymers, with an excellent combination of properties and good processability, and phthalonitrile-based composites have been successfully developed by NRL.5,6,24 However the volatilization of the diamine23 slows down the curing especially at high temperatures. To overcome this problem, we need stable and less reactive curing reagents to get the anticipated product. Thus, finding curing agents that do not volatilize at elevated curing reaction temperatures and that were less reactive relative to m-APB is key to promoting the processability of phthalonitrile-based composites.23
On the other hand, there are still some problems using phthalonitrile materials. The high temperature of the melting transition is a common shortcoming in phthalonitrile monomers (usually >200 °C).14,16–18 For example, the melting point of the 4,4-bis(3,4-dicyanophenoxy)biphenyl phthalonitrile monomer is 230 °C,23 and the processing window (the gap between the melting point and the polymerization temperature) is only 20 °C when curing with amine catalyzers, which brings difficulties in the processing. More importantly, the processing mode of the phthalonitrile resins described previously is mainly based on bisphthalonitrile monomer/curing additive composition systems referred to as binary composition systems. In these systems, to ensure an uniform cure rate within the phthalonitrile resins, an even molecular dispersion of a trace percent of curing additive into the bisphthalonitrile monomers is required and can be achieved merely under extreme conditions (e.g. vigorous stirring).24 Therefore, the development of a self-catalyzed phthalonitrile monomer with a low melting temperature would be interesting in the view of both scientific and industrial applications.
In our laboratory, previous investigations have demonstrated that amino or hydroxy-containing phthalonitrile derivatives (APN or HPN) showed self-promoted curing behavior even in the absence of curing additives which are required for conventional binary composition systems.25,26 Therefore, the curing of phthalonitrile derivatives containing amino or hydroxy groups offers a new route to the fabrication of phthalonitrile-based polymers or resins possessing excellent mechanical and thermal properties. Liu et al.27 synthesized phthalonitrile oligomers containing biphenyl ether nitrile cured with 4-aminophenoxy phthalonitrile. Zhou et al.28,29 prepared amino-containing (in the ortho, meta, and para positions) self-catalyzed phthalonitrile resins.
In this paper, self-promoted hydroxy-containing phthalonitrile systems were prepared using an in situ reaction. And a hydroxy group was introduced into the self-promoted phthalonitrile-based system by this method. Therefore, the blending problem of phthalonitrile monomers/curing additives under extreme conditions (e.g. vigorous stirring) was solved. Meanwhile, the phthalonitrile system, which was a blend of 1,3-bis(3,4-dicyanophenoxy)benzene (BDB) and self-promoted phthalonitrile, 4-hydroxyphenoxy phthalonitrile (HPPH), exhibited good processability, and thermal and dynamic mechanical properties. In addition, the polymerization mechanism and postcuring effects were also investigated.
| 4-Nitrophthalonitrile | Resorcinol | DMSO | K2CO3 | Yield | |
|---|---|---|---|---|---|
| HPBD-18 | 58.87 g | 22.02 g | 330 mL | 83.00 g | 87.54% | 
| HPBD-28 | 51.95 g | 22.02 g | 300 mL | 83.00 g | 87.64% | 
HPBD-24 was obtained through blending HPBD-18 and HPBD-28 with equal weight ratios.
|  | (I) | 
The content of HPPH was calculated according to formula (I) (Se and Sk represent the integral areas e and k in the 1HNMR spectrum, respectively). The detailed data are listed in Table 2.
| Se | Sk/2 | HPPH content (mol%) | |
|---|---|---|---|
| HPBD-18 | 0.11 | 0.5 | 18 | 
| HPBD-24 | 0.16 | 0.5 | 24 | 
| HPBD-28 | 0.20 | 0.5 | 28 | 
The rheological behavior plays an important part in determining the processability of materials.31 Therefore, the variation in the complex viscosity of the HPBD was determined as a function of temperature from 175 °C to 325 °C. The results, presented in Fig. 3, revealed that the complex viscosity of the blends was affected by the HPPH content. HPBD-28, HPBD-24 and HPBD-18 exhibit an abrupt complex viscosity increase at 240 °C, 260 °C, and 280 °C, respectively. The data showed that the higher the HPPH content, the faster the viscosity increase. This result was expected since the blends richer in HPPH have a greater tendency to react or cure at a faster rate. A minimum melt viscosity of around 0.1 Pa s was observed for all the blends at temperatures above 175 °C. The low melt viscosity of the blends at higher temperatures is evidence of their good melt stability. Based on the above results, the HPBD displays good processability with low complex viscosity at moderate temperatures.
We further investigated the curing behavior through the analysis of the FTIR spectra of the HPBD resins. Fig. 4a shows the FTIR spectra of the HPBD-18 resin obtained after being heated at 200 °C for 5 h. It was obvious that the characteristic absorption band at 2229 cm−1 (Fig. 4a) was evidently weakened. Meanwhile, in Fig. 4b, the peaks at around 1009 cm−1 and 1521 cm−1 belong to the characteristic absorptions of the NH stretching and bending vibration in the phthalocyanine ring32 and the stretching vibration in the triazine ring,33 respectively. Moreover, the peak at around 1720 cm−1 was attributed to the characteristic absorption of the isoindole ring.34 Additionally, there was still a weak absorption peak attributed to the –CN groups (Fig. 4b) at around 2229 cm−1, and it became weaker gradually with an increase in the HPPH content. Thus, it can be concluded that the curing reaction happened between BDB and HPPH. However, the nitrile groups did not participate in the curing reaction completely, which can be ascribed to the formation of a triazine ring and phthalocyanine during polymerization. Only half of the nitrile groups contributed to the triazine ring structure formation because of the high steric hindrance. Based on these results, it could be concluded that HPPH could facilitate the polymerization of phthalonitrile systems and the possible polymerization mechanism of HPBD is shown in Scheme 2.
|  | ||
| Fig. 5 TGA curves of HPBD resins cured with different ratios of HPPH: under nitrogen (a) and under air (b). | ||
| HPBD | Td5% (°C) | Td10% (°C) | Char yield (%) at 800 °C | |
|---|---|---|---|---|
| In N2 | HPBD-18 | 493.0 | 530.0 | 74.54 | 
| HPBD-24 | 477.0 | 525.0 | 72.17 | |
| HPBD-28 | 475.0 | 524.5 | 72.00 | |
| In air | HPBD-18 | 489.0 | 533.0 | — | 
| HPBD-24 | 485.5 | 535.0 | — | |
| HPBD-28 | 481.5 | 527.0 | — | 
![[thin space (1/6-em)]](https://www.rsc.org/images/entities/char_2009.gif) δ) are presented in Fig. 6a and (b), respectively. After curing to a maximum temperature of 300 °C, as seen from Fig. 6a, all the HPBD polymers exhibited a high storage modulus at 50 °C, which decreased gradually along with increasing temperature. The high modulus should be ascribed to the aromatic and crosslinked microstructure. The decrease of the modulus with increasing temperature was due to the stress relaxation of the polymer network. Moreover, it could be shown that the storage modulus of the HPBD-24 resin was up to 3.1 GPa at 50 °C, which is superior to the modulus of 5 wt% ODA cured BDB resin (2.9 GPa)36 and amino-containing self-catalyzed phthalonitrile resins (4-aminophenoxy-phthalonitrile, ∼1.7 GPa).37
δ) are presented in Fig. 6a and (b), respectively. After curing to a maximum temperature of 300 °C, as seen from Fig. 6a, all the HPBD polymers exhibited a high storage modulus at 50 °C, which decreased gradually along with increasing temperature. The high modulus should be ascribed to the aromatic and crosslinked microstructure. The decrease of the modulus with increasing temperature was due to the stress relaxation of the polymer network. Moreover, it could be shown that the storage modulus of the HPBD-24 resin was up to 3.1 GPa at 50 °C, which is superior to the modulus of 5 wt% ODA cured BDB resin (2.9 GPa)36 and amino-containing self-catalyzed phthalonitrile resins (4-aminophenoxy-phthalonitrile, ∼1.7 GPa).37
|  | ||
| Fig. 6  Dynamic mechanical properties of HPBD resins, (a) storage modulus versus temperature and (b) tan ![[thin space (1/6-em)]](https://www.rsc.org/images/entities/char_2009.gif) δ versus temperature. | ||
The maximum of the tan![[thin space (1/6-em)]](https://www.rsc.org/images/entities/char_2009.gif) δ curve represents Tg which is a particularly important parameter for polymer materials, because it generally determines the upper limit of the application temperature. The tan
δ curve represents Tg which is a particularly important parameter for polymer materials, because it generally determines the upper limit of the application temperature. The tan![[thin space (1/6-em)]](https://www.rsc.org/images/entities/char_2009.gif) δ versus temperature plots for the HPPH cured resins are presented in Fig. 6b. As seen, Tg increased gradually as the HPPH content increased from 18 mol% to 28 mol%. It could be seen that the Tg of the HPBD-28 resin was up to 410 °C which was superior to the Tg of 5 wt% ODA cured BDB resin (320 °C) and 5 wt% and 10 wt% APPH cured BDB resins (320 °C and 347 °C, respectively).35 For the state-of-the-art high temperature resin, PMR-15, the maximum postcure temperature is 316 °C, and the corresponding Tg is 340 °C. Clearly, the low softening point of the PMR-15 resin would restrict its usage in structural applications that require stability at temperatures in excess of 340 °C. It has been reported that the shift in the maxima of the moduli as well as the tan
δ versus temperature plots for the HPPH cured resins are presented in Fig. 6b. As seen, Tg increased gradually as the HPPH content increased from 18 mol% to 28 mol%. It could be seen that the Tg of the HPBD-28 resin was up to 410 °C which was superior to the Tg of 5 wt% ODA cured BDB resin (320 °C) and 5 wt% and 10 wt% APPH cured BDB resins (320 °C and 347 °C, respectively).35 For the state-of-the-art high temperature resin, PMR-15, the maximum postcure temperature is 316 °C, and the corresponding Tg is 340 °C. Clearly, the low softening point of the PMR-15 resin would restrict its usage in structural applications that require stability at temperatures in excess of 340 °C. It has been reported that the shift in the maxima of the moduli as well as the tan![[thin space (1/6-em)]](https://www.rsc.org/images/entities/char_2009.gif) δ to higher temperatures can also be explained by a higher degree of crosslinking of polymers.38,39 The greater Tg of the HPBD polymers should be also attributed to the more crosslinked structure when BDB is cured with HPPH, and a higher HPPH content leads to a higher Tg.
δ to higher temperatures can also be explained by a higher degree of crosslinking of polymers.38,39 The greater Tg of the HPBD polymers should be also attributed to the more crosslinked structure when BDB is cured with HPPH, and a higher HPPH content leads to a higher Tg.
|  | ||
| Fig. 7 TGA thermograms of HPBD polymers after postcuring at 375 °C: under nitrogen (a) and under air (b). | ||
| HPBD | Td5% (°C) | Td10% (°C) | Char yield (%) at 800 °C | |
|---|---|---|---|---|
| In N2 | HPBD-18 | 514.5 | 549 | 74.59 | 
| HPBD-24 | 504.5 | 538 | 74.65 | |
| HPBD-28 | 503 | 538.5 | 75.06 | |
| In air | HPBD-18 | 505.0 | 536.0 | — | 
| HPBD-24 | 508.5 | 542.0 | — | |
| HPBD-28 | 501.5 | 536.0 | — | 
Dynamic mechanical analysis (DMA) was performed to explore the postcuring effects on the mechanical properties. Fig. 8 shows the DMA curves of the postcured HPBD resins. After curing to a maximum temperature of 375 °C, it can be found that the storage moduli of the HPBD resins with varying HPPH content were 2.7 GPa, 3.4 GPa, and 3.5 GPa at 50 °C, and they decreased with the increase in temperature gradually due to the stress relaxation of the polymer network. However, the moduli of the resins still remained at 1.3 GPa, 1.2 GPa and 1.6 GPa at 450 °C. Moreover, the viscoelastic transition characteristic Tg was not observed in the tan![[thin space (1/6-em)]](https://www.rsc.org/images/entities/char_2009.gif) δ plot of the HPBD resins, indicating that a stable crosslinked polymer network had been formed through the curing process and that the polymer remained in the glassy state up to at least 450 °C. These data also showed that a higher cure temperature was needed to complete the curing of the phthalonitrile resins.
δ plot of the HPBD resins, indicating that a stable crosslinked polymer network had been formed through the curing process and that the polymer remained in the glassy state up to at least 450 °C. These data also showed that a higher cure temperature was needed to complete the curing of the phthalonitrile resins.
We further investigated the postcuring effect through the analysis of the DMA curves of the HPDB-24 resin at different postcured temperatures (Fig. 9a and b). As the curing temperature increased, the storage modulus of the HPBD-24 resin elevated steadily. After curing at a maximum temperature of 375 °C, the HPBD-24 resin exhibited a Tg in excess of 450 °C and maintained 35% of its initial modulus up to 450 °C. Thus, the results revealed that postcuring at elevated temperatures is favorable for improving the cross-linking degree and thermal stability of phthalonitrile resins.20,21,23
|  | ||
| Fig. 9  DMA plots for HPBD-24 samples postcured at elevated temperatures (a) modulus versus temperature and (b) tan ![[thin space (1/6-em)]](https://www.rsc.org/images/entities/char_2009.gif) δ versus temperature. | ||
To sum up, the phthalonitrile resins show higher thermal and mechanical properties after postcuring, as proved by TGA and DMA, and the results also demonstrate that a higher curing temperature is necessary to improve the curing degree of phthalonitrile resin.
In addition, SEM was used to evaluate the microstructure of the cured resin. The morphology of a HPBD-28 polymer section under different magnifications is shown in Fig. 10. No voids can be observed in the HPBD-28 polymer under a magnification of 2000 times (Fig. 10c) which proves the void-free structure of the HPBD-28 polymer and also guarantees the excellent thermal and mechanical properties. Moreover, the addition polymerization mechanism of the monomer is one of the most important factors in preparing void-free components.
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