Photoelectrochemically deposited Sb2Se3 thin films: deposition mechanism and characterization

Jia Yang, Yanqing Lai*, Yanyun Fan, Yan Jiang, Ding Tang, Liangxing Jiang, Fangyang Liu* and Jie Li
School of Metallurgy and Environment, Central South University, Changsha 410083, China. E-mail: laiyanqingcsu@163.com; liufangyang@csu.edu.cn; Fax: +86 0731 88710171; Tel: +86 731 88830649

Received 10th August 2015 , Accepted 14th September 2015

First published on 14th September 2015


Abstract

Sb2Se3 thin films were photoelectrochemically deposited (PED) and displayed a compelling photoelectrochemical (PEC) performance. The main influence of the illumination mechanism on Sb2Se3 deposition is that the photoconductive effect accelerates the deposition rate and the photogenerated electrons (in the conduction band of the deposited Sb2Se3 thin film) promote the electroreduction of SbO+. Electrochemical impedance spectroscopy (EIS) and potentiostatic polarization show evidence that illumination can promote the rate of cathodic reduction. Linear sweep photovoltammetry (LSPV) and X-ray fluorescence spectrometry (XRF) indicate that illumination facilitates the reduction of SbO+. The PED process can improve the homogeneity and compactness of the films, facilitate the growth of stoichiometric Sb2Se3 and further enhance the photocurrent response of films, compared to the conventional electrochemical deposition (CED) process.


Sb2Se3 is widely considered as a new non-toxic and earth-abundant light absorber with an excellent light absorption coefficient (>105 cm−1 at short wavelengths) and suitable band gap (approximately 1.1–1.3 eV).1,2 It is beneficial for the low-cost and large-scale production of thin film solar cells. In addition, sensitized cells,3,4 solid-state cells5 and photoelectrochemical cells6 based on Sb2Se3 (or Sb2S3) thin films have been fabricated and displayed a good performance, which draws worldwide attention to the photoresponse property of Sb2Se3.

Several methods have been employed to fabricate Sb2Se3 thin films such as vacuum thermal evaporation,5 chemical bath deposition,7 successive ionic layer adsorption and reaction methods,8 spray pyrolysis,9 pulsed laser deposition10 and electrochemical deposition.3,11–13 Among these methods, electrochemical deposition (or electrodeposition) is reported to be a very simple14 and versatile3 process for semiconductor film fabrication due to economic and convenient considerations. However, because there are different deposition potentials for various ions, it is difficult to control composition15 for compound semiconductor electrodeposition. Low conductive semiconductors grown on cathodes also lead to some problems16 such as low growth rate and increased ohmic potential drop at the electrode during deposition.

Photoelectrochemical deposition (PED) is developing as a general preparative strategy, which opens up new avenues for the synthesis of compound semiconductors. Due to the photosensitivity of deposited semiconductor films,15,17–20 illumination has a great influence on the enhancement of deposition current and the inhibition of ohmic potential drop at the electrode. Therefore, the PED process has attracted researchers' attention and has been explored by many groups.16,19,21–26 Moreover, we conducted a research16 that demonstrates the PED process benefits high quality and well performing CuInSe2 semiconductor thin film fabrication. This study is mainly focused on revealing the deposition mechanism and characterizing the effects of illumination on electrodeposited Sb2Se3 thin films.

According to the transmittance of the electrolyte solution (ESI, Fig. S1), light in the wavelength range of 900–2000 nm with a low transmittance value is absorbed by electrolyte solutions for calefaction (photothermal effect),27 but light in the wavelength range of 300–900 nm with a very high transmittance value can be absorbed by as-deposited films for exciting electrons and holes16,19 (photoelectric effect). For xenon lamp spectra, light in the wavelength range of 300–900 nm covers almost the total emitted light energy.28 Consequently, the influence of illumination on electrochemical behavior is dominated by the photoelectric effect rather than the photothermal effect.

The potential–energy diagram drawn in Fig. 1 illustrates the photoelectric effects of illumination on Sb2Se3 electrodeposition mechanisms. The relative position of the conduction and valence band edges in the Sb2Se3 layer is adopted from the literature.29 The beginning reduction potential of H2SeO3 and SbO+ are about 0.05 V and −0.43 V, respectively, and thereby the deposition of Sb is more difficult14 than that of Se. Once Sb2Se3 is potentiostatic cathodic deposited (e.g. at −0.55 V) on the surface of the cathode, the Fermi level of Sb2Se3 move along the positive direction to a location equal to this cathodic potential. Thus, band alignment in deposited Sb2Se3 favors electron flow from the conduction band to the electrolyte and hole injection into the valence band from the electrolyte. The driving force for the electroreduction of SbO+ and H2SeO3 is due to the difference between the Fermi level of deposited Sb2Se3 and the relevant redox potential in the electrolyte.


image file: c5ra16055c-f1.tif
Fig. 1 Illumination influence on the potential–energy diagram during Sb2Se3 electrodeposition.

In the conventional electrochemical deposition (CED) process, majority carriers (holes) and very few minority carriers (electrons at the conduction band) exist in p-type Sb2Se3, which means that only holes act as charge carriers and electroreduction is inhibited by deposited Sb2Se3. The only reduction route is that positive charges inject into the Sb2Se3 film from H2SeO3 and SbO+. Moreover, the energy level difference between the surface valance band and redox is the energy barrier for the electroreduction of H2SeO3 and SbO+. It can be noted that the reduction of SbO+ is much more difficult than that of H2SeO3, because the SbO+/Sb redox has a higher energy barrier and lower driving force relative to the H2SeO3/Se redox.

In the PED process, both the majority carriers (holes and photogenerated holes) and minority carriers (photogenerated electrons) act as charge carriers, and the photogenerated holes and photogenerated electrons improve the conductivity20 (photoconductive effect) of the cathode and inhibit the actual potential drop (for potentiostatic electrodeposition) of the film/electrolyte interface. Therefore, compared to the CED process, the electroreduction of species in the electrolyte is enhanced and the Sb2Se3 growth rate is promoted accordingly. Furthermore, SbO+ can receive photogenerated electrons from the conduction band directly, which is driven by the bending band without any energy barrier, and be easily reduced to Sb. The newly formed Sb may further react with electroreduced Se, according to eqn (1), due to the large Gibbs energy release (−135 kJ mol−1),30 which further accelerates the deposition rate.

 
2Sb + 3Se = Sb2Se3 (1)

Consequently, from the potential–energy diagram, we may draw the conclusion that there are two effects of illumination on the electrodeposition of Sb2Se3: the first is accelerating the deposition rate; the second is promoting the electroreduction of SbO+ by changing the electroreduction route.

To understand the underlying mechanism, Fig. 2 shows the Nyquist plots of the CED process (a) and PED process (b) after different potentiostatic polarization times (at −0.55 V). The main EIS difference between the CED process and PED process is that there exists obvious low-frequency Warburg diffusion resistance in the Nyquist plot of the latter. The difference in EIS indicates that the CED process is electroreduction controlled, whereas the PED process is simultaneously controlled by electroreduction and diffusion.31–33 Combined with the smaller diameter of the high-frequency semicircle, these phenomena give the conclusion that the electroreduction rate in the PED process is faster than that in the CED process. An equivalent circuit (Fig. 2(c)) was also designed to simulate the deposition33 occurring at the cathode/electrolyte interface. Rct is charge transfer resistance of the cathode/electrolyte interface, C is the capacitance of the electrical double layer at the electrode, Rs is the ohmic resistance of the electrolyte and Ws is the Warburg diffusion resistance.


image file: c5ra16055c-f2.tif
Fig. 2 Nyquist plots of (a) CED process and (b) PED process after different potentiostatic polarization time; (c) equivalent circuit designed to simulate the deposition; (d) linear sweep photovoltammogram on an SnO2 substrate under chopped illumination at a scan rate of 2 mV s−1 (black solid line is measured value; blue/red dashed line is fitted value under dark/illumination, respectively).

The values of Rct, C, Rs and Ws for both systems are illustrated in Table 1.

Table 1 Parameters used for fitting the EIS data in Fig. 2(a) and (b)
  CED PED
4 min 8 min 12 min 4 min 8 min 12 min
Rct 145.2 221.3 531.3 117.7 158.4 171.7
C 1.1 × 10−4 1.0 × 10−4 1.4 × 10−4 7.4 × 10−5 7.8 × 10−5 6.6 × 10−5
Rs 59.2 58.6 55.4 57.5 67.7 84.1
Ws 113.4 102.3 129.3 665.2 270.6 197.3


For the CED process, with the increase of polarization time, Rs and Ws remained relatively steady (below 60 Ω and about 110 Ω, respectively), which can be interpreted by the relatively steady electrolyte status. However, the diameters of the capacitive semicircles obviously increase and Rct increased accordingly (145.2 Ω for 4 min, 221.3 Ω for 8 min and 531.3 Ω for 12 min) due to the decrease in conductivity of the cathode (low electrical conductive Sb2Se3[thin space (1/6-em)]34 covering about 10−6 to 10−2 Ω−1 m−1).

For the PED process, photogenerated carriers promote the cathodic reduction, which further results in a lower Rct32 (117.7 Ω for 4 min, 158.4 Ω for 8 min and 171.7 Ω for 12 min) than that for the CED process. C for PED (70 μF cm−2) is lower than that for CED (100 μF cm−2) probably due to the smoother surface (ESI, Fig. S3) of the PED thin film. However, with the increase of polarization time, the slight increase of Rct (from 117.7 Ω to 171.7 Ω) still relates to the deposited film with low electrical conductivity (even under illumination). Rs increase35 (from 57.5 Ω to 84.1 Ω) can be attributed to ion consumption in the electrolyte and Ws decrease (from 665.2 Ω to 197.3 Ω) mainly results from the low concentration gradient.

Fig. 2(d) shows the linear sweep photovoltammogram under chopped illumination from 0.40 V to −0.80 V (negative scanning) with an interval of 5 s. The curve displays an initial reduction peak at about −0.09 V, which can be assigned to the four-electron predeposition of selenium.14,24 The reduction peak at around −0.65 V (blue dash line, off) mainly corresponds to the reduction of SbO+ and the subsequent formation of Sb2Se3,14,24 which positively shifts to −0.48 V under illumination (red dash line, on). The 0.17 V positive shift of the reductive peak indicates that the illumination facilitates the reduction of SbO+ (also shown in Fig. 1). In addition, a higher current density is obtained, which indicates that the reduction of SbO+ and the according formation of Sb2Se3 can be significantly promoted under illumination.

The largest photocurrent response is observed at the potential between −0.45 V and −0.55 V, which reveals that the significant influence of illumination on Sb2Se3 film deposition can be observed at this potential region. Hence, Sb2Se3 was deposited at −0.45 V and −0.55 V for further research.

The composition analysis by XRF shows that the Sb content is higher in PED Sb2Se3 films (41.09 at%, deposited at −0.45 V and 44.10 at%, deposited at −0.55 V) than that in CED Sb2Se3 films (4.87 at%, deposited at −0.45 V and 22.04 at%, deposited at −0.55 V). This finding furnishes additional evidence in support of the illumination promoting the electroreduction of SbO+ with a more negative reduction potential compared to H2SeO3. Moreover, films with a similar stoichiometry of Sb[thin space (1/6-em)]:[thin space (1/6-em)]Se = 2[thin space (1/6-em)]:[thin space (1/6-em)]3 can be easily obtained by the PED process.

The enhanced deposition rate of Sb2Se3 can be also verified by the higher deposition current (ESI, Fig. S2) and the thicker film obtained under illumination. The thicknesses of the films are 0.05 μm/0.60 μm deposited at −0.45 V and 0.1 μm/0.70 μm deposited at −0.55 V for CED/PED, respectively. From the SEM micrographs (ESI, shown in Fig. S3), it can be observed that the PED Sb2Se3 films have a more homogeneous and smooth morphology. According to the analysis of the visual images (ESI, shown in Fig. S3 insert), −0.55 V is beneficial to the film deposition because the films electrodeposited at −0.45 V are much more transparent than the films electrodeposited at −0.55 V.

Fig. 3(a) shows the Raman spectra of the Sb2Se3 films deposited by PED and CED at −0.55 V. The characteristic peaks from Sb2Se3 can be observed at36–41 83 cm−1, 118 cm−1, 189 cm−1, 253 cm−1, 372 cm−1 and 450 cm−1. All the peaks of the PED film exhibit a narrower peak width (more acute shape) and greater peak intensity than those of the CED film, which generally indicates the enhancement of crystallinity.41,42 The main peaks at about 189 cm−1 and 253 cm−1 correspond to the vibrations36,41 related to Sb bonds. Therefore, the obvious enhancement of main peak intensity should be related to the increase of Sb content (from 22.1 at% to 44.1 at%).


image file: c5ra16055c-f3.tif
Fig. 3 (a) Raman patterns of Sb2Se3 thin films prepared by PED and CED at −0.55 V; (b) X-ray diffraction patterns of CED and PED Sb2Se3 samples after RTA; (c) the optical characteristics of as-deposited Sb2Se3 films prepared by PED and CED and inset shows the estimated optical band gap; (d) photocurrent–potential response curve of the Sb2Se3 films prepared by PED (red line) and CED (black line) in 0.5 M H2SO4.

The XRD patterns of the CED and PED Sb2Se3 thin films (on SnO2/glass) after RTA (rapid thermal annealing treatment) are shown in Fig. 3(b). It can be seen that polycrystalline films of antimonselite phase4 (Sb2Se3 (JCPDS no. 65-2433)) are achieved for both the CED and PED thin films. The intensity of the SnO2 (JCPDS no. 77-0452) diffraction peaks for the PED thin film is weaker than that for the CED thin film, due to the difference thicknesses of the two types of films. It can also be noticed that the Sb2Se3 diffraction intensity of the PED thin film is stronger than that of the CED thin film, which indicates an improvement in crystalline quality by photoelectrochemical deposition. Similar phenomena have also been reported.43 The improvement in crystalline quality can partly be related to the difference of antimony content in these two types of films.44

The absorption coefficient, α, and optical band gap (in insert, estimated from the interception of the linear fitting) of the CED and PED Sb2Se3 films are both shown in Fig. 3(c). Because the component of the CED Sb2Se3 film deviates from stoichiometry, this film shows a low absorption coefficient, α, (about 8 × 104 cm−1 in visible light) and narrow band gap value (0.93 eV). The PED Sb2Se3 film shows excellent optical property (absorption coefficient α = 1.4 × 105 cm−1 in visible light, band gap value Eg = 1.37 eV), which is close to the value of single crystal Sb2Se3.45,46 This excellent optical property can meet the needs for thin film solar cell materials.47

The obvious difference in the PEC performance of the PED and that of the CED Sb2Se3 films is shown in Fig. 3(d). Both films are identified as p-type semiconductors due to their photocurrent density increase with a negative shift of the cathodic potential. At negative bias, the dark current (off) of the PED film is lower than that of the CED film, which implies that the PED film shows better rectification.48 Since the rectification behaviour is considered to be limited by the deficiency, we may conclude that the deficiency (exposed substrate, impurities (undetected excess Se phase), cracks or boundary between the granules) in the PED film is much less than that in the CED film. This conclusion is in accordance with the compact morphology and near stoichiometry of the PED sample.

To confirm the conductivity of the deposited Sb2Se3 thin films again, photovoltage measurement49,50 was employed by determining the difference between the illuminated and dark voltages of the Sb2Se3 electrode with respect to the counter electrode. The p- and n-type silicon wafers were used for comparison and calibration of the system. It is shown from Table 2 that the positive photovoltage demonstrates the p-type bulk conductivity of the deposited Sb2Se3 thin films. In agreement with the difference in photocurrent, the PED Sb2Se3 thin film has a higher photovoltage than that of CED Sb2Se3 thin film.

Table 2 Photovoltage produced at the Sb2Se3 electrode/electrolyte junction during light illumination
Sample Measurement Analysis
Vdark/mV Vlight/mV Vphoto/mV Conductivity
p-Si −615 −573 42 p-type
n-Si −330 −507 −177 n-type
PED −352 −265 87 p-type
CED −371 −359 12 p-type


Based on the abovementioned analysis, the PED and CED Sb2Se3 films are both identified as p-type semiconductors. Its stronger and more sensitive photoresponse suggests that the PED Sb2Se3 film has better photon-to-electron conversion ability.

Conclusions

This study demonstrates the beneficial effects of illumination on Sb2Se3 electrodeposition. The influence mechanism has been illustrated by a schematic, which is supported by many experiments: the electroreduction of SbO+ with a more negative reduction potential is promoted and the deposition rate of Sb2Se3 is further increased. Moreover, PED improves the content of antimony, homogeneity, compactness in morphology and Sb2Se3 crystallinity. As a result, Sb2Se3 films with excellent optical properties and photon-to-electron conversion ability can be obtained by PED. Accordingly, PED is indeed a very competitive strategy and PED Sb2Se3 films should be suitable for high efficiency solar cells application.

Experimental section

Deposition and analysis

Electrochemical experiments were carried out in a stagnant three-electrode Pyrex electrolytic cell configuration at 25 °C with a SnO2-coated glass substrate (SnO2/glass, 20 Ω sq−1) as the working electrode, a Pt gauze as the counter electrode, and a saturated calomel electrode (SCE) as the reference electrode. All potentials are reported with respect to this reference electrode. SnO2/glass substrates were ultrasonically cleaned in acetone, ammonia and alcohol, then rinsed with deionized water (18.2 MΩ cm−1), and subsequently dried in a nitrogen flow. Linear sweep photovoltammetry (LSPV), PED and CED were performed using a Princeton Applied Research PARSTAT 4000 Potentiostat, and electrochemical impedance spectroscopy (EIS) was performed using a Princeton Applied Research PARSTAT 4000 EIS analyzer. An electrolyte solution containing 5.5 mM K(SbO)C4H4O6·0.5H2O (antimony potassium tartrate), 4.5 mM H2SeO3, and 100 mM NH4Cl was used for LSPV, PED, CED and EIS. The pH of the electrolyte solution was adjusted to 2.3 using concentrated hydrochloric acid. Linear sweep photovoltammograms were measured at a scan rate of 2 mV s−1 under chopped illumination. Sb2Se3 films were prepared by PED and CED and all the films were deposited for 30 min potentiostatically. EIS measurements were carried out under the amplitude of 10 mV at −0.55 V with a frequency range of 100 kHz to 0.1 Hz. When it was necessary, a Newport 300 W xenon lamp was used as the light source and the light intensity was at 100 mW cm−2.

Characterization

The chemical composition, morphology and phase of the films were characterized using energy dispersive X-ray fluorescence spectrometry (XRF, Shimadzu, LAB CENTER XRF-1800, operated at 40 kV, 95 mA), environmental scanning electron microscopy (ESEM, FEI Quanta-200, at a 20 keV accelerating voltage) and Raman spectrometry (Jobin-Yvon LabRAM HR-800, Horiba), respectively. The thickness of the films was measured using a Veeco Dektak 150 surface profiler. The crystalline properties of the prepared films after RTA (rapid thermal annealing treatment in a flowing Ar atmosphere (20.00 sccm) at 300 °C for 3 min) were characterized using an X-ray diffractometer (XRD, Rigaku3014). The optical properties of the films and electrolytes were measured using a UV-VIS-NIR spectrophotometer (UV-VIS-NIR, Varian Cary-5000) in the wavelength range of 300 nm–2000 nm at room temperature.

The photoelectrochemical (PEC) property measurement was performed in a three-electrode configuration containing 0.5 M H2SO4 solution (also at a scan rate of 2 mV s−1, under chopped illumination) to determine photon-to-electron conversion ability, using a Princeton Applied Research PARSTAT 4000 Potentiostat. The three-electrode configuration consisted of Sb2Se3 deposited on SnO2/glass, a Pt gauze and a saturated calomel electrode (SCE), which acted as the working electrode, counter electrode and reference electrode, respectively. Photovoltage measurements were performed in the two-electrode configuration, which only consisted of a working electrode (Sb2Se3 deposited on SnO2/glass) and a counter electrode (a Pt gauze).

Acknowledgements

This study was supported by the National Natural Science Foundation of China (Grant No. 51222403 and 51272292) and the Hunan Provincial Natural Science Foundation of China (13JJ1003).

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Footnote

Electronic supplementary information (ESI) available: The transmittance of electrolytes, potentiostatic polarization curves for deposition process, SEM and visual photographs for deposited films. See DOI: 10.1039/c5ra16055c

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