Hui Wanga,
Jing-Yao Liub,
Zhifang Chaiac and
Dongqi Wang*a
aCAS Key Laboratory of Nuclear Radiation and Nuclear Energy Techniques and Multidisciplinary Initiative Center, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China. E-mail: dwang@ihep.ac.cn
bInstitute of Theoretical Chemistry, State Key Laboratory of Theoretical and Computational Chemistry, Jilin University, Changchun 130023, China
cSchool of Radiation Medicine and Interdisciplinary Sciences (RAD-X), Soochow University, Suzhou 215123, China
First published on 10th December 2014
The activation of CO, hydrogenation of CHx (x = 0–4) and C2Hy (y = 0–5) species and carbon chain propagation on V(100) were studied by means of periodic density functional theory (DFT) calculations. The results indicate that the activation of CO is very facile on V(100) via direct dissociation rather than H-assisted pathways. The hydrogenation of CHx/C2Hy (except for CC) and the C–C coupling elementary steps are thermodynamically and kinetically unfavorable. The energy barriers to the former reactions are lower than those to the latter ones. The high coverage of reactants and the entropic effect may be the dominant factors responsible for the hydrogenation and carbon chain propagation. The simple microkinetic model built on the basis of the above results shows that CH2 is the dominant CHx species on the surface in the temperature range of 300–800 K. Starting from a high coverage of CH2, the building block of the C-chain, CH2CH2 forms via a coupling reaction and then desorbs from the surface. CH2CH, appearing as the precursor, mainly forms from the coupling of CH2 + CH followed by CH2 insertion leading to CH2CHCH3. Although CH is more likely responsible for the chain propagation than CH2 in view of energy barriers, its contribution suffers from its low coverage at the considered conditions. These results are in good agreement with the experimental results.
Extensive experimental studies have been carried out on a variety of transition metal surfaces, and the carbene mechanism of Fischer and Tropsch,2,3 which proposes that the alkyl chain growth proceeds via CH2 insertion following the dissociation of CO, is widely accepted.4–11 Generally, the activation of CO is more facile on the early transition metals than on the late ones, while the case of the carbon coupling is opposite.12 However, the mechanism remains to be investigated and many issues are under debate, such as the activation of CO via the direct dissociation or H-assisted pathways, the chemical identity and the stability of the participating species, and the chain growth pathways.9,11,13–15 Though knowledge on the relative stabilities of various intermediates involved in the early steps of F–T process and the relevant potential energy surface is crucial to fully understand the F–T mechanism, it is difficult to obtain experimentally.
The development of advanced computational models and the growing computational power in recent years makes it feasible to study the mechanism of heterogeneous catalytic reactions by using the first-principles methods16 and many theoretical works related to F–T process were carried out on a wide range of commonly used catalysts such as Fe,17–24 Co,12,19,24–28 Ni13,29 and Ru,12,20,24,30–32 as well as other potential metallic catalysts, e.g. Rh,20,24,32–35 Pt,36,37 Pd.33,38 These studies show that the reaction mechanism displays strong dependence on the nature of metal surfaces. For CO activation, the H-assisted mechanism is proved more favorable than the direct dissociation on Fe and Co.22,27 For the path C → CH → CH2 → CH3 → CH4, the largest activation energy corresponds to hydrogenation reaction of CH2 on Fe(100),17 while the last step was considered as rate-determining at defects on studied Rh, Co, Ru, Fe and Re surfaces and an increase in the binding strength of C + 4H to the surface may suppress the production of methane.24 The RC + C (R = alkyl or H) and CH + CH pathways occurring on Ru and Rh surfaces was suggested to be responsible for F–T chain propagation, while on the Fe surface, the pathway of C + CH2/CH3 may dominate, and on the Re surface C + CH does the job. When Co catalysts were employed, CH2 + CH2 and CH3 + C appear more important, and the coupling reactions of RC + C and RC + CH also contribute to the chain growth on Co after CHx coupling in addition to the pathways of RCH + CH2 and RCH2 + C.16,20,24,32
A recent work by Shen and Zaera39 studied the hydrocarbon chain growth on V(100) starting from CH2I2 and provided experimental evidence to identify CH2CH as a plausible chain-propagation intermediate which may work as a precursor to produce CH2CHCH3 by coupling with CH2. However, the information obtained from experimental work is limited and many fundamental issues concerning the mechanism and the selectivity remain to be solved. As far as we known, there is no theoretical study of the F–T process on V(100) until now. Herein, DFT and microkinetic modeling methodologies were employed to investigate the reaction mechanism of the F–T process on V(100), which covers the activation of CO, the adsorption stability of intermediate species and the possible pathways for chain growth from CHx to C2Hy and C3Hz.
The climbing-image nudged elastic band (CI-NEB) method46,47 was used to search the transition states (TSs). The nature of each optimized structures, both minima and TSs, was identified by vibrational analysis, from which zero-point energy (ZPE) corrections were obtained and included in the barrier and reaction energy calculations. The adsorption energy (Eads) for each possible adsorbate was calculated according to the following equation:
Eads = Egas-surf − (Esurf + Egas) |
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Fig. 2 Energy profile including ZPE correction (black) and also the vibrational entropy correction at 500 K (red) for the hydrogenation of CHx (x = 0–3). The data of the hydrogenation of CH2 and CH3 (in gray) are from ref. 45. The gray and white spheres represent C and H atoms, respectively. |
It's known that the activation of CO on most metals is via its hydrogenation to CHO and/or COH,22,27 however, on V(100), both hydrogenation steps are calculated to be endothermic by 0.60 and 1.41 eV, respectively, and the energy barrier for the former step is 0.90 eV, thus much less favorable than the direct dissociation. The dissociation of H2 is barrierless and strongly exothermic on V(100). Following the initial dissociation of CO and H2, other C-chain growth and hydrogenation steps may occur and will be discussed in detail in the next sections.
The potential energy profile for the hydrogenation of C atom to produce methane in a stepwise manner is plotted in Fig. 2 (the black one) and the PES curve including vibrational entropy term using the harmonic approximation (see the ESI†) at 500 K is also given (the red line). Both of the hydrogenation of C and CH are endothermic by 0.42 and 0.73 eV, respectively. During the reaction, C (or CH) remains at the hollow site, and the H atom moves to it by overcoming a barrier of 0.83 (0.92) eV. The value without ZPE is 0.91 (0.91) eV and becomes 0.92 (0.93) including dispersion effects. The C–H bond length in the transition states (TS1 and TS2) are similar, 1.58 and 1.57 Å, respectively. According to our earlier study,45 the subsequent hydrogenation of CH2 and CH3 was found to be also endothermic (1.37 and 0.54 eV, respectively) with energy barriers of 1.25 and 1.03 eV, respectively, and the diffusion of H atoms is facile on V(100), which benefits the hydrogenation of CHx. These results indicate that all elementary reaction processes starting from C to produce CH4 are endothermic, leading to an overall endothermicity of 3.06 eV. The largest energy barrier corresponds to the third step, CH2 hydrogenation, similar to that on Fe(100) with an energy barrier of 0.86 eV.17
In order to take into account the influence of temperature on chemical behavior of some adsorbed species, AIMD simulations on the adsorbed CH2 was carried out at three temperatures of 300, 500 and 800 K respectively for more than 20 ps each. Fig. S1† shows how the C–H bond of CHx evolves during AIMD simulation at 300 and 800 K with nearest image convention imposed.
As seen in Fig. S1a,† on the clean V(100) surface, we didn't observe the dissociation of CH2 during the simulation at 300 K, which is the case at 500 K. At 800 K, as seen in Fig. S1b,† the dehydrogenation of CH2 was observed. The leaving H atom first moved to the adjacent hollow site, then moved to the diagonal hollow site, but the yielded CH did not dissociate. These results indicate that the dissociation of CH is more difficult than that of CH2, which is consistent with the higher energy barrier.
In order to investigate the influence of surface H atoms, a simulation of CH2 at 800 K was carried out with an H atom adsorbed at the diagonal hollow site (see Fig. S1c†). The presence of the H atom was found to have little effect on the dissociation of CH2, but do limit the motion of the released H atom and lead to its immobilization at the adjacent hollow site.
These results indicate that the dissociation of CH2 and CH may be difficult on the V(100) surface under considered condition, thus may appear with long lifetime and lager coverage, which is verified by the microkinetic model, as discussed in the latter section. CH3 is much less stable for two reasons: on one hand, it is easy to dissociate, and on the other hand, its hydrogenation gives CH4, which may desorb from the surface easily.
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Fig. 3 The most stable structures of C2Hy on V(100). The C–V bond lengths (in Å) are given in black and the C–C bond lengths (in Å) in red. |
Species | Configurations | dC1–VIa | dC1–VII | dC2–VI | Angleb | dC1–C2 | Eads |
---|---|---|---|---|---|---|---|
a C1 refers to the C atom with less H atoms.b The angle of the C–C bond tiled from the surface.c Data from ref. 45. | |||||||
CC | C1-hollow, C2-bridge | 2.09 | 2.13 | 1.97 | 35.94 | 1.40 | −8.62 |
CHC | C1-hollow, C2-bridge | 2.08 | 2.13 | 2.05 | 37.23 | 1.43 | −6.87 |
CH3C | C1-hollow, C2-bridge | 2.15 | 2.13 | 2.47 | 41.69 | 1.51 | −6.77 |
CH2C | C1-hollow, C2-bridge | 2.07 | 2.16 | 2.19 | 55.19 | 1.46 | −5.67 |
CH3CH | C1-hollow, C2-bridge | 2.19 | 2.19 | 2.50 | 50.69 | 1.53 | −4.83 |
CH2CH | C1-hollow, C2-bridge | 2.19 | 2.21 | 2.15 | 35.02 | 1.48 | −4.28 |
CHCH | C1-hollow, C2-bridge | 2.18 | 2.18 | 2.02 | 29.64 | 1.47 | −3.49 |
CH3CH2 | C1-bridge, C2-hollow | 2.25 | — | 3.27 | 39.76 | 1.53 | −1.85 |
CH2CH2c | C1-hollow, C2-bridge | 2.32 | 2.52 | 2.23 | 20.82 | 1.51 | −0.57 |
In general, shorter C–V bond means stronger binding. The C1–VI bond in CHxC (x = 0–3) is the shortest with values of 2.07, 2.08 and 2.09 Å for CH2C, CHC and C2, and 2.15 Å for CH3C respectively. The bond length becomes longer when going to CHxCH (x = 1–3), which is around 2.19 Å. The C1–VII bond length is the shortest in CC, CHC and CH3C (2.13 Å) and is around 2.16–2.19 Å in other C2Hy species. The distance of C2–VI in CHxC (x = 0–3) increases with the number of H atoms (1.97 < 2.05 < 2.19 < 2.47 Å), and this is also the case for CHxCH (x = 1–2) (2.02 < 2.15 < 2.50 Å).
For all species, the C–C bond is tilted from the surface with the bridge C farther from the V(100) surface, and the distance between the two C atoms increases with the number of H atoms on C2 atom (C–CHx (x = 0–3): 1.40 < 1.43 < 1.46 < 1.51 Å; CH–CHx (x = 1–3): 1.47 < 1.48 < 1.53 Å). Same trend is observed for the angle of the C–C bond tiled from the surface (C–CHx (x = 0–3): 35.94 < 37.23 < 41.69 < 55.19°; CH–CHx (x = 1–3): 29.64 < 35.02 < 50.69°) and the C–H bond length of CH fragment in CHCH, CHCH2 and CHCH3 (1.16 < 1.18 < 1.20 Å). The configuration of CH2CH2 has been described in our earlier work.45 CH2CH3 adsorbs on V(100) with CH2 located at the bridge site, which is different from other C2Hy species, with a C–C bond length of 1.53 Å, C–V of 2.25 Å and an angle of 39.76°.
A correlation between the adsorption stability of most C2Hy on V(100) and the C1–V distance and the number of H atom on the C atom bound with the surface may be deduced from the data in Table 1: the shorter the C1–V distance or the less saturated the C atom, the stronger the binding. Among all C2Hy species, the adsorption of C2 is the most exothermic by −8.62 eV. In the case of CHC and CH3C, the energies decrease to −6.87 and −6.77 eV, respectively. The exothermicity is even less for CH2C which is around −5.67 eV, and for the CHxCH species, which are −4.83, −4.28 and −3.49 eV for CHCH, CH2CH and CH3CH, respectively, suggesting the stability of CHxCH on V(100) decreases with the number of H atom on the C2 atom. The adsorption energy of CH3CH2 is −1.85 eV, and CH2CH2 is found only weakly bound to the surface with an adsorption energy of −0.57 eV, thus it is likely to desorb from the surface.45 The adsorption energy including dispersion correction is calculated to be −4.87 and −1.92 eV for CH2CH and CH2CH2, respectively.
In brief, CHxCHy (y ≥ x) have preferred adsorption modes with less saturate C atom bound on the surface rather than other configurations, and the adsorption sites are similar to the corresponding CHx species. For the isomers, the configuration with less saturate C1 is more stable in view of adsorption energy on the surface, e.g. the binding of CH2C, CH3C and CH3CH are stronger than CHCH, CH2CH and CH2CH2, respectively, similar to that on Fe(100).18
The nascent C–C bond lengths in the TSs are also shown in Fig. 4 and all of them are around 2.00 Å. In the transition states for the coupling reactions of C atom with CHx (x = 0–3), TS3–TS6, the forming C–C bond lengths are 1.80 < 1.92 < 1.97 < 2.07 Å, respectively. For the coupling of CH with CHx (x = 1–3), these values in TSs7–9 are 1.92 < 1.95 < 2.04 Å, respectively. When going to more saturated CHx species, i.e. the coupling reactions of CH2 with CH3 and CH2, the values become even longer to 2.08 and 2.09 Å in TS10 and TS11, respectively. It is clear that the length of the forming C–C bond is related to the unsaturation of the CHx fragment, similar to that in C2Hy species.
In view of energy barriers (see Fig. 5), the coupling paths studied here may be classified into three groups. The first group includes the CH3 + C and CH3 + CH coupling reactions, which are inherent with the lowest barriers of 1.05 and 1.28 eV, respectively, which may be resulted from the participation of the relatively highly diffusive CH3 in the reactions. The coupling reactions with moderate difficulty constitute the second group, including the paths of C + CH, C + CH2, CH + CH and CH + CH2 with similar energy barriers of 2.02, 1.97, 2.00 and 2.03 eV, respectively, which is because the diffusion ability of CH and CH2 is similar and much weaker than CH3 involved in the first group. The values without ZPE for the CH + CH and CH + CH2 are 1.85 and 1.95 eV, which become 1.84 and 1.99 including dispersion correction. The reactions with the highest energy barriers belong to the third group, i.e. the coupling reactions of C + C, CH2 + CH2 and CH2 + CH3, the barriers of which are 2.70, 2.71 and 2.49 eV, respectively. In this group, either it is hard for both reactants to migrate (C + C) or significant repulsive interaction is present between the two reactants, which makes it difficult for the coupling reactions to happen. These results reflect the composite effect of the diffusion ability of the migrating CHx and the repulsive interaction between the radical pair. Overall, for the radical pair that with the less repulsive interaction and/or higher diffusion ability, the barrier to overcome is lower, and the lowest value is obtained to the C + CH3 coupling reaction, which is same as that on Fe and Co surface.19
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Fig. 5 Energy profile for the C–C coupling steps (in eV). The coupling of CH2 (in gray) is from ref. 45. |
In addition, we note that for coupling reactions C + CHx, the reaction energy barriers correlate with the lengths of the partially formed C–C bond in the TSs, i.e. the longer the C–C bond length, the lower the energy barrier. This, together with the correlation between the C–C bond length, the diffusion ability and the unsaturation of the CHx fragment mentioned above, shows that it is possible that these reactions are determined essentially by unsaturation of the CHx.
All of the coupling reactions studied here are endothermic and the strongest endothermicity was found in the reaction between the C + C radical pair with a value of 2.40 eV. It decreases to 1.76, 1.54, 1.24 and 1.03 eV, respectively for the reactions of CH + CH, CH + C, CH + CH2 and CH2 + CH3, and the lowest value (0.27 eV) is for C + CH3. It is clear from Fig. 5 that, for the coupling reaction of C with CHx, the step with lower energy barrier appears with smaller endothermicity, which is same as the case for CH (or CH2) with CHx, except for the CH + CH step.
The diffusion ability of CH3 makes the coupling steps CH3 + C (or CH) more favorable both in view of kinetics and thermodynamics. According to our calculations, the effective energy barriers, which is defined as the energy difference between the highest transition state (TS) and the C + yH species, increase in the order CH + CH < C + CH < C + C < C + CH2 < CH + CH2 < C + CH3 < CH + CH3 < CH2 + CH2 < CH2 + CH3 with the values 2.42 < 2.44 < 2.70 < 3.12 < 3.18 < 3.57 < 3.80 < 3.86 < 5.01 eV. On the surface of V(100), C is the most stable species and its hydrogenation and coupling reactions are endothermic, thus by referring to the energy of the thermodynamically most stable species, it is clear that, all C–C coupling steps are more difficult to happen than the formation of CH2 (1.34 eV) in energy barriers.
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Fig. 6 Paths of C–C coupling reactions to produce C2Hy species and the subsequent hydrogenations. ZPE correction is included in the energy barrier (in eV) of each path. |
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Fig. 7 The TS structures of the hydrogenation of C2Hy on V(100) with the newly formed C–H bond length in Å. |
The data in Fig. 6 indicate that most hydrogenation processes of C2Hy are endothermic except for the step C2 + H → C2H which is exothermic by 0.45 eV with an energy barrier of 0.72 eV. The hydrogenation of C2H may produce CH2C or CHCH, which are endothermic by 0.32 and 0.64 eV, respectively, and the corresponding energy barriers are 0.75 and 0.81 eV. The highly unsaturated CH2C may be reduced further to CH2CH or to CH3C by overcoming an energy barrier of 0.78 or 0.89 eV and both are endothermic by 0.66 and 0.51 eV respectively. In principle, CH2CH may be also produced via the hydrogenation of CHCH with a higher barrier of 1.16 eV. The further hydrogenation of CH3C and CH2CH gives CH3CH, both of which are calculated to be endothermic by 0.80 and 0.65 eV, and the barriers are 0.82 and 0.99 eV, respectively. A second path for the hydrogenation of CH2CH is to reduce the less saturated C1 atom and give ethylene molecule (CH2CH2) with a much higher energy barrier of 1.44 eV and strong endothermicity by 1.34 eV. The subsequent hydrogenation of both CH3CH and CH2CH2 gives CH3CH2, with an energy barrier of 1.92 eV to the former compared to a lower value of 0.62 eV to the latter (Fig. 6).
Starting from the C + H to form CH2CH2, the effective energy barrier to the path via the coupling of CH2 is smaller than the other paths since the hydrogenations of CH2CH and CHCH are endothermic and face high energy barriers, according to our calculations. This is in consistent with the experimental observations,39 in which CH2 appears as the reactant, and explains the formation of CH2CH2 via direct coupling reaction of two CH2.
Regarding to the pathway for the formation of CH2CH, according to our calculations, in addition to the direct coupling of CH2 and CH, there may exist two other possibilities. The first one is the dehydrogenation of CH2CH2 which is inherent with a very low energy barrier (0.10 eV) and large exothermicity (1.34 eV), and the other one is a three-step process starting from CHCH, i.e. along the path CHCH → CHC → CH2C → CH2CH. In principle, the direct CHCH may also produce CH2CH, however, its much higher effective energy barrier, which amounts up to 1.16 eV makes it uncompetitive against the stepwise pathway to which the Eeff is calculated to be 0.22 eV. Note that both pathways involve the dehydrogenation steps, low coverage of the surface is required to guarantee the availability of extra surface site, otherwise the dissociation steps may be blocked.
Surface reactions | Ef (eV) | ΔH (eV) | |
---|---|---|---|
a An asterisk represents a free site on the surface. | |||
1 | CO(g) + * ↔ CO* | −3.28 | |
2 | H2(g) + 2* ↔ 2H* | −1.36 | |
3 | CO* + * → C* + O* | 0.33 | −2.20 |
4 | C* + H* → CH* + * | 0.83 | 0.42 |
5 | CH* + H* → CH2* + * | 0.92 | 0.73 |
6 | CH2* + H* ↔ CH3* + * | 1.37 | 0 |
7 | CH3* + H* → CH4(g) + 2* | 1.03 | 0.54 |
8 | C* + C* ↔ C2* + * | 2.70 | 2.40 |
9 | C* + CH* ↔ CCH* + * | 2.02 | 1.54 |
10 | C* + CH2* ↔ CH2C* + * | 1.97 | 1.13 |
11 | C* + CH3* ↔ CH3C* + * | 1.05 | 0.27 |
12 | CH* + CH* ↔ CHCH* + * | 2.00 | 1.76 |
13 | CH* + CH2* ↔ CH2CH* + * | 2.03 | 1.24 |
14 | CH* + CH3* ↔ CH3CH* + * | 1.28 | 0.67 |
15 | CH2* + CH2* ↔ CH2CH2* + * | 2.71 | 1.98 |
16 | CH2* + CH3* ↔ CH3CH2* + * | 1.46 | 1.03 |
Our results show that, under the studied condition, CH2 is the dominant CHx surface species in the whole temperature range (300–800 K) (see Table S1†). However, when the dissociation of CH2 becomes possible (step 5r) and is included in the model at high temperature of 800 K, CH coverage becomes the highest, followed by that of CH2. This suggests that both CH2 and CH are important CHx species responsible for the C-chain growth in the considered temperature range 300–800 K, consistent with the above discussion.
The forward reaction rate of CH2 + CH, CH2 + C and CH3 + C coupling top the other channels from 300 to 800 K and the CH2CH, CH2C and CH3C coverage are the highest among all C2Hy species except CH2CH2 and CH2CH3 (see Table S2†). It is noted that the desorption of CH2CH2 and CH3CH2 by hydrogenation were not considered in the model which may decrease the coverage of these two species. If the step 5r is included in the model at 800 K, the forward reaction rate of CH2 + CH tops the other channels and both CH2CH and CHCH become dominant as a consequence of the higher coverage of CH than that of CH2. Thus at experimental temperature, CH2CH is the important C2Hy species and may be responsible for the C-chain growth.
In summary, CH2 is the most possible reactant for the C–C coupling reaction because of its high coverage, and CH is also recognized as a highly possible species responsible for the C–C coupling in view of energy barrier while its significance may be limited by its lower coverage at experimental temperature. Starting from the high coverage of CH2, the reaction of CH2 + CH3 is most favourable, but the formed CH2CH3 will be desorbed from the surface after hydrogenation. The reaction CH2 + CH2 to CH2CH2 desorbing from the surface may be also favourable although need overcome a high energy barrier of 2.71 eV. The other reactions with lower effective energy barriers such as CH + CH and CH + CH3 seem possible, but the much lower coverage of CH and CH3 make them much less competitive than CH + CH2. Thus, CH2CH may be the most possible C2Hy species from the C–C coupling on V(100) responsible for the C-chain growth in considered condition, as proven in Shen's experiment.39
However, as discussed above, the reactions that require the participation of CH suffer from the low coverage of CH compared to that of CH2 at experimental temperature, which nevertheless benefits the coupling between CH2CH and CH2. This suggests that CH2 may be responsible for the C-chain growth to form the dominant C3Hz product via the path CH2CH → CH2CHCH2 → CH2CHCH3, which agrees with the speculation in Shen's experiment.39
The activation of CO is facile via the direct dissociation rather than H-assisted pathways on V(100). The hydrogenation of CHx, C2Hy (except CCH) and the C–C coupling reactions are all kinetically and thermodynamically unfavorable and their occurrence depends on the high coverage of reactants and entropy effect. For the C–C coupling steps, the larger the difference in the saturation of the two C atoms, the more favorable the reactions are both in terms of thermodynamics and kinetics.
In F–T synthesis, starting from the reactants of C + H on the surface, CH2 may be the dominant CHx species at experimental temperature. Starting from high coverage of CH2, CH4 may form from its hydrogenation and desorbs from the surface as the CHx product at high H coverage. C2H4 forms from its direct coupling and desorbs from the surface and the key chain-propagation intermediate, CH2CH, comes from the its coupling with CH. Both the coupling steps and the continue coupling of CH2CH with CH or CH2 leading to the product CH2CHCH3 are unfavorable kinetically and thermodynamically. Note that, van der Waals interaction may increase the adsorption energies of hydrogen-containing species which may be enhanced as chain grows,16,22 but the effect on the energy barrier of reaction on the metal surface is negligible. The high coverage of CHx and H and the entropic effect may appear as the dominant factor responsible for the C-chain growth as well as the hydrogenation, and the contribution of CH may be limited by the its low coverage compared to that of CH2 although the reactions involved CH with lower energy barriers. The results are in good agreement with the experimental results.39 The whole process can be described as follows:
CO(g) + * → CO* | (1) |
H2(g) + 2* → 2H* | (2) |
CO* + * → C* + O* | (3) |
C* + H* → CH* + * | (4) |
CH* + H* → CH2* + * | (5) |
CH2* + H* → CH3* + * | (6) |
CH3* + H* → CH4(g) + 2* | (7) |
CH2* + CH2* → C2H4* + * | (8) |
C2H4* → C2H4(g) + * | (9) |
CH2* + CH* → CH2CH* + * | (10) |
CH2CH* + CH2* → CH2CHCH2* + * | (11) |
CH2CHCH2* + H* → CH2CHCH3 * + * | (12) |
CH2CHCH3* → CH2CHCH3(g) + * | (13) |
Footnote |
† Electronic supplementary information (ESI) available. See DOI: 10.1039/c4ra15368e |
This journal is © The Royal Society of Chemistry 2015 |