Bai Sunab,
Yonghong Liua,
Wenxi Zhaoab and
Peng Chen*a
aSchool of Physics Science and Technology, Southwest University, Chongqing 400715, China. E-mail: pchen@swu.edu.cn; Fax: +86-23-68254608; Tel: +86-23-68367015
bInstitute for Clean Energy & Advanced Materials (ICEAM), Southwest University, Chongqing 400715, China
First published on 19th January 2015
Resistive switching memory devices, in which the resistance can be modulated between two nonvolatile states by applying an electrical pulse, have been proposed as the fascinating candidates for next generation logic and nonvolatile memory devices. Herein we report on the observation of magnetic-field controlled resistive switching behaviors in the Ag/[BiFeO3/γ-Fe2O3]/FTO structure. Moreover, this resistive switching behavior can be modulated by white light. Therefore, such a resistive switching memory can be controlled simultaneously by voltage pulses, magnetic field and white light. This study is helpful for exploring the nonvolatile multistate memory devices manipulated by various means.
In the past few years, light as new control parameter in the resistive switching is reported.7–10 The extra control parameter in the resistive switching can greatly broaden its applications. More importantly, the magnetic field has been also involved in the ZnO based-resistive switching memory device in recent many reports.37–39
In this paper, we report the magnetic-field controlled resistive switching behavior in Ag/[BiFeO3/γ-Fe2O3]/FTO structure. To the best of our knowledge, the magnetic-field controlled resistive switching behavior in multiferroic materials, such as BiFeO3, has not been reported so far. Moreover, the white-light controlled resistive switching behavior in Ag/[BiFeO3/γ-Fe2O3]/FTO structure have been not also observed yet. Therefore, we report on the observation, for the first time, of a resistive switching memory that can be controlled simultaneously by voltage pulses, magnetic field and white light. The magnetic-field and white-light controlled resistive switching reveals the potential for next-generation nonvolatile memory applications based on multifunctional materials.
Detailed preparation procedures of Ag/[BiFeO3/γ-Fe2O3]/FTO device are shown as follows: we mixed as-synthesized BiFeO3 powder and γ-Fe2O3 powder together with a certain proportion, and then grinded the mixed powder for 2 hours. Then we dissolved the mixed powder in toluene solution to prepare precursor gel. As-prepared precursor gel was spin-coated on the FTO substrate. The spin-coating process at 5000 rpm for 10 s was used for BiFeO3/γ-Fe2O3 composite film preparation. Then the sample was dried at 120 °C in vacuum for 12 hours to remove toluene. The thickness of the film was detected by the XRF (PW2404 R, Philips Japan Co. Ltd.), which shows the thickness of BiFeO3/γ-Fe2O3 composite film is about 5 μm. Finally, the Ag electrodes with area of 1 mm2 were prepared by vacuum deposition. The BiFeO3/γ-Fe2O3 samples with masks on them were put into the vacuum sputtering system to grow Ag electrodes.
Fig. 1(c) presents the high resolution transmission electron microscope (HRTEM) image of BiFeO3/γ-Fe2O3 composite film. The fringes with a spacing of 0.28 nm correspond to (110) planes of BiFeO3, and the fringes with a spacing of 0.48 nm correspond to (311) planes of γ-Fe2O3. The inset to Fig. 1(c) shows the corresponding selected area electron diffraction (SAED) pattern of BiFeO3, which indicates the BiFeO3 of BiFeO3/γ-Fe2O3 composite film is single-crystalline structure.
The composition of BiFeO3/γ-Fe2O3 composite film is further confirmed by elemental analysis using energy-dispersive X-ray spectra (EDX). The EDX data in Fig. 1(d) confirms that the element compositions of composite film are Bi, Fe and O without any other impurities. In addition, the BiFeO3
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γ-Fe2O3 mole ratio in the composite film is about 2.85 from the inset of Fig. 1(d).
The magnetic hysteresis loop (M–H) of Ag/[BiFeO3/γ-Fe2O3]/FTO device with magnetic field from −2.5 T to 2.5 T is shown in Fig. 2. The Ag/[BiFeO3/γ-Fe2O3]/FTO device presents obvious ferromagnetism with coercivity about 150 Oe at room temperature from the inset of Fig. 2, and the magnetization is about 85 emu cm−3 at 2.5 T.
Fig. 3(a) displays typical voltage-dependent current density (J–V) curves in linear scale of Ag/[BiFeO3/γ-Fe2O3]/FTO device in various magnetic fields, which exhibit asymmetric behaviour with significant hysteresis. The arrows in the figure denote the sweeping direction of voltage. The inset of Fig. 2(a) shows the experimental test circuit. In order to exclude the effect of the variability of the high resistance state on the characteristics that the applied magnetic field can regulate the resistance and the set/reset voltage, we first measured the I–V curve without magnetic field after measurement of 200 I–V curves. Then we increased magnetic field gradually and measured the I–V curves in various magnetic field. From these curves, it is concluded that the applied magnetic field can regulate the resistance and the set/reset voltage. And then we decreased magnetic field gradually and measured the I–V curves in various magnetic field, including zero magnetic field. From these curves, it is also concluded that the applied magnetic field can modulate the resistance and the set/reset voltage. Therefore, the effect of the variabilities of the high resistance state and the set/reset voltage on the characteristics that the applied magnetic field can regulate the resistance and the set/reset voltage can be excluded. Furthermore, the resistance–cycles curve, the set/reset voltage–cycle curve and the set/reset current–cycle in magnetic field are obviously separated from those without magnetic field (Fig. 3(c) and (d) and 4), especially the set/reset current–cycle, which undoubtedly indicate the applied magnetic field can modulate the resistance and the set/reset voltage. In addition, the resistance–cycles curve, the set/reset voltage–cycle curve and the set/reset current–cycle without magnetic field were firstly measured, and then those in magnetic field were measured. Furthermore, the R–H was measured and shows R increase with the applied magnetic field. A similar result takes place for the situation of white light.
Fig. 3(b) shows corresponding J–V curves in logarithmic scale. The arrows in the Fig. 3(b) denote the sweeping direction of voltage. With the increasing of voltage from 0 V, the current densities suddenly increase at voltage about 0.82 V without magnetic field and about 0.98 V with magnetic field of 2.5 T, indicating a resistive switching from the high resistance state (HRS or ‘OFF’) to the low resistance state (LRS or ‘ON’), which was called the “Set” process, and the switching voltage is called set voltage (VSet). The device can keep at LRS sweeping from 1.5 V → 0 V. When the applied voltage sweeps from zero to a certain negative reset voltage (VReset) of about −1.23 V without magnetic field and about −1.38 V with magnetic field of 2.5 T, the device returns from the LRS to the HRS, which was called the “Reset” process. No electroforming process is required for the Ag/[BiFeO3/γ-Fe2O3]/FTO devices. Therefore, the resistive switching should be attributed to abundant oxygen vacancies (VO) pre-existing in the as-grown BiFeO3/γ-Fe2O3 composite films. It is worth noting that the magnetic field can control the resistive switching. Both the LRS resistance and the HRS resistance increase with the increasing of the magnetic fields. Especially, the magnetic field can control the switching voltage VReset and VSet. The absolute values of VReset and VSet increase with the increasing of the magnetic fields. Our results reveal that the magnetic field can be a control parameter of the resistive switching in this device, which provides the potential for magnetism-controlled nonvolatile memory applications.
During the subsequent “Set” and “Reset” cycles, the device shows the same J–V curves as the first cycle. The VReset and VSet are almost unchanged in the different cycles. Fig. 3(c) displays the evolutions of VSet and VReset over 100 successive resistive switching cycles. There is no obvious decay for VSet and VReset. The VSet and VReset are 0.82 ± 0.1 V and −1.23 ± 0.1 V without magnetic field, respectively, and the VSet and VReset are 0.98 ± 0.1 V and −1.38 ± 0.1 V with magnetic field of 2.5 T, respectively.
Moreover, the evolution of set and reset currents with cycle number is also shown in Fig. 3(d). We defined the set and reset current according to previous reports.42–46 We can see the set current is decrease and reset current is increase with magnetic field.
In addition, the evolutions of the resistance in the HRS and LRS with a positive bias of 0.1 V over 100 successive resistive switching cycles are tested and shown in Fig. 4. The resistances at the LRS (ON state) and at the HRS (OFF state) keep stable to a certain extent. The above results reflect excellent repeatability and reliability of the magnetic-field controlled resistive switching in Ag/[BiFeO3/γ-Fe2O3]/FTO device.
Furthermore, we tested the resistive switching characteristics of Ag/[BiFeO3/γ-Fe2O3]/FTO devices under white light illumination with various power densities. The inset of Fig. 5(a) shows the experimental test circuit. Fig. 5(a) presents J–V characteristics curves in linear scale of Ag/[BiFeO3/γ-Fe2O3]/FTO under white light illumination with various power densities. Fig. 5(b) exhibits corresponding J–V curves in logarithmic scale, which indicates the white-light controlled resistance switching. The absolute values of reset voltage (VReset1) and set voltage (VSet1) increase with the increasing of illumination power densities. Fig. 5(c) displays the evolutions of VReset1 and VSet1 over 100 successive resistive switching cycles. Fig. 5(d) displays the evolutions of IReset1 and ISet1 over 100 successive resistive switching cycles.
Fig. 6 show the evolutions of the resistances in the HRS and LRS with a positive bias of 0.1 V over 100 successive resistive switching cycles. The resistances, VReset1, VSet1, IReset1 and ISet1 keep stable to a certain extent, which shows the white-light controlled resistive switching in Ag/[BiFeO3/γ-Fe2O3]/FTO device is highly repeatable and reliable. In addition, the HRS/LRS ratio increases with the increasing of illumination power densities. Our results reveal that the white light can be a control parameter of the resistive switching in this device.
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| Fig. 6 The resistance–cycles curve with a positive bias voltage of 0.1 V in the dark and under light illumination with power density of 20 mW cm−2. | ||
BiFeO3 is multiferroic materials,47,48 which shows ferroelectric and antiferromagnetic at room temperature. BiFeO3 exhibits strong magnetoelectric effect, where ferroelectricity is coupled with magnetism. The mechanisms for resistive switching have been extensively investigated, and it is generally believed that the electrically driven migration of oxygen ions/vacancies plays a critical role.49–54 In our works, both the magnetic field and white light can control the resistive switching. Especially, both the magnetic field and white light can modulate the absolute values of reset voltage and set voltage. The controlling of magnetic field and white light over the resistive switching of Ag/[BiFeO3/γ-Fe2O3]/FTO device should originate from the couple among magnetism, optical property and ferroelectricity of BiFeO3. Fig. 7(c) shows the ferroelectric hysteresis loops (P–E) of BiFeO3 film without magnetic field and with magnetic field of 2.5 T. The magnetic field can improve the ferroelectric polarization of BiFeO3, which is due to the strong magnetoelectric effect.55,56 Fig. 7(d) exhibits the ferroelectric hysteresis loops (P–E) of BiFeO3 film in the dark and under white light illumination. The white light can improve the ferroelectric polarization of BiFeO3 due to the strong photoferroelectric effect, which is explained by trapping of photogenerated charge at domain boundaries to minimize internal depolarizing fields.57,58 Therefore, both magnetic field and white light can improve the ferroelectric polarization of BiFeO3. The mechanism for the controlling of magnetic field and white light over the resistive switching of Ag/[BiFeO3/γ-Fe2O3]/FTO device is displayed in Fig. 7(a) and (b). Ferroelectric polarization of BiFeO3 appears in applied electrical field Ee. Ferroelectric polarization of BiFeO3 results in an extra opposite-direction electrical field Ei in BiFeO3/γ-Fe2O3 composite film (Fig. 7(a)). When applying magnetic field or white light, ferroelectric polarization of BiFeO3 increases, which leads to increasing of the extra opposite-direction electrical field Ei in BiFeO3/γ-Fe2O3 composite film (Fig. 7(b)). Therefore, larger applied voltages are necessary to finish the ‘Set’ process and the ‘Reset’ process. Therefore, both the magnetic field and white light can modulate the absolute values of reset voltage and set voltage. In addition, the larger resistances of LRS and HRS induced by magnetic field in Fig. 3(d) should be attributed to increasing of the extra opposite-direction electrical field Ei in magnetic field. However, the effects of light on resistances of LRS and HRS are more complex because of photogenerated charges. While the model claimed here remains phenomenological, it is needed for further study to find a more reasonable mechanism for elucidating the origin of the phenomenon of magnetism and light controlled resistive switching.
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