Issue 22, 2015
From the journal:

Nanoscale

Writing nanopatterns with electrochemical oxidation on redox responsive organometallic multilayers by AFM†

Jing Song,a   Mark A. Hempenius,b   Hong Jing Chungc  and  G. Julius Vancso*b  

* Corresponding authors

a Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), Research Link 3, Singapore
E-mail: songj@imre.a-star.edu.sg
Fax: +(65) 6872 0875
Tel: +(65) 6874 7903

b MESA+ Institute for Nanotechnology, Materials Science and Technology of Polymers, University of Twente, P.O. Box 217, 7500 AE Enschede, the Netherlands
E-mail: g.j.vancso@utwente.nl
Fax: +(31) 53 489 3823
Tel: +(31) 53 489 2974

c Data Storage Institute, A*STAR (Agency for Science, Technology and Research), 5 Engineering Drive 1, Singapore
E-mail: CHUNG_Hong_Jing@dsi.a-star.edu.sg
Fax: +(65) 6776 6527
Tel: +(65) 6874 8630

Abstract

Nanoelectrochemical patterning of redox responsive organometallic poly(ferrocenylsilane) (PFS) multilayers is demonstrated by electrochemical dip pen lithography (EDPN). Local electrochemical oxidation and Joule heating of PFS multilayers from the tip are considered as relevant mechanisms related to structure generation. The influence of applied bias potential, tip velocity, and multilayer thickness on the pattern height and width were investigated.

Graphical abstract: Writing nanopatterns with electrochemical oxidation on redox responsive organometallic multilayers by AFM

About
Cited by
Related
Download options Please wait...

Supplementary files

Article information

DOI
https://doi.org/10.1039/C5NR01206F
Article type
Communication
Submitted
21 Feb 2015
Accepted
17 Apr 2015
First published
22 Apr 2015

Nanoscale, 2015,7, 9970-9974

Author version available

Download author version (PDF)

Permissions

Request permissions

Writing nanopatterns with electrochemical oxidation on redox responsive organometallic multilayers by AFM

J. Song, M. A. Hempenius, H. Jing Chung and G. Julius Vancso, Nanoscale, 2015, 7, 9970 DOI: 10.1039/C5NR01206F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements